US20010013423A1 - Flip chip attach on flexible circuit carrier using chip with metallic cap on solder - Google Patents
Flip chip attach on flexible circuit carrier using chip with metallic cap on solder Download PDFInfo
- Publication number
- US20010013423A1 US20010013423A1 US08/932,864 US93286497A US2001013423A1 US 20010013423 A1 US20010013423 A1 US 20010013423A1 US 93286497 A US93286497 A US 93286497A US 2001013423 A1 US2001013423 A1 US 2001013423A1
- Authority
- US
- United States
- Prior art keywords
- solder
- circuit carrier
- flexible circuit
- carrier
- flexible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 145
- 238000000034 method Methods 0.000 claims abstract description 89
- 238000002844 melting Methods 0.000 claims abstract description 49
- 230000008018 melting Effects 0.000 claims abstract description 46
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 238000005304 joining Methods 0.000 claims abstract description 26
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 17
- 230000005496 eutectics Effects 0.000 claims description 35
- 229910052751 metal Inorganic materials 0.000 claims description 30
- 239000002184 metal Substances 0.000 claims description 30
- 229910052802 copper Inorganic materials 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 18
- 229910052718 tin Inorganic materials 0.000 claims description 17
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000956 alloy Substances 0.000 claims description 13
- 239000003351 stiffener Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- 230000004907 flux Effects 0.000 claims description 7
- 239000012212 insulator Substances 0.000 claims description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000004593 Epoxy Substances 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 6
- 229910052804 chromium Inorganic materials 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 229910008599 TiW Inorganic materials 0.000 claims description 4
- 229910052797 bismuth Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 229920001169 thermoplastic Polymers 0.000 claims description 4
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 3
- 239000003990 capacitor Substances 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 3
- 239000007789 gas Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 239000004744 fabric Substances 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 238000002161 passivation Methods 0.000 claims description 2
- 238000012216 screening Methods 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 229910001128 Sn alloy Inorganic materials 0.000 claims 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 claims 2
- 229910052745 lead Inorganic materials 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 18
- 238000004806 packaging method and process Methods 0.000 abstract description 11
- 239000000969 carrier Substances 0.000 abstract description 7
- 229910020220 Pb—Sn Inorganic materials 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 19
- 239000010949 copper Substances 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 239000007788 liquid Substances 0.000 description 8
- 239000008393 encapsulating agent Substances 0.000 description 7
- 239000011368 organic material Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 239000006023 eutectic alloy Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000000670 limiting effect Effects 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000005272 metallurgy Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- -1 such as Substances 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004634 thermosetting polymer Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/11—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5387—Flexible insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/341—Surface mounted components
- H05K3/3431—Leadless components
- H05K3/3436—Leadless components having an array of bottom contacts, e.g. pad grid array or ball grid array components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05144—Gold [Au] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05147—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05155—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05163—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/05166—Titanium [Ti] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/05001—Internal layers
- H01L2224/05099—Material
- H01L2224/051—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05163—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
- H01L2224/05171—Chromium [Cr] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05647—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/05638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/05655—Nickel [Ni] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/0612—Layout
- H01L2224/0613—Square or rectangular array
- H01L2224/06131—Square or rectangular array being uniform, i.e. having a uniform pitch across the array
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
- H01L2224/13111—Tin [Sn] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/1354—Coating
- H01L2224/13599—Material
- H01L2224/136—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/8119—Arrangement of the bump connectors prior to mounting
- H01L2224/81191—Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/81801—Soldering or alloying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01022—Titanium [Ti]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01023—Vanadium [V]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01024—Chromium [Cr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01042—Molybdenum [Mo]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01049—Indium [In]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01073—Tantalum [Ta]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01074—Tungsten [W]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01075—Rhenium [Re]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01077—Iridium [Ir]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30105—Capacitance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/189—Printed circuits structurally associated with non-printed electric components characterised by the use of a flexible or folded printed circuit
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/035—Paste overlayer, i.e. conductive paste or solder paste over conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10007—Types of components
- H05K2201/10015—Non-printed capacitor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10674—Flip chip
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10621—Components characterised by their electrical contacts
- H05K2201/10734—Ball grid array [BGA]; Bump grid array
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
- H05K2201/10613—Details of electrical connections of non-printed components, e.g. special leads
- H05K2201/10954—Other details of electrical connections
- H05K2201/10992—Using different connection materials, e.g. different solders, for the same connection
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0147—Carriers and holders
- H05K2203/0165—Holder for holding a Printed Circuit Board [PCB] during processing, e.g. during screen printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0058—Laminating printed circuit boards onto other substrates, e.g. metallic substrates
- H05K3/0061—Laminating printed circuit boards onto other substrates, e.g. metallic substrates onto a metallic substrate, e.g. a heat sink
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3485—Applying solder paste, slurry or powder
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49133—Assembling to base an electrical component, e.g., capacitor, etc. with component orienting
- Y10T29/49137—Different components
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49144—Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49146—Assembling to base an electrical component, e.g., capacitor, etc. with encapsulating, e.g., potting, etc.
Definitions
- the present invention relates generally to an improved and cost saving Direct Chip Attach (DCA) on Flexible circuit carriers using Flip Chip Attach (FCA) technology. More particularly, the invention encompasses a structure where at least one Integrated Circuit Chip can be directly attached to a flexible substrate. This direct attachment can be done using C4 (Controlled Collapsed Chip Connection) technology by capping the already reflowed solder balls and forming a eutectic solder composition. A method for such direct chip attachment to the flexible card is also disclosed.
- C4 Controlled Collapsed Chip Connection
- Electronic products typically comprise of plurality of components.
- the packaging of these components follow a hierarchy where an Integrated Circuit (IC) chip comprising of semiconductor micro-devices are connected (1st level assembly) to carriers made of ceramic or organic laminates comprising one or several layers of metal interconnection lines.
- IC Integrated Circuit
- carriers may also contain some other discrete devices like capacitors, resistors etc.
- modules are called modules.
- DASD Direct Access Storage Discs
- static region comprised of IC chips on an input card
- dynamic region comprised of memory discs
- Flexible Printed Circuit Boards A close proximity of static and dynamic regions is required to increase the performance of such DASD. This requires direct bonding of IC chips on Flexible circuit carrier connected to the disc drive.
- TAB Tape Automated Bonding
- TAB is not capable of taking full advantage of the Very Large Scale Integration which not only requires close spacing of I/O pads but also requires an array pattern to accommodate the vast number of I/O pads.
- TAB itself is a first level of packaging, hence TAB mounting of chips on Flexible circuit carrier precludes it from the Direct Chip Attach technology.
- TAB TAB
- Still yet another shortcoming is that rework is economically unfeasible.
- the C4 or Controlled Collapse Chip Connection technology has been successfully employed for 1st level assembly of chip on ceramic carriers.
- the C4 technology is described in detail by many authors, see for example, Microelectronics Packaging handbook, edited by, Rao R. Tummala and Eugene J. Rymaszewski, pages 366-391 (1989), the disclosure of which is incorporated herein by reference.
- the C4 interconnection is comprised of two main elements, a solder wettable pad called Ball Limiting Metallurgy (BLM), and a ball of solder.
- the BLM is comprised of an adhesive layer like Cr or TiW, and a solder reflowable layer like copper or nickel.
- the BLM materials and their thicknesses are judiciously chosen to provide good and reliable electrical, mechanical and thermal stability to interconnect structure.
- the solder material used for C4 is preferably a low percentage (about 2 percent to about 10 percent) tin alloyed with lead. This combination is used:
- a method for flexible substrates which matches the Legg and Schrottke's scheme of “tinning” the substrate with eutectic alloy, is shown by Milkovich et al., in U.S. patent application Ser. No. 08/071,630, entitled “Manufacturing Flexible Circuit Board Assemblies with Common Heat Spreaders”, filed on Jun. 3, 1993, and assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference.
- “decals” of eutectic solder balls with required footprint are first formed which is subsequently transferred on the flexible circuit carrier. Decals are formed by electroplating solder balls on a stainless steel plate.
- This method requires a photo-imageable solder mask on the Flexible circuit carrier circuit, holes corresponding to the required footprint are developed out in this mask.
- the decals are transferred by placing the flipped stainless steel plate on flexible circuit carrier card and reflowing.
- Flexible printed circuit cards are typically made of polyimides, for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.).
- Polyimides for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.).
- Milkovich et al. “Double Sided Flexible Carrier with Discretes and Thermally Enhanced FCA/COF” IEEE 43rd ECTC Proceedings, June 1993, pages 16-21, have demonstrated methods of circuitization and device attachments on both sides of the flexible circuit carrier; the disclosure of which is incorporated herein by reference.
- One of the disadvantage of this method is poor yield.
- a second approach for lowering the joining temperature for Direct Chip Attach is to provide a low melting Solder On Chip (SOC) C4 rather than on the carrier conductor.
- SOC Solder On Chip
- 5,075,965 disclose a method, where an inhomogeneous, anisotropic column consists of lead rich bottom and tin rich top of sufficient thickness to form eutectic alloy. The resulting as-deposited and un-reflowed column is then joined onto the card's conductor.
- Eiji et al. in Japanese Patent Publication No. 62-117346, describes an anisotropic column structure of low and high melting solders.
- the basic objective of this invention is essentially to provide an increase height of a solder joint rather than to provide a low melting solder joining process.
- a high-melting point metallic layer is secured to a chip and a substrate and a low-melting point metallic layer is then formed. the two low-melting point metallic layers are then joined and thereby the chip is joined to the substrate.
- IBM Technical Disclosure Bulletin entitled “Indium-Lead-Indium Chip Joining”, W. A. Dawson et al., vol. 11, No. 11, page 1528 (April 1969), discloses the standard capping of lead with either indium or tin for diffusion bonding. In order to alleviate the problem of chip collapse onto the surface of the substrate an intermediate temperature is employed.
- a bump completely composed of low melting composition is a feature to be avoided as the high tin content reacts with all of the copper of the adhesive layer (BLM) giving a thick intermetallic layer.
- BLM adhesive layer
- High stresses of reacted BLM have been known to cause solder pads to fall off and to create insulation cracking.
- the eutectic solder bumps also have poor electromigration and thermal fatigue lifetime. It is also known that low melting eutectic solder suffers from void formation due to thermal migration which causes circuit failure.
- This invention relates generally to interconnection in electronic circuit packages, and more particularly shows a new solder interconnection technology to make a Direct Chip Attachment (DCA) on Flexible organic circuit carrier.
- DCA Direct Chip Attachment
- a method for preparing the flexible circuit carrier card for direct device attachment using low melting Solder On Chip (SOC) where the low melting eutectic alloy is formed during joining operation and is localized at the tip of the standard high melting C4 ball.
- SOC Solder On Chip
- the invention is a novel method and structure for providing direct device attach to flexible circuit card using a novel solder interconnection scheme.
- Another purpose of this invention is to provide a method for simultaneously joining devices on Flexible card using the DCA/SOC, the method of the instant, along with various Flip Chip, SMT and/or BGA (Ball Grid Array) technologies.
- Another purpose of this invention is to provide a Flexible circuit card/device assembly which has increased performance.
- Yet another purpose of this invention is to provide for a Flexible circuit carrier card which is low in cost, easy to build and possesses high reliability.
- Still yet another purpose of this invention is to provide a Flexible circuit carrier card with mounted devices which has low profile, is compact in design and has low weight.
- Yet another purpose of this invention is to have a Flexible card which is compatible with wafer level electrical test and burn-in.
- this invention comprises a method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of:
- this invention comprises a flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic.
- FIG. 1 shows a cross-section of a flexible circuit carrier substrate having at least one flexible sheet with at least one circuit on at least one surface.
- FIG. 2 shows a cross-section of the flexible circuit carrier substrate of FIG. 1, after a stiffener has been secured using at least one adhesive.
- FIG. 3 shows a cross-section of the flexible circuit carrier substrate after at least one layer of an organic material has been adhered adjacent to the circuits.
- FIG. 4 shows a flexible circuit carrier that has been site-dressed for joining at least one electronic device.
- FIG. 5 shows the securing of the flexible circuit carrier of FIG. 4, onto a support jig.
- FIG. 6 shows the securing of one or more of electronic devices onto the site-dressed flexible circuit carrier card.
- FIG. 7 shows an enlarged view of a solder ball interconnect having at least one metallic cap being secured to a single metallic pad.
- FIG. 8 shows an enlarged cross-sectional view of the solder interconnect of FIG. 7, secured to the metallic pad after the reflow operation.
- FIG. 9 is an enlarged cross-sectional view after at least one encapsulant has encapsulated at least one solder connection of FIG. 8.
- the invention basically encompasses a flexible circuit carrier with metallic conductor lines, such as, copper. Openings are made at sites which will be electrically connected to an electronic device using reflowed solder with a metallic cap. Ashing of the surface of the flexible circuit carrier could also be done to improve the adhesion and the flow of encapsulants. Solder paste could be screened for SMT, solder balls could be placed for BGA, or, solder could also be placed by solder injection for various flip chip attach methods. Likewise, either one or both surfaces of the flexible circuit carrier could be prepared to secure various electronic devices.
- the invention also encompasses the formation of a direct chip attach (DCA) on the flexible circuit carrier surface. This is done by aligning the solder interconnections with a cap of low melting point metal on the chip with the corresponding footprints on the flexible circuit carrier. The assembly is then held at a bias temperature of about 150° C. and then individual chips are heated, preferably with Infra Red (IR) heat source to a temperature of between about 190° C. to about 220° C. in a nitrogen or a forming gas environment. The assembly is then cooled and the chip is preferably encapsulated with an epoxy based encapsulant, such as, HYSOL 4511, Trade Name used by Dexter Hysol of California, USA.
- DCA direct chip attach
- An advantage of this invention is the fact that the method is applicable for all levels of packaging, i.e., for highest level packaging, involving chip joining to motherboard or flexible circuit carrier cards or PCMCIA (Personal Computer Memory Card International Association) cards.
- PCMCIA Personal Computer Memory Card International Association
- This invention basically came about as an unexpected result which showed that low melting point solder that is deposited atop a reflowed solder mass alloys only with enough solder mass to form a volume of eutectic alloy. It was also found that relatively little or no further interdiffusion took place even after multiple times of eutectic melting cycles. This is believed to be due to that fact that the amount of low melting point atop the solder mass was equivalent to eutectic composition for the deposited mass of low melting point metal. Thus, a desired volume of eutectic liquid atop a solid solder mass is formed without any need for a barrier.
- a volume of eutectic liquid remains present, whenever the joint temperature is raised to eutectic temperature, even after joining on copper interconnections of circuit carrier; this liquid formation at the joint interface presents an ideal condition for easy removal of the joined chip for the purposes of chip replacement without mechanically or thermally affecting other components on the board.
- solder interconnections using solder balls having a cap of low melting point metal allows for making a low temperature chip attachment directly to any of the higher levels of packaging substrates.
- the solder ball After the solder ball has been formed using standard methods it is reflowed to give the solder ball a smooth surface.
- This method does not need tinning of the carrier or substrate to which the chip is to be joined, which makes this method economical.
- FIG. 1 shows a flexible sheet 10 , preferably a polyamide based flexible material, on which at least one metallic line, such as a copper film, is laminated using at least one first thermo-plastic adhesive 12 , and then the copper film is circuitized to form a plurality of circuits 14 .
- the flexible sheet 10 could be selected from a group comprising organic substrate, multi-layer organic substrate, ceramic substrate or multi-layer ceramic substrate, to name a few.
- the circuit carrier substrate 15 could be made with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces.
- circuits 14 are only shown on one surface.
- At least one stiffener 18 such as a metal foil 18 , or for example, an aluminum foil 18 , is laminated on the backside of the circuit carrier substrate 15 , using at least one second thermo-plastic adhesive 16 , as more clearly shown in FIG. 2. It is preferred that the thickness of the stiffener 18 , is at least about 2 mil, and preferably between about 3 mil to about 5 mil. At least one of the layers for the stiffener 18 , could be selected from a group comprising aluminum, molybdenum, silicon, tantalum or titanium, to name a few.
- a photo-imageable organic material 20 such as, for example, PSR4000 (Trade Name used by Taiyo Co., Japan), is then screened on top of the circuit carrier substrate 15 , and pre-baked at 80° C.
- PSR4000 is optional.
- the solder mask is not required.
- PSR4000 is used here to demonstrate its need to act as solder dam to prevent lateral flow of solder.
- the organic material 20 is then exposed and developed.
- the organic material 20 is next cured at 150° C. This curing process opens a large area, corresponding to the device size. Holes corresponding to foot print of C4 solder balls on IC chips are opened for devices to be joined. This produces a flexible ribbon or card 25 , as clearly shown in FIG. 3.
- FIG. 4 shows the top view of a flexible circuit carrier 23 , having wires or circuits 14 , and electrical interconnections 22 , 24 , 26 and 28 , to receive electronic devices with various joining technologies.
- interconnection 22 could be a pad 22 , which is used for joining of DCA/SOC
- interconnection 24 could be solder 24 , that has been placed using a solder injection method for FCA (Flip Chip Attach).
- interconnection 26 could be screened solder 26 , such as BGA (Ball Grid Array) 26
- interconnect 28 could be screened solder 28 , for SMT (Surface Mount Technology), etc..
- the surface of the organic material 20 can optionally be oxygen ashed at about 130 mT pressure for about 30 minutes. This roughens the surface of the organic material 20 , and this surface roughness improves the flowability of chip encapsulant which are used later.
- FIG. 5 shows the flexible circuit carrier 23 , after it is placed on a specially designed fixture or jig 30 .
- the jig or fixture 30 is preferably made of a glass re-enforced thermosetting polymer.
- the purpose of this jig or fixture 30 is to ensure planarity of the flexible circuit carrier card 23 , during reflow operations.
- the flexible circuit carrier 23 is securely held at the four corners on the jig or fixture 30 , using spring loaded clamps 32 and 34 .
- FIG. 6 shows the securing of one or more of electronic devices 42 , 44 , 46 and 48 , onto the site-dressed flexible circuit carrier 23 , which is itself secured to the jig 30 .
- eutectic Pb—Sn solder is applied on the interconnects or pads 22 , 24 , 26 and 28 . It is preferred that the eutectic solder paste is screened on the SMT pads 28 , eutectic balls are placed for Ball Grid Array pads 26 , and eutectic solder is injected on pads 24 , for FCA, etc. A no clean solder flux is applied at the DCA/SOC sites 22 .
- An IC chip 42 having C4 solder balls 41 , with tin Cap 43 , is next aligned to the DCA/SOC chip site 22 .
- Other electronic devices 44 , 46 and 48 are aligned to their appropriate sites as shown in FIG. 6.
- electronic device 44 with interconnects 45 , is aligned with interconnect 24
- electronic device 46 is aligned with interconnect 26
- electronic device 48 with interconnects 49 , is aligned with interconnect 28 , etc..
- the electronic devices may be discretes like resistors, capacitors, power supplies, IC chips or may be another package like Thin Quad Flat Pack (TQFP), Ball Grid Array (BGA) package, Tape Ball Grid Array (TBGA), amplifying device, circuit carrier card, etc..
- TQFP Thin Quad Flat Pack
- BGA Ball Grid Array
- TBGA Tape Ball Grid Array
- amplifying device circuit carrier card, etc.
- This assembly is then reflowed, preferably, in a belt type furnace.
- heat for the solder reflow could be provided by at least one focused IR lamp. It is preferred that the belt speed and zone temperatures are adjusted so as to give a temperature profile where the assembly of FIG. 6, spends from about 3 to about 5 minutes above about 155° C., and, between about 15 to about 75 seconds at a maximum temperature of about 190° C. to about 230° C.
- the maximum reflow temperature for the solder is between about 190° C. and about 230° C.
- the solder reflow is above about 150° C. for between about 2 to about 5 minutes.
- the time for solder reflow at maximum temperature is between about 15 to about 90 seconds.
- the solder reflow is preferably performed in an environment selected from a group comprising dry nitrogen, forming gas or hydrogen. It should be noted that the heat cycle required for joining this chip is identical to that required for SMT or for Ball Grid Array joining heat profiles, this adds the advantage of simultaneous reflow joining of SOC chips as well as SMT and/or BGA devices. For lower maximum temperature a higher time is required at the maximum temperature.
- FIG. 7 shows an enlarged view of chip 42 , and DCA/SOC interconnection or pad 22 , of FIG. 6.
- the chip or electronic device 42 has a solder ball 41 , that has a cap of low melting point metal 43 .
- the solder ball 41 is itself secured to a pad 52 , via a BLM 56 .
- a layer of insulator 54 protects the surface of the chip 42 .
- the low melting point metal cap 43 on the solder ball 41 , alloys with the solder ball 41 , to form an eutectic composition 53 , which melts at about 183° C.
- the volume of eutectic liquid is enough to envelope the exposed pad 22 , such as, a copper pad 22 , of flexible circuit carrier 23 , and the surface tension of this eutectic liquid provides self aligning of the chip 42 , to the exposed copper pad 22 , on the flexible circuit carrier 23 .
- the reflow temperature cycle evaporates the protective layer, if any, and also the flux, and hence no post cleaning is required.
- FIG. 8 shows an enlarged cross-sectional view of a single interconnect of FIG. 7, after the chip joining operation creating chip-on-flex carrier 50 . It can be clearly seen that the chip 42 , has been secured to the flexible circuit carrier 23 , and that an eutectic solder 53 , has been formed between the interconnect pad 22 , and solder 51 .
- FIG. 9 is an enlarged view of the electronic device or chip 42 , after it has been joined to the flexible circuit carrier 23 , forming the chip-on-flex carrier 50 .
- suitable encapsulant 60 for example, HYSOL 4511, or an epoxy 60 , can be provided under and over the electronic device or chip 42 , and then cured. It has been found that the oxygen ashing step considerably improves the flow of the encapsulant under the chip 42 .
- This encapsulant as shown in FIG. 9, primarily protects the electrical connection that is formed between the chip 42 , and the flexible circuit carrier 23 .
- the solder ball 41 is preferably a high melting point solder ball, such as, for example, a solder ball with about 97 percent lead and about 3 percent tin, which is formed over the ball limiting metallurgy 56 .
- the solder ball 41 could be formed either by evaporation or an electroplating methods of solder deposition. Before the inventive step of this invention is applied to the solder ball 41 , it is preferred that all the processing steps of the semiconductor, such as, wafer testing, electrical testing have been completed and the solder has been re-flowed to bring it back to its spherical shape.
- the IC chip 42 could be a semiconductor wafer, wherein a plurality of devices (not shown) have been formed by conventional methods and interconnected through IC chip internal wires in one or more layers.
- the high melting point solder ball is between about 2 percent to about 10 percent Sn, with the balance being Pb, on the chip with at least one capping layer of low melting point metal, such as, tin, thereby, providing eutectic solder at the tip of the high melting solder ball.
- the flexible circuit carrier substrate 10 could be made of polyamide, polyester or polyethylene based material, in flexible form, with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces.
- the electronic devices typically have electrically conductive feature, such as pad, pins, etc., and wherein material for the electrically conductive features is selected from a group comprising Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof.
- At least one layer of at least one low melting point metal is formed on the solder ball by a method selected from a group comprising Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating or injection.
- the at least one low melting point metal s selected from a group comprising of bismuth, indium, tin or alloys thereof.
- At least one low melting point metal caps between about 10 percent to about 90 percent of the exposed surface of the solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of the solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of the solder ball.
- the low melting point metal could completely envelope the solder ball.
- the average thickness of the at least one low melting point metal cap is between about 15 to about 50 micrometers.
- the material for the flexible circuit carrier could be selected from a group comprising polyimides, poly tetra flouro ethylene (PTFE), polyester or resin-impregnated fabrics, to name a few.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
A structure and method is disclosed for directly attaching a device or package on flexible organic circuit carriers having low cost and high reliability.
IC chips with a new solder interconnect structure, comprised of a layer of pure tin, deposited on the top of high melting Pb—Sn solder balls are employed for joining.
These methods, techniques and metallurgical structures enables direct attachment of electronic devices of any complexity to any substrate and to any level of packaging hierarchy.
Also, devices or packages having other joining technologies, eg. SMT, BGA, TBGA, etc. could be joined onto the flexible circuit carrier.
Description
- This patent application is related to U.S. patent application Ser. No. 08/476,475, entitled, “METHOD FOR FORMING REFLOWED SOLDER BALL WITH LOW MELTING POINT METAL CAP”, filed on Jun. 7, 1995, U.S. patent application Ser. No. 08/476,474, entitled, “REFLOWED SOLDER BALL WITH LOW MELTING POINT METAL CAP”, filed on Jun. 7, 1995, U.S. patent application Ser. No. 08/476,466, entitled, “METHOD FOR MAKING DIRECT CHIP ATTACH CIRCUIT CARD”, filed on Jun. 7, 1995, and U.S. patent application Ser. No. 08/476,472, entitled, “DIRECT CHIP ATTACH CIRCUIT CARD”, filed on Jun. 7, 1995, presently assigned to the assignee of the instant application and the disclosure of which is incorporated herein by reference.
- The present invention relates generally to an improved and cost saving Direct Chip Attach (DCA) on Flexible circuit carriers using Flip Chip Attach (FCA) technology. More particularly, the invention encompasses a structure where at least one Integrated Circuit Chip can be directly attached to a flexible substrate. This direct attachment can be done using C4 (Controlled Collapsed Chip Connection) technology by capping the already reflowed solder balls and forming a eutectic solder composition. A method for such direct chip attachment to the flexible card is also disclosed.
- Semiconductor devices are becoming smaller and more dense with the evolution of new technology. However, increases in circuit density produce a corresponding challenge to improve chip and chip connections in order to remain competitive. Whereas significant process improvements are being made by reducing process variability, process improvements alone are not sufficient to increase both yield and reliability of these products. Further, the packaging technology has not been able to keep pace with IC (Integrated Circuit) chip miniaturization for performance improvements.
- Electronic products typically comprise of plurality of components. The packaging of these components follow a hierarchy where an Integrated Circuit (IC) chip comprising of semiconductor micro-devices are connected (1st level assembly) to carriers made of ceramic or organic laminates comprising one or several layers of metal interconnection lines. These carriers may also contain some other discrete devices like capacitors, resistors etc. Thus assembled carriers with IC chips, along with some kind of sealing and cooling methodology, are called modules.
- These modules, in turn, are connected to cards (2nd level assembly) usually made of organic laminates with printed circuits on either side of the card.
- These cards are then connected to boards (3rd level assembly). Such 3 levels of hierarchy is required in many electronic applications, such as, in computer CPUs where performance of complex functions is required.
- Increased integration in present day IC chips require product miniaturization by eliminating first, second or both levels of packaging. For example, in Direct Access Storage Discs (DASD), read/write functions provided by a static region, comprised of IC chips on an input card, are cross linked to a dynamic region, comprised of memory discs, via Flexible Printed Circuit Boards. A close proximity of static and dynamic regions is required to increase the performance of such DASD. This requires direct bonding of IC chips on Flexible circuit carrier connected to the disc drive.
- The Tape Automated Bonding (TAB) is the most common method presently used for chip attachment on Flexible circuit carrier because it is also the most common method for first level packaging and it is suitable for mounting on flexible base.
- However, TAB is not capable of taking full advantage of the Very Large Scale Integration which not only requires close spacing of I/O pads but also requires an array pattern to accommodate the vast number of I/O pads.
- The TAB itself is a first level of packaging, hence TAB mounting of chips on Flexible circuit carrier precludes it from the Direct Chip Attach technology.
- Another shortcoming of TAB is that it requires additional space to accommodate the wire leads, this limits its capability in bringing the static and dynamic regions close enough.
- Yet another limiting factor for use of TAB is difficulty in testing and/or burning-in of these mounted chips; this limits the yield thus making the product expensive.
- Still yet another shortcoming is that rework is economically unfeasible.
- These limitations necessitate use of a C4 like technology for joining chips on circuit careers.
- The C4 or Controlled Collapse Chip Connection technology has been successfully employed for 1st level assembly of chip on ceramic carriers. The C4 technology is described in detail by many authors, see for example, Microelectronics Packaging handbook, edited by, Rao R. Tummala and Eugene J. Rymaszewski, pages 366-391 (1989), the disclosure of which is incorporated herein by reference.
- The C4 interconnection is comprised of two main elements, a solder wettable pad called Ball Limiting Metallurgy (BLM), and a ball of solder. The BLM is comprised of an adhesive layer like Cr or TiW, and a solder reflowable layer like copper or nickel. The BLM materials and their thicknesses are judiciously chosen to provide good and reliable electrical, mechanical and thermal stability to interconnect structure. The solder material used for C4 is preferably a low percentage (about 2 percent to about 10 percent) tin alloyed with lead. This combination is used:
- (i) to prevent melting of the reflowed solder ball or C4 during the next level of packaging interconnection,
- (ii) to reduce reaction between copper of BLM and tin, as high stresses resulting from excessive copper-tin intermetallic imparts a high stress concentration on underlaying passivation, and,
- (iii) for better thermal fatigue characteristic offered by lower Sn (tin) percentage.
- Presently, there are two problems that limit the use of current C4 technology for 2nd or higher level assembly, or, for Direct Chip Attach on card. First it limits the interconnection to Pin-Through-Hole (PTH) technology and precludes the use of space saving Surface Mount Technology (SMT), because a joining temperature higher than melting point of the SMT solder is required. Second, the relatively high joining temperature (between about 340° C. to about 380° C.) precludes the use of organic card material.
- There are two ways to lower the joining temperature for DCA. One approach is to provide an eutectic (or lower melting) solder on a card metallization. A method pertaining to this approach is described in U.S. Pat. No. 4,967,950 to Legg and Schrottke, which is presently assigned to the assignee of the instant patent application. Legg and Schrottke describes a general scheme for attaching IC chips to flexible substrate (laminate) using C4s. The substrate is “tinned” with an alloy of eutectic composition in its contact region with the solder balls on the base of the chip.
- The method of pre-coating the card, or an organic carrier, by eutectic solder is taught by Fallon et al., U.S. patent application Ser. No. 08/387,686, entitled “Process for Selective Application of Solder to Circuit Packages”, filed on Feb. 13, 1995, and the disclosure of which is incorporated herein by reference. In this method, eutectic solder is electroplated on copper conductors of printed circuit card precisely where the Chip C4 bumps would make contact.
- Another method of pre-coating the card, or an organic carrier, by eutectic solder is taught by Nishimura, U.S. Pat. No. 5,238,176, entitled “Method and apparatus for forming bump”, assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference. In this method, precise amount of eutectic solder, in liquid state, is injected at sites on copper conductors of laminated circuit card through an injector head having openings pertaining to the card part number used. The above methods are limited to rigid substrates.
- A method for flexible substrates, which matches the Legg and Schrottke's scheme of “tinning” the substrate with eutectic alloy, is shown by Milkovich et al., in U.S. patent application Ser. No. 08/071,630, entitled “Manufacturing Flexible Circuit Board Assemblies with Common Heat Spreaders”, filed on Jun. 3, 1993, and assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference. In this method, “decals” of eutectic solder balls with required footprint are first formed which is subsequently transferred on the flexible circuit carrier. Decals are formed by electroplating solder balls on a stainless steel plate. This method requires a photo-imageable solder mask on the Flexible circuit carrier circuit, holes corresponding to the required footprint are developed out in this mask. The decals are transferred by placing the flipped stainless steel plate on flexible circuit carrier card and reflowing. Flexible printed circuit cards are typically made of polyimides, for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.). Using this technique, Milkovich et al., “Double Sided Flexible Carrier with Discretes and Thermally Enhanced FCA/COF” IEEE 43rd ECTC Proceedings, June 1993, pages 16-21, have demonstrated methods of circuitization and device attachments on both sides of the flexible circuit carrier; the disclosure of which is incorporated herein by reference. One of the disadvantage of this method is poor yield.
- A second approach for lowering the joining temperature for Direct Chip Attach (DCA), is to provide a low melting Solder On Chip (SOC) C4 rather than on the carrier conductor. Carey et al., in U.S. Pat. No. 5,075,965 and Agarwala et al., in U.S. Pat. Nos. 5,251,806 and 5,130,779, which are presently assigned to the assignee of the instant patent application, and Japanese Patent Publication No. 62-117346 to Eiji et al., describe various schemes to provide low melting solder on chips. Carey et al., in U.S. Pat. No. 5,075,965, disclose a method, where an inhomogeneous, anisotropic column consists of lead rich bottom and tin rich top of sufficient thickness to form eutectic alloy. The resulting as-deposited and un-reflowed column is then joined onto the card's conductor.
- To circumvent the thermodynamically driven tendency for interdiffusion, Agarwala et al., in U.S. Pat. Nos. 5,251,806 and 5,130,779, showed a structure where the low melt component is separated from the high melt component by interposing a barrier metal layer. This structure does show a hierarchy of solder material, however, in this structure the column of high melting solder never get reflowed. Because, the stacked solder does not get reflowed there is no metallurgical reaction between the solder stack and the adhesive pad of BLM which is known to cause poor mechanical integrity of the C4 joint.
- Eiji et al., in Japanese Patent Publication No. 62-117346, describes an anisotropic column structure of low and high melting solders. The basic objective of this invention is essentially to provide an increase height of a solder joint rather than to provide a low melting solder joining process. In Eiji et al., a high-melting point metallic layer is secured to a chip and a substrate and a low-melting point metallic layer is then formed. the two low-melting point metallic layers are then joined and thereby the chip is joined to the substrate.
- IBM Technical Disclosure Bulletin, entitled “Indium-Lead-Indium Chip Joining”, W. A. Dawson et al., vol. 11, No. 11, page 1528 (April 1969), discloses the standard capping of lead with either indium or tin for diffusion bonding. In order to alleviate the problem of chip collapse onto the surface of the substrate an intermediate temperature is employed.
- For the purpose of this invention a bump completely composed of low melting composition is a feature to be avoided as the high tin content reacts with all of the copper of the adhesive layer (BLM) giving a thick intermetallic layer. High stresses of reacted BLM have been known to cause solder pads to fall off and to create insulation cracking. The eutectic solder bumps also have poor electromigration and thermal fatigue lifetime. It is also known that low melting eutectic solder suffers from void formation due to thermal migration which causes circuit failure.
- Yet another drawback of inhomogeneous, anisotropic solder column is that this structure is unfavorable for electrical tests of circuitry before joining the chips on carriers as the electrical probes gouge into the low melt cap during testing and destroy the cap. Furthermore, for the chip burn-in it is also not feasible to use any of the known multilayered solder balls, as the temperature that is generally used is between about 120° C. and about 150° C. for burn-in which will cause inter diffusion of the low and the high melt components even before the joining operation begins.
- This invention relates generally to interconnection in electronic circuit packages, and more particularly shows a new solder interconnection technology to make a Direct Chip Attachment (DCA) on Flexible organic circuit carrier.
- According to the present invention a method is provided for preparing the flexible circuit carrier card for direct device attachment using low melting Solder On Chip (SOC) where the low melting eutectic alloy is formed during joining operation and is localized at the tip of the standard high melting C4 ball.
- The invention is a novel method and structure for providing direct device attach to flexible circuit card using a novel solder interconnection scheme.
- Accordingly, it is a purpose of the present invention to provide a method for preparing the flexible circuit carrier card for direct device attachment using a novel solder interconnection scheme.
- Another purpose of this invention is to provide a method for simultaneously joining devices on Flexible card using the DCA/SOC, the method of the instant, along with various Flip Chip, SMT and/or BGA (Ball Grid Array) technologies.
- It is a further purpose of the present invention to provide a method of directly attaching one or more of devices using one or more of joining technologies and having flexibility to discretely remove and replace devices joined with various technologies.
- Another purpose of this invention is to provide a Flexible circuit card/device assembly which has increased performance.
- Yet another purpose of this invention is to provide for a Flexible circuit carrier card which is low in cost, easy to build and possesses high reliability.
- Still yet another purpose of this invention is to provide a Flexible circuit carrier card with mounted devices which has low profile, is compact in design and has low weight.
- Yet another purpose of this invention is to have a Flexible card which is compatible with wafer level electrical test and burn-in.
- Therefore, in one aspect this invention comprises a method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of:
- (a) providing said electronic device with at least one reflowed solder ball, wherein said reflowed solder ball has at least one coating of at least one low melting point metal to form a metallic cap,
- (b) adhering at least one layer of at least one stiffener sheet with at least one thermo-plastic adhesive onto at least one surface of a flexible sheet,
- (c) forming at least one electrically conductive metal line on said at least one surface of said flexible sheet,
- (d) coating at least a portion of said flexible carrier with at least one insulator material, and removing selective portions of said insulator material and exposing selective portions of said metal line, and forming a flexible circuit carrier,
- (e) screening eutectic solder paste to coat selective sites on said flexible circuit carrier,
- (f) placing said flexible circuit carrier on an assembly fixture to hold said flexible circuit carrier,
- (g) dispensing at least one solder flux at selective sites on said flexible circuit carrier,
- (h) aligning and placing said electronic device onto said flexible circuit carrier, such that reflowed solder ball with metallic cap makes contacts with said solder flux, and upon heating forms an electrical connection between said electronic device and said flexible circuit carrier.
- In another aspect this invention comprises a flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic.
- The features of the invention believed to be novel and the elements characteristic of the invention are set forth with particularity in the appended claims. The drawings are for illustration purposes only and are not drawn to scale. Furthermore, like numbers represent like features in the drawings. The invention itself, however, both as to organization and method of operation, may best be understood by reference to the detailed description which follows taken in conjunction with the accompanying drawings in which:
- FIG. 1, shows a cross-section of a flexible circuit carrier substrate having at least one flexible sheet with at least one circuit on at least one surface.
- FIG. 2, shows a cross-section of the flexible circuit carrier substrate of FIG. 1, after a stiffener has been secured using at least one adhesive.
- FIG. 3, shows a cross-section of the flexible circuit carrier substrate after at least one layer of an organic material has been adhered adjacent to the circuits.
- FIG. 4, shows a flexible circuit carrier that has been site-dressed for joining at least one electronic device.
- FIG. 5, shows the securing of the flexible circuit carrier of FIG. 4, onto a support jig.
- FIG. 6, shows the securing of one or more of electronic devices onto the site-dressed flexible circuit carrier card.
- FIG. 7, shows an enlarged view of a solder ball interconnect having at least one metallic cap being secured to a single metallic pad.
- FIG. 8, shows an enlarged cross-sectional view of the solder interconnect of FIG. 7, secured to the metallic pad after the reflow operation.
- FIG. 9, is an enlarged cross-sectional view after at least one encapsulant has encapsulated at least one solder connection of FIG. 8.
- The invention basically encompasses a flexible circuit carrier with metallic conductor lines, such as, copper. Openings are made at sites which will be electrically connected to an electronic device using reflowed solder with a metallic cap. Ashing of the surface of the flexible circuit carrier could also be done to improve the adhesion and the flow of encapsulants. Solder paste could be screened for SMT, solder balls could be placed for BGA, or, solder could also be placed by solder injection for various flip chip attach methods. Likewise, either one or both surfaces of the flexible circuit carrier could be prepared to secure various electronic devices.
- The invention also encompasses the formation of a direct chip attach (DCA) on the flexible circuit carrier surface. This is done by aligning the solder interconnections with a cap of low melting point metal on the chip with the corresponding footprints on the flexible circuit carrier. The assembly is then held at a bias temperature of about 150° C. and then individual chips are heated, preferably with Infra Red (IR) heat source to a temperature of between about 190° C. to about 220° C. in a nitrogen or a forming gas environment. The assembly is then cooled and the chip is preferably encapsulated with an epoxy based encapsulant, such as, HYSOL 4511, Trade Name used by Dexter Hysol of California, USA.
- An advantage of this invention is the fact that the method is applicable for all levels of packaging, i.e., for highest level packaging, involving chip joining to motherboard or flexible circuit carrier cards or PCMCIA (Personal Computer Memory Card International Association) cards.
- This invention basically came about as an unexpected result which showed that low melting point solder that is deposited atop a reflowed solder mass alloys only with enough solder mass to form a volume of eutectic alloy. It was also found that relatively little or no further interdiffusion took place even after multiple times of eutectic melting cycles. This is believed to be due to that fact that the amount of low melting point atop the solder mass was equivalent to eutectic composition for the deposited mass of low melting point metal. Thus, a desired volume of eutectic liquid atop a solid solder mass is formed without any need for a barrier. A volume of eutectic liquid remains present, whenever the joint temperature is raised to eutectic temperature, even after joining on copper interconnections of circuit carrier; this liquid formation at the joint interface presents an ideal condition for easy removal of the joined chip for the purposes of chip replacement without mechanically or thermally affecting other components on the board.
- As stated earlier that the solder interconnections using solder balls having a cap of low melting point metal allows for making a low temperature chip attachment directly to any of the higher levels of packaging substrates. After the solder ball has been formed using standard methods it is reflowed to give the solder ball a smooth surface. A layer of metal, such as tin, preferably, pure tin, is deposited on the top of the solder balls. This structure results in localizing of the eutectic alloy, formed upon subsequent low temperature joining cycle, on top of the solder ball even after multiple low temperature reflow cycles.
- This method does not need tinning of the carrier or substrate to which the chip is to be joined, which makes this method economical.
- It has also been noticed that whenever temperature is raised slightly above the eutectic temperature, the structure always forms a liquid fillet around the joint with copper wires. This liquid fillet formation results in substantial thermal fatigue life improvement for reduced stress at interface; and secondly, provides an easy means to remove chip for the purpose of chip replacement and field repairs.
- These methods, techniques and metallurgical structures enables direct attachment of devices of any complexity to any substrate and to any level of packaging hierarchy; thereby, making the products more economical and more compact as well as resulting a better performance.
- Referring now to the drawings, wherein like reference numerals represent the same or similar parts throughout, FIG. 1, shows a
flexible sheet 10, preferably a polyamide based flexible material, on which at least one metallic line, such as a copper film, is laminated using at least one first thermo-plastic adhesive 12, and then the copper film is circuitized to form a plurality ofcircuits 14. Theflexible sheet 10, could be selected from a group comprising organic substrate, multi-layer organic substrate, ceramic substrate or multi-layer ceramic substrate, to name a few. To those skilled in the art, it should be apparent that thecircuit carrier substrate 15, could be made with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces. For the ease ofunderstanding circuits 14, are only shown on one surface. - After the
circuit carrier substrate 15, has been formed, at least onestiffener 18, such as ametal foil 18, or for example, analuminum foil 18, is laminated on the backside of thecircuit carrier substrate 15, using at least one second thermo-plastic adhesive 16, as more clearly shown in FIG. 2. It is preferred that the thickness of thestiffener 18, is at least about 2 mil, and preferably between about 3 mil to about 5 mil. At least one of the layers for thestiffener 18, could be selected from a group comprising aluminum, molybdenum, silicon, tantalum or titanium, to name a few. - As shown in FIG. 3, a photo-imageable
organic material 20, such as, for example, PSR4000 (Trade Name used by Taiyo Co., Japan), is then screened on top of thecircuit carrier substrate 15, and pre-baked at 80° C. The use of PSR4000 is optional. For the method of the present invention, the solder mask is not required. PSR4000 is used here to demonstrate its need to act as solder dam to prevent lateral flow of solder. Theorganic material 20, is then exposed and developed. - The
organic material 20, is next cured at 150° C. This curing process opens a large area, corresponding to the device size. Holes corresponding to foot print of C4 solder balls on IC chips are opened for devices to be joined. This produces a flexible ribbon orcard 25, as clearly shown in FIG. 3. - FIG. 4, shows the top view of a
flexible circuit carrier 23, having wires orcircuits 14, andelectrical interconnections interconnection 22, could be apad 22, which is used for joining of DCA/SOC, interconnection 24, could be solder 24, that has been placed using a solder injection method for FCA (Flip Chip Attach). Similarly,interconnection 26, could be screenedsolder 26, such as BGA (Ball Grid Array) 26, andinterconnect 28, could be screenedsolder 28, for SMT (Surface Mount Technology), etc.. - The surface of the
organic material 20, can optionally be oxygen ashed at about 130 mT pressure for about 30 minutes. This roughens the surface of theorganic material 20, and this surface roughness improves the flowability of chip encapsulant which are used later. - FIG. 5, shows the
flexible circuit carrier 23, after it is placed on a specially designed fixture orjig 30. The jig orfixture 30, is preferably made of a glass re-enforced thermosetting polymer. The purpose of this jig orfixture 30, is to ensure planarity of the flexiblecircuit carrier card 23, during reflow operations. Theflexible circuit carrier 23, is securely held at the four corners on the jig orfixture 30, using spring loaded clamps 32 and 34. - FIG. 6, shows the securing of one or more of
electronic devices flexible circuit carrier 23, which is itself secured to thejig 30. Depending upon the joining technology that is going to be used eutectic Pb—Sn solder is applied on the interconnects orpads SMT pads 28, eutectic balls are placed for BallGrid Array pads 26, and eutectic solder is injected on pads 24, for FCA, etc. A no clean solder flux is applied at the DCA/SOC sites 22. - An
IC chip 42, havingC4 solder balls 41, withtin Cap 43, is next aligned to the DCA/SOC chip site 22. Otherelectronic devices electronic device 44, withinterconnects 45, is aligned with interconnect 24,electronic device 46, is aligned withinterconnect 26,electronic device 48, withinterconnects 49, is aligned withinterconnect 28, etc.. It should be obvious to artisan in the field, that the electronic devices may be discretes like resistors, capacitors, power supplies, IC chips or may be another package like Thin Quad Flat Pack (TQFP), Ball Grid Array (BGA) package, Tape Ball Grid Array (TBGA), amplifying device, circuit carrier card, etc.. - This assembly is then reflowed, preferably, in a belt type furnace. However, heat for the solder reflow could be provided by at least one focused IR lamp. It is preferred that the belt speed and zone temperatures are adjusted so as to give a temperature profile where the assembly of FIG. 6, spends from about 3 to about 5 minutes above about 155° C., and, between about 15 to about 75 seconds at a maximum temperature of about 190° C. to about 230° C. The maximum reflow temperature for the solder is between about 190° C. and about 230° C. The solder reflow is above about 150° C. for between about 2 to about 5 minutes. The time for solder reflow at maximum temperature is between about 15 to about 90 seconds. The solder reflow is preferably performed in an environment selected from a group comprising dry nitrogen, forming gas or hydrogen. It should be noted that the heat cycle required for joining this chip is identical to that required for SMT or for Ball Grid Array joining heat profiles, this adds the advantage of simultaneous reflow joining of SOC chips as well as SMT and/or BGA devices. For lower maximum temperature a higher time is required at the maximum temperature.
- FIG. 7, shows an enlarged view of
chip 42, and DCA/SOC interconnection orpad 22, of FIG. 6. The chip orelectronic device 42, has asolder ball 41, that has a cap of lowmelting point metal 43. Thesolder ball 41, is itself secured to apad 52, via aBLM 56. Preferably, a layer ofinsulator 54, protects the surface of thechip 42. During the heating cycle the low meltingpoint metal cap 43, on thesolder ball 41, alloys with thesolder ball 41, to form aneutectic composition 53, which melts at about 183° C. The volume of eutectic liquid is enough to envelope the exposedpad 22, such as, acopper pad 22, offlexible circuit carrier 23, and the surface tension of this eutectic liquid provides self aligning of thechip 42, to the exposedcopper pad 22, on theflexible circuit carrier 23. The reflow temperature cycle evaporates the protective layer, if any, and also the flux, and hence no post cleaning is required. - FIG. 8, shows an enlarged cross-sectional view of a single interconnect of FIG. 7, after the chip joining operation creating chip-on-
flex carrier 50. It can be clearly seen that thechip 42, has been secured to theflexible circuit carrier 23, and that aneutectic solder 53, has been formed between theinterconnect pad 22, andsolder 51. - FIG. 9 is an enlarged view of the electronic device or
chip 42, after it has been joined to theflexible circuit carrier 23, forming the chip-on-flex carrier 50. In order to protect the electrical connections between theelectronic device 42, such as,chip 42, and theflexible circuit carrier 23,suitable encapsulant 60, for example, HYSOL 4511, or an epoxy 60, can be provided under and over the electronic device orchip 42, and then cured. It has been found that the oxygen ashing step considerably improves the flow of the encapsulant under thechip 42. This encapsulant as shown in FIG. 9, primarily protects the electrical connection that is formed between thechip 42, and theflexible circuit carrier 23. - The
solder ball 41, is preferably a high melting point solder ball, such as, for example, a solder ball with about 97 percent lead and about 3 percent tin, which is formed over theball limiting metallurgy 56. Thesolder ball 41, could be formed either by evaporation or an electroplating methods of solder deposition. Before the inventive step of this invention is applied to thesolder ball 41, it is preferred that all the processing steps of the semiconductor, such as, wafer testing, electrical testing have been completed and the solder has been re-flowed to bring it back to its spherical shape. - It should be apparent that the
IC chip 42, could be a semiconductor wafer, wherein a plurality of devices (not shown) have been formed by conventional methods and interconnected through IC chip internal wires in one or more layers. - It is preferred that the high melting point solder ball is between about 2 percent to about 10 percent Sn, with the balance being Pb, on the chip with at least one capping layer of low melting point metal, such as, tin, thereby, providing eutectic solder at the tip of the high melting solder ball.
- To those skilled in the art, it should be obvious that the flexible
circuit carrier substrate 10, could be made of polyamide, polyester or polyethylene based material, in flexible form, with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces. - The electronic devices typically have electrically conductive feature, such as pad, pins, etc., and wherein material for the electrically conductive features is selected from a group comprising Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof.
- It is preferred that at least one layer of at least one low melting point metal is formed on the solder ball by a method selected from a group comprising Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating or injection.
- And, wherein the at least one low melting point metal s selected from a group comprising of bismuth, indium, tin or alloys thereof.
- It is preferred that at least one low melting point metal, caps between about 10 percent to about 90 percent of the exposed surface of the solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of the solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of the solder ball. However, in some cased the low melting point metal could completely envelope the solder ball.
- The average thickness of the at least one low melting point metal cap is between about 15 to about 50 micrometers.
- It should be appreciated that other materials for the flexible circuit carrier could be used, such as, the material for the flexible circuit carrier could be selected from a group comprising polyimides, poly tetra flouro ethylene (PTFE), polyester or resin-impregnated fabrics, to name a few.
- While the present invention has been particularly described, in conjunction with a specific preferred embodiment, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art in light of the foregoing description. It is therefore contemplated that the appended claims will embrace any such alternatives, modifications and variations as falling within the true scope and spirit of the present invention.
Claims (45)
1. A method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of:
(a) providing said electronic device with at least one reflowed solder ball, wherein said reflowed solder ball has at least one coating of at least one low melting point metal to form a metallic cap,
(b) adhering at least one layer of at least one stiffener sheet with at least one thermo-plastic adhesive onto at least one surface of a flexible sheet,
(c) forming at least one electrically conductive metal line on said at least one surface of said flexible sheet,
(d) coating at least a portion of said flexible carrier with at least one insulator material, and removing selective portions of said insulator material and exposing selective portions of said metal line, and forming a flexible circuit carrier,
(e) screening eutectic solder paste to coat selective sites on said flexible circuit carrier,
(f) placing said flexible circuit carrier on an assembly fixture to hold said flexible circuit carrier,
(g) dispensing at least one solder flux at selective sites on said flexible circuit carrier,
(h) aligning and placing said electronic device onto said flexible circuit carrier, such that reflowed solder ball with metallic cap makes contacts with said solder flux, and upon heating forms an electrical connection between said electronic device and said flexible circuit carrier.
2. The method of , wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
claim 1
3. The method of , wherein at least a portion of said flexible circuit carrier is encapsulated with at least one epoxy.
claim 1
4. The method of , wherein at least a portion of the surface of said insulator material is roughened.
claim 1
5. The method of , wherein- said surface is roughened using oxygen plasma.
claim 4
6. The method of , wherein a portion of said flexible circuit carrier is screened and reflowed using eutectic solder.
claim 1
7. The method of , wherein said eutectic solder is deposited using a method selected from a group consisting of solder injection, electroplating, electroless plating, and decal placements.
claim 6
8. The method of , wherein a portion of said flexible circuit carrier is screened and reflowed using eutectic solder, and wherein said eutectic solder provides screened ball grid array electrical connection.
claim 1
9. The method of , wherein said electronic device is selected from a group consisting of an IC chip, a capacitor, a resistor, a circuit carrier card, a power supplier and an amplifying device.
claim 1
10. The method of , wherein said flexible sheet is selected from a group consisting of organic substrate, multi-layer organic substrate, ceramic substrate and multi-layer ceramic substrate.
claim 1
11. The method of , wherein said solder ball is selected from a group consisting of high melting point solder and low melting point solder.
claim 1
12. The method of , wherein said solder ball is on an electrically conductive feature of said electronic device.
claim 1
13. The method of , wherein material for said electrically conductive feature is selected from a group consisting of Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof.
claim 12
14. The method of , wherein said electrically conductive feature is in electrical contact with at least one internal electrically conductive feature.
claim 12
15. The method of , wherein said eutectic solder is selected from a group consisting of Pb, Bi, In, Sn, Ag, Au, and alloys thereof.
claim 1
16. The method of , wherein said solder ball comprises of a lead-tin alloy, and wherein said alloy contains between about 2 percent to about 10 percent tin.
claim 1
17. The method of , wherein said solder ball comprises of a lead-tin alloy, and wherein said alloy contains between about 90 percent to about 98 percent lead.
claim 1
18. The method of , wherein said solder ball is formed on said electronic device using a method selected from the group consisting of evaporation, electroplating and solder injection.
claim 1
19. The method of , wherein said at least one layer of at least one low melting point metal is formed on said solder ball by a method selected from a group consisting of Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating and injection.
claim 1
20. The method of , wherein said at least one low melting point metal is selected from a group consisting of bismuth, indium, tin and alloys thereof.
claim 1
21. The method of , wherein said at least one low melting point alloy is selected from a group consisting of lead, bismuth, indium, tin and alloys thereof.
claim 1
22. The method of , wherein said at least one low melting point metal completely envelopes said solder ball.
claim 1
23. The method of , wherein heat for said solder reflow is provided by at least one focused IR lamp.
claim 1
24. The method of , wherein average thickness of said at least one low melting point metal cap is between about 15 to about 50 micro-meters.
claim 1
25. The method of , wherein said at least one low melting point metal, caps between about 10 percent to about 90 percent of the exposed surface of said solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of said solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of said solder ball.
claim 1
26. The method of , where thickness of said at least one low melting point metal cap is chosen to provide a eutectic volume of between about 5 percent to about 50 percent of the volume of said solder ball, and preferably between about 10 percent to about 30 percent of the volume of said solder ball.
claim 1
27. The method of , wherein at least a portion of said metal cap is secured to an electrically conductive feature on said flexible circuit carrier.
claim 1
28. The method of , wherein material for said electrically conductive feature is selected from a group consisting of Au, Co, Cr, Cu, Fe, Ni, Ta, Ti, TiW, phased Cr and Cu, and alloys thereof.
claim 27
29. The method of , wherein said flexible circuit carrier is selected from a group consisting of an interposer, a first level package, a PCMCIA card, a disc drive, a second level package, and a mother board.
claim 1
30. The method of , wherein maximum reflow temperature for said solder is between about 190 and about 230° C.
claim 1
31. The method of , wherein said step of solder reflow is above about 150° C. for between about 2 to about 5 minutes.
claim 1
32. The method of , wherein time for solder reflow at maximum temperature is between about 15 to about 90 seconds.
claim 1
33. The method of , wherein said solder reflow is performed in an environment selected from a group consisting of dry nitrogen, forming gas and hydrogen.
claim 1
34. The method of , wherein said flexible circuit carrier is either a flexible organic laminated card or a flexible inorganic laminated card.
claim 1
35. The method of , wherein material for said flexible organic circuit carrier is selected from a group consisting of polyimides, poly tetra flouro ethylene (PTFE), polyester and resin-impregnated fabrics.
claim 34
36. The method of joining an electronic device, having C4 solder balls with tin cap, on a flexible circuit carrier of , comprising the steps of:
claim 1
(a) aligning C4 balls of said electronic device with corresponding openings in said passivation layer of said flexible circuit carrier,
(b) holding said electronic device in place by surface tension afforded by solder flux, and
(c) reflowing said C4 solder to bond said electronic device to the flexible circuit carrier.
37. The method of , wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
claim 36
38. A flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically-connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic.
39. The carrier of , wherein said electronic card has at least one SMT secured thereto.
claim 38
40. The carrier of , wherein said electronic card has a ball grid array.
claim 38
41. The carrier of , wherein said electronic card has a SMT connection.
claim 38
42. The carrier of , wherein at least a portion of said electronic card has at least one coating of an insulator material.
claim 38
43. The carrier of , wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
claim 38
44. The carrier of , wherein said flexible device carrier has at least one stiffener secured to at least one side.
claim 38
45. The carrier of , wherein said stiffener is selected from a group consisting of aluminum, molybdenum, silicon, tantalum and titanium.
claim 44
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/932,864 US20010013423A1 (en) | 1996-10-31 | 1997-09-18 | Flip chip attach on flexible circuit carrier using chip with metallic cap on solder |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/740,571 US5729896A (en) | 1996-10-31 | 1996-10-31 | Method for attaching a flip chip on flexible circuit carrier using chip with metallic cap on solder |
US08/932,864 US20010013423A1 (en) | 1996-10-31 | 1997-09-18 | Flip chip attach on flexible circuit carrier using chip with metallic cap on solder |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/740,571 Continuation US5729896A (en) | 1996-10-31 | 1996-10-31 | Method for attaching a flip chip on flexible circuit carrier using chip with metallic cap on solder |
Publications (1)
Publication Number | Publication Date |
---|---|
US20010013423A1 true US20010013423A1 (en) | 2001-08-16 |
Family
ID=24977111
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/740,571 Expired - Fee Related US5729896A (en) | 1996-10-31 | 1996-10-31 | Method for attaching a flip chip on flexible circuit carrier using chip with metallic cap on solder |
US08/932,864 Abandoned US20010013423A1 (en) | 1996-10-31 | 1997-09-18 | Flip chip attach on flexible circuit carrier using chip with metallic cap on solder |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/740,571 Expired - Fee Related US5729896A (en) | 1996-10-31 | 1996-10-31 | Method for attaching a flip chip on flexible circuit carrier using chip with metallic cap on solder |
Country Status (4)
Country | Link |
---|---|
US (2) | US5729896A (en) |
CN (1) | CN1128469C (en) |
MY (1) | MY123847A (en) |
SG (1) | SG53104A1 (en) |
Cited By (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6730541B2 (en) * | 1997-11-20 | 2004-05-04 | Texas Instruments Incorporated | Wafer-scale assembly of chip-size packages |
US20040198074A1 (en) * | 2003-04-01 | 2004-10-07 | Swier Wayne K. | Electrical interconnect assemblies and methods of forming same |
WO2004112128A2 (en) * | 2003-06-09 | 2004-12-23 | Staktek Group, L.P. | Low profile stacking system and method |
US20050051792A1 (en) * | 2003-09-09 | 2005-03-10 | Citizen Electronics Co., Ltd. | Semiconductor package |
US20050062144A1 (en) * | 2001-10-26 | 2005-03-24 | Staktek Group, L.P. | Memory expansion and chip scale stacking system and method |
US20050072835A1 (en) * | 2003-10-01 | 2005-04-07 | Samsung Electronics Co., Ltd. | SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same |
US20050110164A1 (en) * | 2003-11-10 | 2005-05-26 | Chippac, Inc. | Bump-on-lead flip chip interconnection |
US6913343B2 (en) | 2003-04-30 | 2005-07-05 | Hewlett-Packard Development Company, L.P. | Methods for forming and protecting electrical interconnects and resultant assemblies |
US20050233571A1 (en) * | 2003-08-22 | 2005-10-20 | Advanced Semiconductor Engineering, Inc. | Flip chip package, semiconductor package with bumps and method for manufacturing semiconductor package with bumps |
US6985362B2 (en) * | 2000-09-07 | 2006-01-10 | International Business Machines Corporation | Printed circuit board and electronic package using same |
US20060091525A1 (en) * | 2004-11-04 | 2006-05-04 | Ngk Spark Plug Co., Ltd. | Wiring board with semiconductor component |
US20060131263A1 (en) * | 2003-04-30 | 2006-06-22 | Kawamura Naoto A | Slotted substrates and methods and systems for forming same |
US20070235873A1 (en) * | 2006-03-28 | 2007-10-11 | Cheng Hsu M | Pad structures and methods for forming pad structures |
US20070252274A1 (en) * | 2006-04-26 | 2007-11-01 | Daubenspeck Timothy H | Method for forming c4 connections on integrated circuit chips and the resulting devices |
US20080237591A1 (en) * | 2002-08-08 | 2008-10-02 | Elm Technology Corporation | Vertical system integration |
US20090067210A1 (en) * | 1997-04-04 | 2009-03-12 | Leedy Glenn J | Three dimensional structure memory |
US20090175104A1 (en) * | 1997-04-04 | 2009-07-09 | Leedy Glenn J | Three dimensional structure memory |
US20090230552A1 (en) * | 2004-11-10 | 2009-09-17 | Stats Chippac, Ltd. | Bump-on-Lead Flip Chip Interconnection |
US20090250811A1 (en) * | 2004-11-10 | 2009-10-08 | Stats Chippac, Ltd. | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask |
US20090264025A1 (en) * | 2006-04-14 | 2009-10-22 | Kabushiki Kaisha Nihon Micronics | Probe sheet and electrical connecting apparatus |
US20100008056A1 (en) * | 2004-02-02 | 2010-01-14 | Panasonic Corporation | Stereoscopic electronic circuit device, and relay board and relay frame used therein |
US20100007019A1 (en) * | 2008-04-03 | 2010-01-14 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection |
US7656678B2 (en) | 2001-10-26 | 2010-02-02 | Entorian Technologies, Lp | Stacked module systems |
US20100029099A1 (en) * | 2006-04-07 | 2010-02-04 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US7659633B2 (en) * | 2004-11-10 | 2010-02-09 | Stats Chippac, Ltd. | Solder joint flip chip interconnection having relief structure |
US20100065966A1 (en) * | 2006-12-14 | 2010-03-18 | Stats Chippac, Ltd. | Solder Joint Flip Chip Interconnection |
US20100099222A1 (en) * | 2006-12-14 | 2010-04-22 | Stats Chippac, Ltd. | Solder Joint Flip Chip Interconnection Having Relief Structure |
US20100105224A1 (en) * | 2006-09-28 | 2010-04-29 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US7719098B2 (en) | 2001-10-26 | 2010-05-18 | Entorian Technologies Lp | Stacked modules and method |
US7737549B2 (en) | 2004-09-03 | 2010-06-15 | Entorian Technologies Lp | Circuit module with thermal casing systems |
US7760513B2 (en) | 2004-09-03 | 2010-07-20 | Entorian Technologies Lp | Modified core for circuit module system and method |
US7768796B2 (en) | 2004-09-03 | 2010-08-03 | Entorian Technologies L.P. | Die module system |
US7804985B2 (en) | 2006-11-02 | 2010-09-28 | Entorian Technologies Lp | Circuit module having force resistant construction |
US20110074022A1 (en) * | 2000-03-10 | 2011-03-31 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Flipchip Interconnect Structure |
US20110074024A1 (en) * | 2003-11-10 | 2011-03-31 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Bump-on-Lead Interconnection |
US20110084386A1 (en) * | 2003-11-10 | 2011-04-14 | Stats Chippac, Ltd. | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask |
US20110121464A1 (en) * | 2009-11-24 | 2011-05-26 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Electrical Interconnect with Stress Relief Void |
US20110151627A1 (en) * | 2009-12-18 | 2011-06-23 | International Business Machines Corporation | Overcoming laminate warpage and misalignment in flip-chip packages |
US20110159444A1 (en) * | 2006-04-14 | 2011-06-30 | Kabushiki Kaisha Nihon Micronics | Method for manufacturing probe sheet |
US20110186989A1 (en) * | 2010-02-04 | 2011-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor Device and Bump Formation Process |
US20110285023A1 (en) * | 2010-05-20 | 2011-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate Interconnections having Different Sizes |
USRE44500E1 (en) | 2003-11-10 | 2013-09-17 | Stats Chippac, Ltd. | Semiconductor device and method of forming composite bump-on-lead interconnection |
USRE44608E1 (en) | 2003-11-10 | 2013-11-26 | Stats Chippac, Ltd. | Solder joint flip chip interconnection |
US8674500B2 (en) | 2003-12-31 | 2014-03-18 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US8841779B2 (en) | 2005-03-25 | 2014-09-23 | Stats Chippac, Ltd. | Semiconductor device and method of forming high routing density BOL BONL and BONP interconnect sites on substrate |
US9105530B2 (en) | 2012-09-18 | 2015-08-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive contacts having varying widths and method of manufacturing same |
US9159665B2 (en) | 2005-03-25 | 2015-10-13 | Stats Chippac, Ltd. | Flip chip interconnection having narrow interconnection sites on the substrate |
US20160029486A1 (en) * | 2014-07-24 | 2016-01-28 | Samsung Electro-Mechanics Co., Ltd. | Solder joint structure and electronic component module including the same |
US9299674B2 (en) | 2012-04-18 | 2016-03-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump-on-trace interconnect |
US9425136B2 (en) | 2012-04-17 | 2016-08-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conical-shaped or tier-shaped pillar connections |
US9646923B2 (en) | 2012-04-17 | 2017-05-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices |
US9875988B2 (en) | 2015-10-29 | 2018-01-23 | Semtech Corporation | Semiconductor device and method of forming DCALGA package using semiconductor die with micro pillars |
USRE47600E1 (en) | 2003-11-10 | 2019-09-10 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming electrical interconnect with stress relief void |
Families Citing this family (100)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19633486C1 (en) | 1996-08-20 | 1998-01-15 | Heraeus Sensor Nite Gmbh | Manufacturing method for circuit board with thin conduction paths and good solderable connection-contact regions e.g for measurement resistor or heating element |
US6117759A (en) * | 1997-01-03 | 2000-09-12 | Motorola Inc. | Method for multiplexed joining of solder bumps to various substrates during assembly of an integrated circuit package |
IT1291779B1 (en) * | 1997-02-17 | 1999-01-21 | Magnetek Spa | PROCEDURE FOR THE REALIZATION OF PRINTED CIRCUITS AND PRINTED CIRCUITS THUS OBTAINED |
US5877560A (en) * | 1997-02-21 | 1999-03-02 | Raytheon Company | Flip chip microwave module and fabrication method |
US6330967B1 (en) * | 1997-03-13 | 2001-12-18 | International Business Machines Corporation | Process to produce a high temperature interconnection |
US6082610A (en) | 1997-06-23 | 2000-07-04 | Ford Motor Company | Method of forming interconnections on electronic modules |
US6050481A (en) * | 1997-06-25 | 2000-04-18 | International Business Machines Corporation | Method of making a high melting point solder ball coated with a low melting point solder |
US6059172A (en) * | 1997-06-25 | 2000-05-09 | International Business Machines Corporation | Method for establishing electrical communication between a first object having a solder ball and a second object |
US6407461B1 (en) * | 1997-06-27 | 2002-06-18 | International Business Machines Corporation | Injection molded integrated circuit chip assembly |
US6120885A (en) | 1997-07-10 | 2000-09-19 | International Business Machines Corporation | Structure, materials, and methods for socketable ball grid |
US6297559B1 (en) * | 1997-07-10 | 2001-10-02 | International Business Machines Corporation | Structure, materials, and applications of ball grid array interconnections |
US6025649A (en) * | 1997-07-22 | 2000-02-15 | International Business Machines Corporation | Pb-In-Sn tall C-4 for fatigue enhancement |
US6074895A (en) * | 1997-09-23 | 2000-06-13 | International Business Machines Corporation | Method of forming a flip chip assembly |
US6121678A (en) | 1997-12-19 | 2000-09-19 | Stmicroelectronics, Inc. | Wrap-around interconnect for fine pitch ball grid array |
US6235996B1 (en) * | 1998-01-28 | 2001-05-22 | International Business Machines Corporation | Interconnection structure and process module assembly and rework |
US6056831A (en) * | 1998-07-10 | 2000-05-02 | International Business Machines Corporation | Process for chemically and mechanically enhancing solder surface properties |
US6250540B1 (en) | 1999-04-30 | 2001-06-26 | International Business Machines Corporation | Fluxless joining process for enriched solders |
US6607613B2 (en) | 1998-07-10 | 2003-08-19 | International Business Machines Corporation | Solder ball with chemically and mechanically enhanced surface properties |
US6337509B2 (en) | 1998-07-16 | 2002-01-08 | International Business Machines Corporation | Fixture for attaching a conformal chip carrier to a flip chip |
JP4239310B2 (en) * | 1998-09-01 | 2009-03-18 | ソニー株式会社 | Manufacturing method of semiconductor device |
JP3351355B2 (en) * | 1998-09-29 | 2002-11-25 | 株式会社デンソー | Electronic component mounting structure |
US6329713B1 (en) * | 1998-10-21 | 2001-12-11 | International Business Machines Corporation | Integrated circuit chip carrier assembly comprising a stiffener attached to a dielectric substrate |
US6657313B1 (en) * | 1999-01-19 | 2003-12-02 | International Business Machines Corporation | Dielectric interposer for chip to substrate soldering |
US6657309B1 (en) * | 1999-02-08 | 2003-12-02 | Rohm Co., Ltd. | Semiconductor chip and semiconductor device of chip-on-chip structure |
US6404212B1 (en) | 1999-02-18 | 2002-06-11 | St Assembly Test Services Pte Ltd | Testing of BGA and other CSP packages using probing techniques |
US6524346B1 (en) * | 1999-02-26 | 2003-02-25 | Micron Technology, Inc. | Stereolithographic method for applying materials to electronic component substrates and resulting structures |
US6127731A (en) * | 1999-03-11 | 2000-10-03 | International Business Machines Corporation | Capped solder bumps which form an interconnection with a tailored reflow melting point |
JP3209977B2 (en) * | 1999-04-02 | 2001-09-17 | 沖電気工業株式会社 | Semiconductor module |
JP3428488B2 (en) * | 1999-04-12 | 2003-07-22 | 株式会社村田製作所 | Electronic component manufacturing method |
US6341418B1 (en) * | 1999-04-29 | 2002-01-29 | International Business Machines Corporation | Method for direct chip attach by solder bumps and an underfill layer |
US6333209B1 (en) | 1999-04-29 | 2001-12-25 | International Business Machines Corporation | One step method for curing and joining BGA solder balls |
US6281576B1 (en) | 1999-06-16 | 2001-08-28 | International Business Machines Corporation | Method of fabricating structure for chip micro-joining |
US6805278B1 (en) | 1999-10-19 | 2004-10-19 | Fci America Technology, Inc. | Self-centering connector with hold down |
CA2313551A1 (en) * | 1999-10-21 | 2001-04-21 | International Business Machines Corporation | Wafer integrated rigid support ring |
CN1119830C (en) * | 2000-04-27 | 2003-08-27 | 中国科学院上海冶金研究所 | Device transfering technology |
EP1176639B1 (en) * | 2000-07-28 | 2007-06-20 | Infineon Technologies AG | Method for contacting a semiconductor chip |
JP2002076589A (en) * | 2000-08-31 | 2002-03-15 | Hitachi Ltd | Electronic device and its manufacturing method |
US6931723B1 (en) * | 2000-09-19 | 2005-08-23 | International Business Machines Corporation | Organic dielectric electronic interconnect structures and method for making |
WO2002093637A2 (en) * | 2001-05-17 | 2002-11-21 | Koninklijke Philips Electronics N.V. | Product comprising a substrate and a chip attached to the substrate |
JP3634773B2 (en) * | 2001-06-08 | 2005-03-30 | アルプス電気株式会社 | Magnetic head and manufacturing method thereof |
US6869831B2 (en) * | 2001-09-14 | 2005-03-22 | Texas Instruments Incorporated | Adhesion by plasma conditioning of semiconductor chip surfaces |
US6670071B2 (en) * | 2002-01-15 | 2003-12-30 | Quallion Llc | Electric storage battery construction and method of manufacture |
US6622380B1 (en) | 2002-02-12 | 2003-09-23 | Micron Technology, Inc. | Methods for manufacturing microelectronic devices and methods for mounting microelectronic packages to circuit boards |
US6877653B2 (en) * | 2002-02-27 | 2005-04-12 | Advanced Semiconductor Engineering, Inc. | Method of modifying tin to lead ratio in tin-lead bump |
US6849935B2 (en) | 2002-05-10 | 2005-02-01 | Sarnoff Corporation | Low-cost circuit board materials and processes for area array electrical interconnections over a large area between a device and the circuit board |
USRE41914E1 (en) | 2002-05-10 | 2010-11-09 | Ponnusamy Palanisamy | Thermal management in electronic displays |
US6838114B2 (en) | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
US6821347B2 (en) | 2002-07-08 | 2004-11-23 | Micron Technology, Inc. | Apparatus and method for depositing materials onto microelectronic workpieces |
US6955725B2 (en) * | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
US6791845B2 (en) * | 2002-09-26 | 2004-09-14 | Fci Americas Technology, Inc. | Surface mounted electrical components |
DE10258798A1 (en) * | 2002-12-16 | 2004-07-22 | Siemens Ag | Method and device for partially applying adhesive to electronic components, mounting device for mounting components |
DE10258800A1 (en) * | 2002-12-16 | 2004-07-08 | Siemens Ag | Method and device for applying an adhesive layer to flat components, placement device for loading flat components |
US7335396B2 (en) * | 2003-04-24 | 2008-02-26 | Micron Technology, Inc. | Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
US7344755B2 (en) * | 2003-08-21 | 2008-03-18 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
US7235138B2 (en) * | 2003-08-21 | 2007-06-26 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
US7422635B2 (en) | 2003-08-28 | 2008-09-09 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
US7056806B2 (en) * | 2003-09-17 | 2006-06-06 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces |
US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
US7581511B2 (en) * | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
US7258892B2 (en) * | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
US7167375B2 (en) * | 2004-01-16 | 2007-01-23 | Motorola, Inc. | Populated printed wiring board and method of manufacture |
US7906393B2 (en) * | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
US7584942B2 (en) * | 2004-03-31 | 2009-09-08 | Micron Technology, Inc. | Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
US20050249873A1 (en) * | 2004-05-05 | 2005-11-10 | Demetrius Sarigiannis | Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices |
US8133554B2 (en) | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
US7699932B2 (en) * | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
TWI331370B (en) * | 2004-06-18 | 2010-10-01 | Megica Corp | Connection between two circuitry components |
US8067837B2 (en) | 2004-09-20 | 2011-11-29 | Megica Corporation | Metallization structure over passivation layer for IC chip |
KR100701641B1 (en) * | 2004-08-02 | 2007-03-30 | 도레이새한 주식회사 | Method and apparatus for manufacturing flexible printed circuit board depositing copper plating layer by vapor deposition |
US7383629B2 (en) * | 2004-11-19 | 2008-06-10 | Endicott Interconnect Technologies, Inc. | Method of making circuitized substrates utilizing smooth-sided conductive layers as part thereof |
CN100441069C (en) * | 2005-01-21 | 2008-12-03 | 财团法人工业技术研究院 | Electronic component package and packaging method |
US20060165873A1 (en) * | 2005-01-25 | 2006-07-27 | Micron Technology, Inc. | Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes |
US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
US7804165B2 (en) | 2005-05-04 | 2010-09-28 | Nxp B.V. | Device comprising a sensor module |
NL1029954C2 (en) * | 2005-09-14 | 2007-03-15 | Assembleon Nv | Method for heating a strip-shaped carrier as well as such a device. |
TW200816421A (en) * | 2006-09-29 | 2008-04-01 | Novatek Microelectronics Corp | Chip package, chip structure and manufacturing process thereof |
US20080160751A1 (en) * | 2006-12-28 | 2008-07-03 | Mengzhi Pang | Microelectronic die including solder caps on bumping sites thereof and method of making same |
CN101262744B (en) * | 2007-03-08 | 2011-01-19 | 奈电软性科技电子(珠海)有限公司 | False sticker |
US20110019378A1 (en) * | 2009-07-27 | 2011-01-27 | Tod A. Byquist | Composite micro-contacts |
CN101661916B (en) * | 2009-09-18 | 2012-05-09 | 可富科技股份有限公司 | Structure for re-wiring layer on soft film flip chip encapsulation |
CN102064117B (en) * | 2010-11-19 | 2013-09-11 | 上海凯虹电子有限公司 | Method for encapsulating small-size chip |
EP2641208B1 (en) | 2010-11-19 | 2020-04-29 | Nagravision S.A. | Method to detect cloned software |
CN102225500A (en) * | 2011-05-30 | 2011-10-26 | 昆山元崧电子科技有限公司 | Auxiliary welding clamp for fuse |
CN102323451A (en) * | 2011-05-30 | 2012-01-18 | 华南理工大学 | A kind of method and device that detects interconnection solder joint electric migration performance |
US8240545B1 (en) * | 2011-08-11 | 2012-08-14 | Western Digital (Fremont), Llc | Methods for minimizing component shift during soldering |
US9831170B2 (en) * | 2011-12-30 | 2017-11-28 | Deca Technologies, Inc. | Fully molded miniaturized semiconductor module |
JP5502139B2 (en) * | 2012-05-16 | 2014-05-28 | 日本特殊陶業株式会社 | Wiring board |
TWI490508B (en) * | 2012-12-17 | 2015-07-01 | Princo Corp | Flexible testing device and testing method thereof |
US20140239569A1 (en) | 2013-02-26 | 2014-08-28 | International Business Machines Corporation | Universal clamping fixture to maintain laminate flatness during chip join |
TWI467711B (en) * | 2013-09-10 | 2015-01-01 | Chipbond Technology Corp | Semiconductorstructure |
WO2016129705A1 (en) * | 2015-02-13 | 2016-08-18 | パイクリスタル株式会社 | Method for forming laminated circuit board, and laminated circuit board formed using same |
US10204893B2 (en) | 2016-05-19 | 2019-02-12 | Invensas Bonding Technologies, Inc. | Stacked dies and methods for forming bonded structures |
US10403577B1 (en) * | 2018-05-03 | 2019-09-03 | Invensas Corporation | Dielets on flexible and stretchable packaging for microelectronics |
US11462419B2 (en) | 2018-07-06 | 2022-10-04 | Invensas Bonding Technologies, Inc. | Microelectronic assemblies |
US11296053B2 (en) | 2019-06-26 | 2022-04-05 | Invensas Bonding Technologies, Inc. | Direct bonded stack structures for increased reliability and improved yield in microelectronics |
KR102692970B1 (en) * | 2020-03-11 | 2024-08-07 | 동우 화인켐 주식회사 | Touch sensor module and image display device including the same |
US11631647B2 (en) | 2020-06-30 | 2023-04-18 | Adeia Semiconductor Bonding Technologies Inc. | Integrated device packages with integrated device die and dummy element |
US11728273B2 (en) | 2020-09-04 | 2023-08-15 | Adeia Semiconductor Bonding Technologies Inc. | Bonded structure with interconnect structure |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62117346A (en) * | 1985-11-18 | 1987-05-28 | Fujitsu Ltd | Semiconductor device |
US4967950A (en) * | 1989-10-31 | 1990-11-06 | International Business Machines Corporation | Soldering method |
JPH0417390A (en) * | 1990-05-10 | 1992-01-22 | Matsushita Electric Ind Co Ltd | Bonding of electronic parts |
US5130779A (en) * | 1990-06-19 | 1992-07-14 | International Business Machines Corporation | Solder mass having conductive encapsulating arrangement |
US5251806A (en) * | 1990-06-19 | 1993-10-12 | International Business Machines Corporation | Method of forming dual height solder interconnections |
JPH0499393A (en) * | 1990-08-08 | 1992-03-31 | Nec Corp | Method for soldering electronic component to hybrid integrated circuit |
US5075965A (en) * | 1990-11-05 | 1991-12-31 | International Business Machines | Low temperature controlled collapse chip attach process |
JP2940269B2 (en) * | 1990-12-26 | 1999-08-25 | 日本電気株式会社 | Connecting method of integrated circuit element |
JPH04297091A (en) * | 1991-03-26 | 1992-10-21 | Furukawa Electric Co Ltd:The | Solder coating printed circuit board and manufacture thereof |
JPH0666314B2 (en) * | 1991-05-31 | 1994-08-24 | インターナショナル・ビジネス・マシーンズ・コーポレイション | Bump forming method and apparatus |
US5261155A (en) * | 1991-08-12 | 1993-11-16 | International Business Machines Corporation | Method for bonding flexible circuit to circuitized substrate to provide electrical connection therebetween using different solders |
US5297333A (en) * | 1991-09-24 | 1994-03-29 | Nec Corporation | Packaging method for flip-chip type semiconductor device |
JPH05152733A (en) * | 1991-11-30 | 1993-06-18 | Suzuki Motor Corp | Printed wiring board for surface mount |
US5289631A (en) * | 1992-03-04 | 1994-03-01 | Mcnc | Method for testing, burn-in, and/or programming of integrated circuit chips |
US5489750A (en) * | 1993-03-11 | 1996-02-06 | Matsushita Electric Industrial Co., Ltd. | Method of mounting an electronic part with bumps on a circuit board |
US5478420A (en) * | 1994-07-28 | 1995-12-26 | International Business Machines Corporation | Process for forming open-centered multilayer ceramic substrates |
WO1996008037A1 (en) * | 1994-09-06 | 1996-03-14 | Sheldahl, Inc. | Printed circuit substrate having unpackaged integrated circuit chips directly mounted thereto and method of manufacture |
US5634268A (en) * | 1995-06-07 | 1997-06-03 | International Business Machines Corporation | Method for making direct chip attach circuit card |
-
1996
- 1996-10-31 US US08/740,571 patent/US5729896A/en not_active Expired - Fee Related
-
1997
- 1997-09-18 US US08/932,864 patent/US20010013423A1/en not_active Abandoned
- 1997-10-14 SG SG1997003744A patent/SG53104A1/en unknown
- 1997-10-14 MY MYPI97004824A patent/MY123847A/en unknown
- 1997-10-15 CN CN97120465A patent/CN1128469C/en not_active Expired - Fee Related
Cited By (152)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9401183B2 (en) | 1997-04-04 | 2016-07-26 | Glenn J. Leedy | Stacked integrated memory device |
US8824159B2 (en) | 1997-04-04 | 2014-09-02 | Glenn J. Leedy | Three dimensional structure memory |
US8653672B2 (en) | 1997-04-04 | 2014-02-18 | Glenn J Leedy | Three dimensional structure memory |
US8629542B2 (en) | 1997-04-04 | 2014-01-14 | Glenn J. Leedy | Three dimensional structure memory |
US20090174082A1 (en) * | 1997-04-04 | 2009-07-09 | Glenn J Leedy | Three dimensional structure memory |
US8841778B2 (en) | 1997-04-04 | 2014-09-23 | Glenn J Leedy | Three dimensional memory structure |
US20090219743A1 (en) * | 1997-04-04 | 2009-09-03 | Leedy Glenn J | Three dimensional structure memory |
US8907499B2 (en) | 1997-04-04 | 2014-12-09 | Glenn J Leedy | Three dimensional structure memory |
US20090218700A1 (en) * | 1997-04-04 | 2009-09-03 | Leedy Glenn J | Three dimensional structure memory |
US8928119B2 (en) | 1997-04-04 | 2015-01-06 | Glenn J. Leedy | Three dimensional structure memory |
US8933570B2 (en) * | 1997-04-04 | 2015-01-13 | Elm Technology Corp. | Three dimensional structure memory |
US20110198672A1 (en) * | 1997-04-04 | 2011-08-18 | Leedy Glenn J | Three dimensional structure memory |
US20090067210A1 (en) * | 1997-04-04 | 2009-03-12 | Leedy Glenn J | Three dimensional structure memory |
US8796862B2 (en) | 1997-04-04 | 2014-08-05 | Glenn J Leedy | Three dimensional memory structure |
US20090219742A1 (en) * | 1997-04-04 | 2009-09-03 | Leedy Glenn J | Three dimensional structure memory |
US20100171224A1 (en) * | 1997-04-04 | 2010-07-08 | Leedy Glenn J | Three dimensional structure memory |
US20100171225A1 (en) * | 1997-04-04 | 2010-07-08 | Leedy Glenn J | Three dimensional structure memory |
US20090219772A1 (en) * | 1997-04-04 | 2009-09-03 | Leedy Glenn J | Three dimensional structure memory |
US20090175104A1 (en) * | 1997-04-04 | 2009-07-09 | Leedy Glenn J | Three dimensional structure memory |
US20090230501A1 (en) * | 1997-04-04 | 2009-09-17 | Leedy Glenn J | Three dimensional structure memory |
US6730541B2 (en) * | 1997-11-20 | 2004-05-04 | Texas Instruments Incorporated | Wafer-scale assembly of chip-size packages |
US10388626B2 (en) * | 2000-03-10 | 2019-08-20 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming flipchip interconnect structure |
US20120241945A9 (en) * | 2000-03-10 | 2012-09-27 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Flipchip Interconnect Structure |
US20110074022A1 (en) * | 2000-03-10 | 2011-03-31 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Flipchip Interconnect Structure |
US6985362B2 (en) * | 2000-09-07 | 2006-01-10 | International Business Machines Corporation | Printed circuit board and electronic package using same |
US7719098B2 (en) | 2001-10-26 | 2010-05-18 | Entorian Technologies Lp | Stacked modules and method |
US7656678B2 (en) | 2001-10-26 | 2010-02-02 | Entorian Technologies, Lp | Stacked module systems |
US20050062144A1 (en) * | 2001-10-26 | 2005-03-24 | Staktek Group, L.P. | Memory expansion and chip scale stacking system and method |
US20080284611A1 (en) * | 2002-08-08 | 2008-11-20 | Elm Technology Corporation | Vertical system integration |
US20090194768A1 (en) * | 2002-08-08 | 2009-08-06 | Leedy Glenn J | Vertical system integration |
US20080237591A1 (en) * | 2002-08-08 | 2008-10-02 | Elm Technology Corporation | Vertical system integration |
US8587102B2 (en) | 2002-08-08 | 2013-11-19 | Glenn J Leedy | Vertical system integration |
US6905342B2 (en) | 2003-04-01 | 2005-06-14 | Hewlett-Packard Development Company, L.P. | Protected electrical interconnect assemblies |
US20040198074A1 (en) * | 2003-04-01 | 2004-10-07 | Swier Wayne K. | Electrical interconnect assemblies and methods of forming same |
US7083267B2 (en) | 2003-04-30 | 2006-08-01 | Hewlett-Packard Development Company, L.P. | Slotted substrates and methods and systems for forming same |
US20060131263A1 (en) * | 2003-04-30 | 2006-06-22 | Kawamura Naoto A | Slotted substrates and methods and systems for forming same |
US20050248617A1 (en) * | 2003-04-30 | 2005-11-10 | Mohammad Akhavain | Methods for forming and protecting electrical interconnects and resultant assemblies |
US7338149B2 (en) | 2003-04-30 | 2008-03-04 | Hewlett-Packard Development Company, L.P. | Methods for forming and protecting electrical interconnects and resultant assemblies |
US6913343B2 (en) | 2003-04-30 | 2005-07-05 | Hewlett-Packard Development Company, L.P. | Methods for forming and protecting electrical interconnects and resultant assemblies |
WO2004112128A3 (en) * | 2003-06-09 | 2005-07-14 | Staktek Group Lp | Low profile stacking system and method |
WO2004112128A2 (en) * | 2003-06-09 | 2004-12-23 | Staktek Group, L.P. | Low profile stacking system and method |
US20050233571A1 (en) * | 2003-08-22 | 2005-10-20 | Advanced Semiconductor Engineering, Inc. | Flip chip package, semiconductor package with bumps and method for manufacturing semiconductor package with bumps |
US20050051792A1 (en) * | 2003-09-09 | 2005-03-10 | Citizen Electronics Co., Ltd. | Semiconductor package |
US7199400B2 (en) * | 2003-09-09 | 2007-04-03 | Citizen Electronics Co., Ltd. | Semiconductor package |
US20050072835A1 (en) * | 2003-10-01 | 2005-04-07 | Samsung Electronics Co., Ltd. | SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same |
US7219825B2 (en) * | 2003-10-01 | 2007-05-22 | Samsung Electronics Co., Ltd. | SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same |
CN100413632C (en) * | 2003-10-01 | 2008-08-27 | 三星电子株式会社 | Snagau solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same |
US9219045B2 (en) * | 2003-11-10 | 2015-12-22 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US9922915B2 (en) | 2003-11-10 | 2018-03-20 | STATS ChipPAC Pte. Ltd. | Bump-on-lead flip chip interconnection |
US9865556B2 (en) | 2003-11-10 | 2018-01-09 | STATS ChipPAC Pte Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US8810029B2 (en) | 2003-11-10 | 2014-08-19 | Stats Chippac, Ltd. | Solder joint flip chip interconnection |
US20100164100A1 (en) * | 2003-11-10 | 2010-07-01 | Stats Chippac, Ltd. | Bump-on-Lead Flip Chip Interconnection |
US7700407B2 (en) | 2003-11-10 | 2010-04-20 | Stats Chippac, Ltd. | Method of forming a bump-on-lead flip chip interconnection having higher escape routing density |
US9899286B2 (en) | 2003-11-10 | 2018-02-20 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US20080213941A1 (en) * | 2003-11-10 | 2008-09-04 | Pendse Rajendra D | Bump-on-Lead Flip Chip Interconnection |
US8759972B2 (en) | 2003-11-10 | 2014-06-24 | Stats Chippac, Ltd. | Semiconductor device and method of forming composite bump-on-lead interconnection |
US20140131869A1 (en) * | 2003-11-10 | 2014-05-15 | Stats Chippac, Ltd. | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask |
US7368817B2 (en) * | 2003-11-10 | 2008-05-06 | Chippac, Inc. | Bump-on-lead flip chip interconnection |
US9385101B2 (en) | 2003-11-10 | 2016-07-05 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming bump-on-lead interconnection |
USRE44761E1 (en) | 2003-11-10 | 2014-02-11 | Stats Chippac, Ltd. | Solder joint flip chip interconnection having relief structure |
USRE44608E1 (en) | 2003-11-10 | 2013-11-26 | Stats Chippac, Ltd. | Solder joint flip chip interconnection |
US20110074024A1 (en) * | 2003-11-10 | 2011-03-31 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Bump-on-Lead Interconnection |
US20110084386A1 (en) * | 2003-11-10 | 2011-04-14 | Stats Chippac, Ltd. | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask |
US9379084B2 (en) | 2003-11-10 | 2016-06-28 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
USRE44579E1 (en) | 2003-11-10 | 2013-11-05 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US9373573B2 (en) | 2003-11-10 | 2016-06-21 | STATS ChipPAC Pte. Ltd. | Solder joint flip chip interconnection |
US8574959B2 (en) | 2003-11-10 | 2013-11-05 | Stats Chippac, Ltd. | Semiconductor device and method of forming bump-on-lead interconnection |
USRE44562E1 (en) | 2003-11-10 | 2013-10-29 | Stats Chippac, Ltd. | Solder joint flip chip interconnection having relief structure |
US7973406B2 (en) | 2003-11-10 | 2011-07-05 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
US9064858B2 (en) | 2003-11-10 | 2015-06-23 | Stats Chippac, Ltd. | Semiconductor device and method of forming bump-on-lead interconnection |
US8558378B2 (en) | 2003-11-10 | 2013-10-15 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
US20110215468A1 (en) * | 2003-11-10 | 2011-09-08 | Stats Chippac, Ltd. | Bump-on-Lead Flip Chip Interconnection |
USRE44524E1 (en) | 2003-11-10 | 2013-10-08 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
US9029196B2 (en) | 2003-11-10 | 2015-05-12 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
USRE44500E1 (en) | 2003-11-10 | 2013-09-17 | Stats Chippac, Ltd. | Semiconductor device and method of forming composite bump-on-lead interconnection |
US9773685B2 (en) | 2003-11-10 | 2017-09-26 | STATS ChipPAC Pte. Ltd. | Solder joint flip chip interconnection having relief structure |
US8188598B2 (en) | 2003-11-10 | 2012-05-29 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
USRE44431E1 (en) | 2003-11-10 | 2013-08-13 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
USRE44377E1 (en) | 2003-11-10 | 2013-07-16 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
US20050110164A1 (en) * | 2003-11-10 | 2005-05-26 | Chippac, Inc. | Bump-on-lead flip chip interconnection |
USRE47600E1 (en) | 2003-11-10 | 2019-09-10 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming electrical interconnect with stress relief void |
USRE44355E1 (en) | 2003-11-10 | 2013-07-09 | Stats Chippac, Ltd. | Method of forming a bump-on-lead flip chip interconnection having higher escape routing density |
US8674500B2 (en) | 2003-12-31 | 2014-03-18 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US20100008056A1 (en) * | 2004-02-02 | 2010-01-14 | Panasonic Corporation | Stereoscopic electronic circuit device, and relay board and relay frame used therein |
US7737549B2 (en) | 2004-09-03 | 2010-06-15 | Entorian Technologies Lp | Circuit module with thermal casing systems |
US7760513B2 (en) | 2004-09-03 | 2010-07-20 | Entorian Technologies Lp | Modified core for circuit module system and method |
US7768796B2 (en) | 2004-09-03 | 2010-08-03 | Entorian Technologies L.P. | Die module system |
US7488896B2 (en) * | 2004-11-04 | 2009-02-10 | Ngk Spark Plug Co., Ltd. | Wiring board with semiconductor component |
US20060091525A1 (en) * | 2004-11-04 | 2006-05-04 | Ngk Spark Plug Co., Ltd. | Wiring board with semiconductor component |
US7901983B2 (en) | 2004-11-10 | 2011-03-08 | Stats Chippac, Ltd. | Bump-on-lead flip chip interconnection |
US20090250811A1 (en) * | 2004-11-10 | 2009-10-08 | Stats Chippac, Ltd. | Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask |
US20090230552A1 (en) * | 2004-11-10 | 2009-09-17 | Stats Chippac, Ltd. | Bump-on-Lead Flip Chip Interconnection |
US7659633B2 (en) * | 2004-11-10 | 2010-02-09 | Stats Chippac, Ltd. | Solder joint flip chip interconnection having relief structure |
US8026128B2 (en) | 2004-11-10 | 2011-09-27 | Stats Chippac, Ltd. | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US9159665B2 (en) | 2005-03-25 | 2015-10-13 | Stats Chippac, Ltd. | Flip chip interconnection having narrow interconnection sites on the substrate |
US8841779B2 (en) | 2005-03-25 | 2014-09-23 | Stats Chippac, Ltd. | Semiconductor device and method of forming high routing density BOL BONL and BONP interconnect sites on substrate |
US10580749B2 (en) | 2005-03-25 | 2020-03-03 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming high routing density interconnect sites on substrate |
US20070235873A1 (en) * | 2006-03-28 | 2007-10-11 | Cheng Hsu M | Pad structures and methods for forming pad structures |
US7759776B2 (en) * | 2006-03-28 | 2010-07-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Space transformer having multi-layer pad structures |
US7934944B2 (en) | 2006-04-07 | 2011-05-03 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US20100029099A1 (en) * | 2006-04-07 | 2010-02-04 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US8202684B2 (en) | 2006-04-14 | 2012-06-19 | Kabushiki Kaisha Nihon Micronics | Method for manufacturing probe sheet |
US20090264025A1 (en) * | 2006-04-14 | 2009-10-22 | Kabushiki Kaisha Nihon Micronics | Probe sheet and electrical connecting apparatus |
US20110159444A1 (en) * | 2006-04-14 | 2011-06-30 | Kabushiki Kaisha Nihon Micronics | Method for manufacturing probe sheet |
US7800001B2 (en) * | 2006-04-14 | 2010-09-21 | Kabushiki Kaisha Nihon Micronics | Probe sheet and electrical connecting apparatus |
US7635643B2 (en) | 2006-04-26 | 2009-12-22 | International Business Machines Corporation | Method for forming C4 connections on integrated circuit chips and the resulting devices |
US20070252274A1 (en) * | 2006-04-26 | 2007-11-01 | Daubenspeck Timothy H | Method for forming c4 connections on integrated circuit chips and the resulting devices |
US20100105224A1 (en) * | 2006-09-28 | 2010-04-29 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US7934945B2 (en) | 2006-09-28 | 2011-05-03 | Kabushiki Kaisha Nihon Micronics | Electrical connecting apparatus |
US7804985B2 (en) | 2006-11-02 | 2010-09-28 | Entorian Technologies Lp | Circuit module having force resistant construction |
US8216930B2 (en) | 2006-12-14 | 2012-07-10 | Stats Chippac, Ltd. | Solder joint flip chip interconnection having relief structure |
US8129841B2 (en) | 2006-12-14 | 2012-03-06 | Stats Chippac, Ltd. | Solder joint flip chip interconnection |
US20100099222A1 (en) * | 2006-12-14 | 2010-04-22 | Stats Chippac, Ltd. | Solder Joint Flip Chip Interconnection Having Relief Structure |
US20100065966A1 (en) * | 2006-12-14 | 2010-03-18 | Stats Chippac, Ltd. | Solder Joint Flip Chip Interconnection |
US20100007019A1 (en) * | 2008-04-03 | 2010-01-14 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection |
US8076232B2 (en) | 2008-04-03 | 2011-12-13 | Stats Chippac, Ltd. | Semiconductor device and method of forming composite bump-on-lead interconnection |
TWI508200B (en) * | 2009-05-22 | 2015-11-11 | Stats Chippac Ltd | Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask |
US8350384B2 (en) | 2009-11-24 | 2013-01-08 | Stats Chippac, Ltd. | Semiconductor device and method of forming electrical interconnect with stress relief void |
US20110121464A1 (en) * | 2009-11-24 | 2011-05-26 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Electrical Interconnect with Stress Relief Void |
US20110151627A1 (en) * | 2009-12-18 | 2011-06-23 | International Business Machines Corporation | Overcoming laminate warpage and misalignment in flip-chip packages |
US8304290B2 (en) * | 2009-12-18 | 2012-11-06 | International Business Machines Corporation | Overcoming laminate warpage and misalignment in flip-chip packages |
US9960134B2 (en) | 2010-02-04 | 2018-05-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and bump formation process |
US10522491B2 (en) | 2010-02-04 | 2019-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and bump formation process |
US9455183B2 (en) | 2010-02-04 | 2016-09-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and bump formation process |
US20110186989A1 (en) * | 2010-02-04 | 2011-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor Device and Bump Formation Process |
US11348889B2 (en) | 2010-02-04 | 2022-05-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and bump formation process |
US9773755B2 (en) | 2010-05-20 | 2017-09-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate interconnections having different sizes |
US20110285023A1 (en) * | 2010-05-20 | 2011-11-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate Interconnections having Different Sizes |
US9142533B2 (en) * | 2010-05-20 | 2015-09-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Substrate interconnections having different sizes |
KR101807311B1 (en) | 2010-12-03 | 2017-12-08 | 스태츠 칩팩 피티이. 엘티디. | Semiconductor device and method of forming bump-on-lead interconnection |
US9646923B2 (en) | 2012-04-17 | 2017-05-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices |
US11315896B2 (en) | 2012-04-17 | 2022-04-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conical-shaped or tier-shaped pillar connections |
US9425136B2 (en) | 2012-04-17 | 2016-08-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conical-shaped or tier-shaped pillar connections |
US10056345B2 (en) | 2012-04-17 | 2018-08-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conical-shaped or tier-shaped pillar connections |
US10153243B2 (en) | 2012-04-17 | 2018-12-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices |
US11682651B2 (en) | 2012-04-18 | 2023-06-20 | Taiwan Semiconductor Manufacturing Company | Bump-on-trace interconnect |
US9299674B2 (en) | 2012-04-18 | 2016-03-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump-on-trace interconnect |
US10847493B2 (en) | 2012-04-18 | 2020-11-24 | Taiwan Semiconductor Manufacturing, Ltd. | Bump-on-trace interconnect |
US9991224B2 (en) | 2012-04-18 | 2018-06-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump-on-trace interconnect having varying widths and methods of forming same |
US10510710B2 (en) | 2012-04-18 | 2019-12-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump-on-trace interconnect |
US9953939B2 (en) | 2012-09-18 | 2018-04-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive contacts having varying widths and method of manufacturing same |
US10319691B2 (en) | 2012-09-18 | 2019-06-11 | Taiwan Semiconductor Manufacturing Company | Solderless interconnection structure and method of forming same |
US10008459B2 (en) | 2012-09-18 | 2018-06-26 | Taiwan Semiconductor Manufacturing Company | Structures having a tapering curved profile and methods of making same |
US9111817B2 (en) | 2012-09-18 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Bump structure and method of forming same |
US9105530B2 (en) | 2012-09-18 | 2015-08-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive contacts having varying widths and method of manufacturing same |
US9966346B2 (en) | 2012-09-18 | 2018-05-08 | Taiwan Semiconductor Manufacturing Company | Bump structure and method of forming same |
US11043462B2 (en) | 2012-09-18 | 2021-06-22 | Taiwan Semiconductor Manufacturing Company | Solderless interconnection structure and method of forming same |
US9496233B2 (en) | 2012-09-18 | 2016-11-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnection structure and method of forming same |
US9508668B2 (en) | 2012-09-18 | 2016-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive contacts having varying widths and method of manufacturing same |
US11961810B2 (en) | 2012-09-18 | 2024-04-16 | Taiwan Semiconductor Manufacturing Company | Solderless interconnection structure and method of forming same |
US20160029486A1 (en) * | 2014-07-24 | 2016-01-28 | Samsung Electro-Mechanics Co., Ltd. | Solder joint structure and electronic component module including the same |
US9875988B2 (en) | 2015-10-29 | 2018-01-23 | Semtech Corporation | Semiconductor device and method of forming DCALGA package using semiconductor die with micro pillars |
Also Published As
Publication number | Publication date |
---|---|
MY123847A (en) | 2006-06-30 |
CN1181619A (en) | 1998-05-13 |
SG53104A1 (en) | 1998-09-28 |
US5729896A (en) | 1998-03-24 |
CN1128469C (en) | 2003-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5729896A (en) | Method for attaching a flip chip on flexible circuit carrier using chip with metallic cap on solder | |
US5634268A (en) | Method for making direct chip attach circuit card | |
US5796591A (en) | Direct chip attach circuit card | |
US6336262B1 (en) | Process of forming a capacitor with multi-level interconnection technology | |
US6344234B1 (en) | Method for forming reflowed solder ball with low melting point metal cap | |
US6259159B1 (en) | Reflowed solder ball with low melting point metal cap | |
US5715144A (en) | Multi-layer, multi-chip pyramid and circuit board structure | |
US5907903A (en) | Multi-layer-multi-chip pyramid and circuit board structure and method of forming same | |
US6319751B1 (en) | Bumpless flip chip assembly with solder via | |
US5790377A (en) | Integral copper column with solder bump flip chip | |
US6994243B2 (en) | Low temperature solder chip attach structure and process to produce a high temperature interconnection | |
US20060201997A1 (en) | Fine pad pitch organic circuit board with plating solder and method for fabricating the same | |
JP2003152002A (en) | Electronic device, method for sealing the same and method for connecting the same | |
US5808853A (en) | Capacitor with multi-level interconnection technology | |
US5631447A (en) | Uses of uniaxially electrically conductive articles | |
JPH07170098A (en) | Mounting structure of electronic parts and mounting method | |
JP2003518743A (en) | Organic packages with solder for reliable flip-chip connection | |
US6984792B2 (en) | Dielectric interposer for chip to substrate soldering | |
US7545028B2 (en) | Solder ball assembly for a semiconductor device and method of fabricating same | |
US6757968B2 (en) | Chip scale packaging on CTE matched printed wiring boards | |
Ghosal et al. | Ceramic and Plastic Pin Grid Array Technology | |
US20040256737A1 (en) | [flip-chip package substrate and flip-chip bonding process thereof] | |
Andros et al. | TBGA package technology | |
JP3024097B2 (en) | Multilayer insulating capacitor directly connected to a device carrier by solder balls and a circuit card assembly including the multilayer insulating capacitor | |
Jackson et al. | MicroCSP Wafer Level Chip Scale Package |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |