skip to main content
10.5555/1580134.1580195guideproceedingsArticle/Chapter ViewAbstractPublication PagesConference Proceedingsacm-pubtype
Article

Neural network characterization of scanning electron microscopy

Published: 22 July 2008 Publication History

Abstract

A scanning electron microscope (SEM) is a sophisticated equipment employed for fine imaging of processed film surfaces. In this study, a prediction model of scanning electron microscopy was constructed by using a generalized regression neural network (GRNN). The SEM components examined include condenser lens 1 and 2 and Objective lens (coarse and fine) referred to as CL1, CL2, OL-Coarse, and OL-Fine. For a systematic modeling of SEM characteristic, a Box-Wilson experiment was conducted. The prediction performance of GRNN was optimized by using a genetic algorithm (GA). The prediction error of GA-GRNN model is 1.96 ×10-12 at a spread range of 0.2. From an optimized model, 3D plots were generated to interpret parameter effects on SEM resolution. For the variation in CL2 and OL-Coarse, the highest resolution (R) could be achieved in all conditions except for the two large sections, larger CL2 at smaller or larger OL-Coarse. For the variations in CL1 and CL2, the highest R was obtained in all conditions but those at larger CL2 and smaller CL1.

References

[1]
R. E. Lee, Scanning Electron Microscopy and X-Ray Microanalysis, Prentice Hall, 1993.
[2]
L. Reimer, Scanning Electron Microscopy --Physics of Image Formation and Microanalysis, Springer, Berlin, 1998.
[3]
Mook, H.W. and Kruit, P., 1999, "Optics and Design of the Fringe Field Monochromator for a Schottky Field Emission Gun," Nuclear Instruments and Methods in Physics Research Vol.427, pp. 109-120.
[4]
D. F. Specht, A general regression neural network, IEEE Trans. Neural Network, Vol. 2, 1991, pp. 568-576.
[5]
D. E. Goldbeg, Genetic Algorithms in Search, Optimization & Machine Learning, Addison Wesley, 1989.
[6]
B. Kim, J. Bae, and B. T. Lee, Modeling silicon oxynitride etch microtrenching using genetic algorithm and neural network, Microelecron. Eng. Vol. 83, No. 3, 2006, pp. 513-519.
[7]
B. Kim, B. T. Lee, Prediction of silicon oxynitride plasma etching using a generalized regression neural network, J. Appl. Phys., Vol. 98, 2005, 034912.
[8]
T. S. Kim, W. Kim, D. H. Kim, B. Kim, Statistical analysis of Characteristics of Scanning Electron Microscope, J. Kor. Inst. Surf. Eng. Vol. 40, No. 4, 2007, pp. 185-189.
[9]
D. C. Mongomery, Design and Analysis of Experiments, Wiley, Singapore, 1992.

Recommendations

Comments

Information & Contributors

Information

Published In

cover image Guide Proceedings
ICS'08: Proceedings of the 12th WSEAS international conference on Systems
July 2008
821 pages
ISBN:9789606766831

Publisher

World Scientific and Engineering Academy and Society (WSEAS)

Stevens Point, Wisconsin, United States

Publication History

Published: 22 July 2008

Author Tags

  1. generalized regression neural network
  2. genetic algorithm
  3. model
  4. scanning electron microscope
  5. statistical experiment

Qualifiers

  • Article

Contributors

Other Metrics

Bibliometrics & Citations

Bibliometrics

Article Metrics

  • 0
    Total Citations
  • 0
    Total Downloads
  • Downloads (Last 12 months)0
  • Downloads (Last 6 weeks)0
Reflects downloads up to 01 Jan 2025

Other Metrics

Citations

View Options

View options

Media

Figures

Other

Tables

Share

Share

Share this Publication link

Share on social media