US20110140217A1 - Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization - Google Patents
Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization Download PDFInfo
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- US20110140217A1 US20110140217A1 US12/938,988 US93898810A US2011140217A1 US 20110140217 A1 US20110140217 A1 US 20110140217A1 US 93898810 A US93898810 A US 93898810A US 2011140217 A1 US2011140217 A1 US 2011140217A1
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- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
- G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
- G01R33/09—Magnetoresistive devices
- G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R33/00—Arrangements or instruments for measuring magnetic variables
- G01R33/12—Measuring magnetic properties of articles or specimens of solids or fluids
- G01R33/1284—Spin resolved measurements; Influencing spins during measurements, e.g. in spintronics devices
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3268—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
- H01F10/3272—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn by use of anti-parallel coupled [APC] ferromagnetic layers, e.g. artificial ferrimagnets [AFI], artificial [AAF] or synthetic [SAF] anti-ferromagnets
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- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
- H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/26—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers
- H01F10/30—Thin magnetic films, e.g. of one-domain structure characterised by the substrate or intermediate layers characterised by the composition of the intermediate layers, e.g. seed, buffer, template, diffusion preventing, cap layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F10/3227—Exchange coupling via one or more magnetisable ultrathin or granular films
- H01F10/3231—Exchange coupling via one or more magnetisable ultrathin or granular films via a non-magnetic spacer
- H01F10/3236—Exchange coupling via one or more magnetisable ultrathin or granular films via a non-magnetic spacer made of a noble metal, e.g.(Co/Pt) n multilayers having perpendicular anisotropy
Definitions
- the present invention relates to magnetic memory systems, and more particularly to a method and system for providing a magnetic element that employs a spin transfer effect in switching, and that can be switched using a lower switching current density.
- FIGS. 1A and 1B depict conventional magnetic elements 10 and 10 ′.
- the conventional magnetic element 10 is a spin valve and includes a conventional antiferromagnetic (AFM) layer 12 , a conventional pinned layer 14 , a conventional conductive spacer layer 16 and a conventional free layer 18 .
- Other layers (not shown), such as seed or capping layer may also be used.
- the conventional pinned layer 14 and the conventional free layer 18 are ferromagnetic.
- the conventional free layer 18 is depicted as having a changeable magnetization 19 .
- the conventional spacer layer 16 is nonmagnetic.
- the AFM layer 12 is used to fix, or pin, the magnetization of the pinned layer 14 in a particular direction.
- the magnetization of the free layer 18 is free to rotate, typically in response to an external magnetic field. Also depicted are top contact 20 and bottom contact 22 that can be used to drive current through the conventional magnetic element 10 .
- the conventional magnetic element 10 ′ depicted in FIG. 1B is a spin tunneling junction. Portions of the conventional spin tunneling junction 10 ′ are analogous to the conventional spin valve 10 .
- the conventional magnetic element 10 ′ includes an AFM layer 12 ′, a conventional pinned layer 14 ′, a conventional insulating barrier layer 16 ′ and a conventional free layer 18 ′ having a changeable magnetization 19 ′.
- the conventional barrier layer 16 ′ is thin enough for electrons to tunnel through in a conventional spin tunneling junction 10 ′.
- the resistance of the conventional magnetic element 10 / 10 ′ changes.
- the resistance of the conventional magnetic element 10 / 10 ′ is low.
- the resistance of the conventional magnetic element 10 / 10 ′ is high.
- films having a perpendicular anisotropy have been used in conventional MRAM to obtain certain desired properties.
- GdFe and GdCoFe having perpendicular anisotropy have been used in magnetic elements, as disclosed by Naoki Nishimura, et al. in “Magnetic tunnel junction device with perpendicular magnetization films for high-density magnetic random access memory”, Journal of Applied Physics, Volume 91, Number 8, pp. 5246-5249, 15 Apr. 2002.
- the structures disclosed by Nishimura's were designed for standard field-based-writing MRAM devices.
- the magnetization of such conventional free layers is switched by applying an external magnetic field to the magnetic element.
- the magnetic elements disclosed by Nishimura have their equilibrium magnetizations oriented perpendicular to the film plane.
- the magnetization of the free layer would be in the z-direction as depicted in FIGS. 1A and 1B in such conventional magnetic elements.
- spin transfer may be utilized to switch the magnetizations 19 / 19 ′ of the conventional free layers 10 / 10 ′.
- Spin transfer is described in the context of the conventional magnetic element 10 ′, but is equally applicable to the conventional magnetic element 10 .
- Current knowledge of spin transfer is described in detail in the following publications: J. C. Slonczewski, “Current-driven Excitation of Magnetic Multilayers,” Journal of Magnetism and Magnetic Materials, vol. 159, p. L1 (1996); L. Berger, “Emission of Spin Waves by a Magnetic Multilayer Traversed by a Current,” Phys. Rev. B, vol. 54, p. 9353 (1996), and F. J.
- a spin-polarized current traverses a magnetic multilayer such as the spin tunneling junction 10 ′ in a CPP configuration
- a portion of the spin angular momentum of electrons incident on a ferromagnetic layer may be transferred to the ferromagnetic layer.
- electrons incident on the conventional free layer 18 ′ may transfer a portion of their spin angular momentum to the conventional free layer 18 ′.
- a spin-polarized current can switch the magnetization 19 ′ direction of the conventional free layer 18 ′ if the current density is sufficiently high (approximately 10 7 -10 8 A/cm 2 ) and the lateral dimensions of the spin tunneling junction are small (approximately less than two hundred nanometers).
- the conventional free layer 18 ′ should be sufficiently thin, for instance, preferably less than approximately ten nanometers for Co.
- Spin transfer based switching of magnetization dominates over other switching mechanisms and becomes observable when the lateral dimensions of the conventional magnetic element 10 / 10 ′ are small, in the range of few hundred nanometers. Consequently, spin transfer is suitable for higher density magnetic memories having smaller magnetic elements 10 / 10 ′.
- the phenomenon of spin transfer can be used in the CPP configuration as an alternative to or in addition to using an external switching field to switch the direction of magnetization of the conventional free layer 18 ′ of the conventional spin tunneling junction 10 ′.
- the magnetization 19 ′ of the conventional free layer 18 ′ can be switched from antiparallel to the magnetization of the conventional pinned layer 14 ′ to parallel to the magnetization of the conventional pinned layer 14 ′.
- Current is driven from the conventional free layer 18 ′ to the conventional pinned layer 14 ′ (conduction electrons traveling from the conventional pinned layer 14 ′ to the conventional free layer 18 ′).
- the majority electrons traveling from the conventional pinned layer 14 ′ have their spins polarized in the same direction as the magnetization of the conventional pinned layer 14 ′.
- These electrons may transfer a sufficient portion of their angular momentum to the conventional free layer 18 ′ to switch the magnetization 19 ′ of the conventional free layer 18 ′ to be parallel to that of the conventional pinned layer 14 ′.
- the magnetization of the free layer 18 ′ can be switched from a direction parallel to the magnetization of the conventional pinned layer 14 ′ to antiparallel to the magnetization of the conventional pinned layer 14 ′.
- majority electrons When current is driven from the conventional pinned layer 14 ′ to the conventional free layer 18 ′ (conduction electrons traveling in the opposite direction), majority electrons have their spins polarized in the direction of magnetization of the conventional free layer 18 ′. These majority electrons are transmitted by the conventional pinned layer 14 ′.
- the minority electrons are reflected from the conventional pinned layer 14 ′, return to the conventional free layer 18 ′ and may transfer a sufficient amount of their angular momentum to switch the magnetization 19 ′ of the free layer 18 ′ antiparallel to that of the conventional pinned layer 14 ′.
- spin transfer functions as a mechanism for switching the conventional magnetic elements 10 and 10 ′
- a high current density is typically required to induce switching for the conventional magnetic elements 10 and 10 ′.
- the switching current density is on the order of a few 10 7 A/cm 2 or greater.
- a high write current is used to obtain the high switching current density.
- the high operating current leads to design problems for high density MRAM, such as heating, high power consumption, large transistor size, as well as other issues.
- a spin valve such as the conventional element 10 is used, the output signal is small.
- both the total resistance and the change in resistance in SV-based spin transfer elements are small typically less than two Ohms and five percent, respectively.
- One proposed method of increasing the output signal is to use a spin tunneling junction, such as the conventional magnetic element 10 ′, for the spin transfer device.
- the conventional magnetic element 10 ′ can exhibit large resistance and large signal. For example resistances in excess of one thousand Ohms and a greater than forty percent percentage change in resistance, respectively.
- resistances in excess of one thousand Ohms and a greater than forty percent percentage change in resistance respectively.
- one of ordinary skill in the art will readily recognize that the use of the conventional magnetic element 10 ′ requires a small operating current to keep the conventional magnetic element 10 ′ from deteriorating or breaking down.
- the present invention provides a method and system for providing a magnetic element that can be used in a magnetic memory.
- the magnetic element includes pinned, nonmagnetic spacer, and free layers.
- the spacer layer resides between the pinned and free layers.
- the free layer can be switched using spin transfer when a write current is passed through the magnetic element.
- the free layer includes a first ferromagnetic layer and a second ferromagnetic layer.
- the second ferromagnetic layer has a very high perpendicular anisotropy and an out-of-plane demagnetization energy.
- the very high perpendicular anisotropy energy is greater than the out-of-plane demagnetization energy of the second layer.
- FIG. 1A is a diagram of a conventional magnetic element, a spin valve.
- FIG. 1B is a diagram of another conventional magnetic element, a spin tunneling junction.
- FIG. 2A depicts a first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 2B depicts another version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 3A depicts a second version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least a high perpendicular anisotropy.
- FIG. 3B depicts a third version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least a high perpendicular anisotropy.
- FIG. 4 depicts a second embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 5A is a preferred version of the second embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 5B depicts a second version of the second embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to high perpendicular anisotropy.
- FIG. 5C depicts a third version of the second embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to high perpendicular anisotropy.
- FIG. 6 depicts a third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 7A is a preferred version of the third embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 7B depicts another version of the third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least high perpendicular anisotropy.
- FIG. 7C depicts another version of the third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least high perpendicular anisotropy.
- FIG. 8 depicts a flow chart of a one embodiment of a method in accordance with the present invention for providing one embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- FIG. 9 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 10 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 11 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 12 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 13 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 14 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 15 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 16 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy
- FIG. 17 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 18 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 19 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 20 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- FIG. 21 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy.
- the present invention relates to an improvement in magnetic elements and magnetic memories, such as MRAM.
- MRAM magnetic elements and magnetic memories
- the following description is presented to enable one of ordinary skill in the art to make and use the invention and is provided in the context of a patent application and its requirements.
- Various modifications to the preferred embodiments will be readily apparent to those skilled in the art and the generic principles herein may be applied to other embodiments.
- the present invention is not intended to be limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features described herein.
- the present invention provides a method and system for providing a magnetic element that can be used in a magnetic memory.
- the magnetic element comprises at least pinned, nonmagnetic spacer, and free layers.
- the spacer layer resides between the pinned and free layers.
- the magnetic element is configured to allow the free layer to be switched using spin transfer when a write current is passed through the magnetic element.
- the magnetic element further comprises a barrier layer, a second pinned layer.
- the magnetic element further comprises a second spacer layer, a second pinned layer and a second free layer magnetostatically coupled to the first free layer.
- the second spacer layer is between the second pinned and second free layers and a separation layer is preferably provided between the first and second free layers to ensure they are magnetostatically coupled.
- one or more of the free layers has a perpendicular anisotropy.
- the perpendicular anisotropy has a perpendicular anisotropy energy at least twenty percent and, in general, less than one hundred percent of the out-of-plane demagnetization energy.
- the present invention will be described in terms of a particular magnetic memory and a particular magnetic element having certain components. However, one of ordinary skill in the art will readily recognize that this method and system will operate effectively for other magnetic memory elements having different and/or additional components and/or other magnetic memories having different and/or other features not inconsistent with the present invention.
- the present invention is also described in the context of current understanding of the spin transfer phenomenon. Consequently, one of ordinary skill in the art will readily recognize that theoretical explanations of the behavior of the method and system are made based upon this current understanding of spin transfer.
- the method and system are described in the context of a structure having a particular relationship to the substrate.
- the bottoms of the structures are typically closer to an underlying substrate than the tops of the structures.
- the method and system are consistent with other structures having different relationships to the substrate.
- the method and system are described in the context of certain layers being synthetic and/or simple.
- the layers could have another structure.
- the method and system are described in the context of simple free layers, nothing prevents the present invention from being used with synthetic free layers.
- the present invention is described in the context of magnetic elements having particular layers. However, one of ordinary skill in the art will readily recognize that magnetic elements having additional and/or different layers not inconsistent with the present invention could also be used.
- ferromagnetic could include ferrimagnetic or like structures.
- ferrimagnetic includes, but is not limited to ferromagnets and ferrimagnets.
- the present invention is also described in the context of single elements. However, one of ordinary skill in the art will readily recognize that the present invention is consistent with the use of magnetic memories having multiple elements, bit lines, and word lines. The present invention is also described in the context of a particular mechanism, a high anisotropy, for providing a lower switching current density. However, one of ordinary skill in the art will readily recognize that the method and system described herein can be combined with other mechanisms for reducing the switching current density, such as a low saturation magnetization free layer.
- FIG. 2A depicting a first embodiment of a portion of a magnetic element 100 in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element 100 is preferably used in a magnetic memory, such as a MRAM.
- the magnetic element 100 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories.
- the magnetic element 100 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the magnetic element 100 includes a pinned layer 110 , a spacer layer 120 , and a free layer 130 .
- the free layer 130 is configured to have a high perpendicular anisotropy.
- the magnetic element 100 generally also includes an AFM layer (not shown) used to pin the magnetization 111 of the pinned layer 110 , as well as seed layers (not shown) and capping layers (not shown).
- the magnetic element 100 is configured such that the free layer 130 can be written using spin transfer.
- the lateral dimensions, such as the width w, of the free layer 130 are thus small and preferably less than two hundred nanometers.
- some difference is preferably provided between the lateral dimensions to ensure that the free layer 130 has a particular easy axis in the plane of the free layer 130 .
- the pinned layer 110 is ferromagnetic.
- the pinned layer 110 is synthetic.
- the pinned layer 110 includes ferromagnetic layers separated by nonmagnetic layers and is configured such that the ferromagnetic layers are aligned antiparallel.
- the pinned layer 110 may be configured to increase the spin dependence of the bulk resistivity of the magnetic element 100 .
- the pinned layer 110 or its ferromagnetic layers, may be a multilayer made up of repeated bilayers (not explicitly shown in FIG. 2A ).
- the pinned layer 110 could be a multilayer of (Fe x Co 1-x /Cu)n, where n is the number of times the Fe x Co 1-x /Cu bilayer is repeated.
- n is greater than one and the Cu layer of the bilayer is preferably one through eight Angstroms thick.
- the spacer layer 120 is nonmagnetic.
- the spacer layer 120 may be conductive, for example including Cu.
- the spacer layer 120 is a barrier layer including an insulator such as alumina. In such an embodiment, the barrier layer 120 is less than two nanometers thick such that charge carriers can tunnel between the free layer 130 and the pinned layer 110 .
- the free layer 130 is ferromagnetic and is configured to have a high perpendicular anisotropy.
- a high perpendicular anisotropy occurs for the simple free layer 130 when the perpendicular anisotropy of the free layer 130 has a corresponding perpendicular anisotropy energy that is at least twenty percent and less than one hundred percent of the demagnetization energy.
- FIG. 2B depicts a magnetic element 100 ′ that is analogous to the magnetic element 100 . Thus, analogous components are labeled similarly.
- the magnetic element 100 ′ therefore, includes a free layer 130 ′ that can be written using spin transfer and that has a high perpendicular anisotropy.
- the free layer 130 ′ is synthetic, including two ferromagnetic layers 132 and 136 separated by a nonmagnetic layer 134 that is preferably Ru.
- the nonmagnetic layer 134 is configured so that the magnetizations 133 and 137 of the free layer 130 ′ are aligned antiparallel.
- the free layer 130 ′ has a high perpendicular anisotropy because the ferromagnetic layers 132 and 136 have a high perpendicular anisotropy.
- the perpendicular anisotropy of the ferromagnetic layers 132 and 136 corresponds to a perpendicular anisotropy energy that is at least twenty percent and less than one hundred percent of the demagnetization energy of the ferromagnetic layers 132 and 136 , respectively.
- the high perpendicular anisotropy is defined to have a perpendicular anisotropy energy that is at least twenty percent but less than one hundred percent of the demagnetization energy. Consequently, although the perpendicular anisotropy is substantial, the equilibrium magnetization of the free layer 130 or the constituent ferromagnetic layers 132 and 136 lie in plane (no components up or down in FIGS. 2A and 2B ).
- the discussion below primarily refers to the free layer 130 . However, the principles discussed also apply to the free layer 130 ′, including ferromagnetic layers 132 and 136 , and the magnetic element 100 ′.
- a high perpendicular anisotropy occurs when the perpendicular anisotropy energy of the free layer 130 is greater than twenty percent but less than one hundred percent of the out-of-plane demagnetization energy of the free layer 130 .
- the magnetization 131 of the free layer 130 lies in plane at equilibrium (in the absence of a write current or a sufficient external magnetic field).
- the high perpendicular anisotropy is preferably provided using materials having a high perpendicular crystalline anisotropy and/or by stressing the layer in some manner.
- the high perpendicular anisotropy should reduce the critical switching current density, J c , required to switch the magnetization of the free layer 130 due to spin transfer.
- t the thickness of the free layer
- M s saturation magnetization of the free layer
- H eff effective field for the free layer
- g( ⁇ ) reflects the spin-transfer efficiency
- the effective field, H eff includes the external magnetic field, shape anisotropy fields, in-plane and out-of-plane (i.e. perpendicular) anisotropies, and dipolar and exchange fields.
- the perpendicular anisotropy typically arises from crystalline anisotropy.
- the term g( ⁇ ) depends on the relative angular orientations of the magnetizations of the pinned layer 110 and the free layer 130 .
- the out-of-plane demagnetization term 2 ⁇ M s is much greater than H eff .
- the term 2 ⁇ M s is approximately 8 kOe, which is much larger than H eff that is less than a few hundred Oe.
- a high perpendicular anisotropy generally a crystalline anisotropy, can be introduced into the free layer 130 to offset most, but not all, of the out-of-plane demagnetization.
- the high perpendicular anisotropy has a perpendicular anisotropy energy that is less than one hundred percent of the demagnetization energy.
- the high perpendicular anisotropy has a perpendicular anisotropy energy that is preferably between twenty and ninety five percent (and in a preferred embodiment, is ninety percent) of the demagnetization energy. Because the out-of-plane demagnetization energy would then be still larger than the perpendicular anisotropy energy, the equilibrium magnetization 131 of the free layer 130 should remain in-plane.
- the high perpendicular anisotropy for the free layer 130 can be provided in a number of ways.
- materials used in the free layer 130 , or the constituent ferromagnetic layers 132 and 136 could include materials having a high perpendicular anisotropy due to their crystal structure.
- the free layer 130 or the ferromagnetic layers 132 and 134 include Co and CoFe; or Co and CoFe alloyed with Cr, Pt, and/or Pd where the compositions of Cr, Pt, and Pd are chosen to give high perpendicular anisotropy, as defined above.
- compositions of Cr, Pt, and/or Pd in Co and CoFe are adjusted to satisfy the condition that the perpendicular anisotropy energy is between twenty and ninety five percent, and preferably ninety percent, of the out-of-plane demagnetization energy.
- the free layer 130 or the ferromagnetic layers 132 and 134 can include multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A.
- the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the perpendicular anisotropy energy is between twenty and ninety five percent of the out-of-plane demagnetization energy of the multilayers.
- the perpendicular anisotropy in these multilayers is attributed to surface anisotropy at the ferromagnetic/Pd or Pt interfaces and to the strain in thin Co layers.
- FIG. 3A depicts another version 100 ′′ of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching.
- the magnetic element 100 ′′ is analogous to the magnetic element 100 .
- the magnetic element includes a free layer 130 ′′ that has a high perpendicular anisotropy and which is written using spin transfer.
- the magnetic element 100 ′′ preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the free layer 130 ′′ includes Co, CoCr, CoPt, CoCrPt, CoFe, CoFeCr, CoFePt, CoFeCrPt, or their multilayer combinations, which have an intrinsic high perpendicular anisotropy.
- the magnetic element 100 ′′ also includes optional stress increasing layers 152 and 154 . One or both of the stress increasing layers 152 and 154 may be used.
- the layer 154 is used to alter the stress and the surface anisotropy of the free layer 130 ′′, leading to further enhancement of the total perpendicular anisotropy.
- the stress increasing layer 152 is a seed layer that also enhances the total perpendicular anisotropy of the free layer 130 ′′.
- the stress increasing layer 152 may act as part of the spacer layer 120 ′′ when the spacer layer 120 ′′ is conductive. However, if the spacer layer 120 ′′ is an insulating barrier layer, the inclusion of the stress increasing layer 152 can cause a significant degradation in signal. In such an embodiment, the stress increasing layer 152 is, therefore, undesirable.
- the stress increasing layers 152 and 154 may include a few Angstroms of materials such as Pt, Pd, Cr, Ta, Au, and Cu that further promote perpendicular anisotropy in the free layer 130 ′′. However, note that the use of Pt and Pd either within the free layer 130 ′′ or adjacent layers 152 and 154 could increase the phenomenological Gilbert damping constant, a.
- the perpendicular anisotropy of the materials above can be further increased by intrinsic stress in the film itself. This intrinsic stress may be induced during the film deposition and/or by surrounding the spin transfer stack (containing the free layer 130 ′′) with an insulator (dielectric) of high compressive stress.
- FIG. 3B depicts another version 100 ′′′ of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element 100 ′′′ is analogous to the magnetic element 100 . Therefore, the magnetic element 100 ′′' includes a free layer 130 ′′′ that has a high perpendicular anisotropy, an optional low saturation magnetization, and which is written using spin transfer. Moreover, the magnetic element 100 ′′′ preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the free layer 130 ′′′ has a high perpendicular anisotropy, as defined above.
- the free layer 130 ′′′ also includes a very high perpendicular anisotropy ferromagnetic layer 160 and a ferromagnetic layer 162 .
- the high perpendicular anisotropy of the free layer 130 ′′′ is provided at least in part due to the very high perpendicular anisotropy ferromagnetic layer 160 .
- the very high perpendicular anisotropy ferromagnetic layer 160 has a very high perpendicular anisotropy.
- a very high perpendicular anisotropy has a perpendicular anisotropy energy that exceeds the out-of-plane demagnetization energy.
- a film having a very high perpendicular anisotropy when standing alone, would have its equilibrium magnetization perpendicular to the plane.
- the very high perpendicular anisotropy ferromagnetic layer 160 is preferably a rare earth-transition metal alloy, such as GdFe and GdCoFe, where the rare earth may be in the range of five to sixty atomic percent. Such rare earth-transition metal alloys have relatively low damping constants and high or very high perpendicular anisotropy.
- the very high perpendicular anisotropy ferromagnetic layer 160 preferably has a perpendicular anisotropy energy larger than its own out-of-plane demagnetization energy.
- the ferromagnetic layer 162 has a high spin polarization.
- the ferromagnetic layer 162 preferably includes one or more high spin-polarization materials such as Co, Fe, or CoFe.
- the ferromagnetic layer 162 has a perpendicular anisotropy energy that is smaller than its out-of-plane demagnetization energy.
- the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 are exchange-coupled.
- the exchange-coupled combination of the very high perpendicular anisotropy sublayer 160 and the high spin polarization ferromagnetic layer provide a total high perpendicular anisotropy for the free layer 130 ′′′.
- the total perpendicular anisotropy energy of the combination of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 exceeds the total out-of-plane demagnetization energy for the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 .
- the magnetizations of both the very high perpendicular anisotropy ferromagnetic layer 160 , the ferromagnetic layer 162 and thus the free layer 130 ′′′ would be oriented perpendicular to the film plane. If the thickness of the very high perpendicular anisotropy ferromagnetic layer 160 is reduced, however, the total perpendicular anisotropy energy of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 is reduced faster than the total out-of-plane demagnetization energy of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 .
- the total perpendicular anisotropy energy of the free layer 130 ′′′ is reduced more rapidly than the total out-of-plane demagnetization energy of the free layer 130 ′′′.
- the thickness of the high spin-polarization ferromagnetic 162 is increased, the total perpendicular anisotropy energy of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 is increased more slowly than the total out-of-plane demagnetization energy of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 .
- the total perpendicular anisotropy energy of the free layer 130 ′′′ is increased more slowly than the out-of-plane demagnetization energy of the free layer 130 ′′′.
- the equilibrium magnetizations of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 rotate into the film plane.
- the perpendicular anisotropy energy of the free layer 130 ′′′ is less than the out-of-plane demagnetization energy of the free layer 130 ′′′ and the magnetization of the free layer 130 ′′′ is in plane even though the free layer 130 ′′′ has a high perpendicular anisotropy.
- the thicknesses of the very high perpendicular anisotropy ferromagnetic layer 160 and the ferromagnetic layer 162 are tailored such that the total perpendicular crystalline anisotropy is high.
- the perpendicular anisotropy of the combination of the layers 160 and 162 has a perpendicular anisotropy energy that is at least twenty and less than one hundred percent of the demagnetization energy. In a preferred embodiment, this anisotropy energy is ninety percent of the total out-of-plane demagnetization energy.
- the magnetic element 100 ′′′ could be a top MTJ, having the free layer 130 ′′′ at the bottom closest to the substrate, the spacer or barrier layer 120 ′′′ and a pinned layer 110 ′′′ at the top.
- Such a magnetic element would include: very high perpendicular anisotropy ferromagnetic layer 160 /ferromagnetic layer 162 /spacer (barrier) layer 120 ′′′/pinned layer 110 ′′′/pinning or AFM layer (not shown).
- an example of the magnetic element 100 ′′′ is given by: AlCu[250 A]/GdFeCo[t]/CoFe[10 A]/Al2O3[8 A]/CoFe[30 A]/PtMn[150 A], where the thickness, t, of GdFeCo is preferably adjusted between ten and four hundred Angstroms so that the that the total perpendicular crystalline anisotropy energy is between at least twenty and less than one hundred percent, preferably ninety percent, of the total out-of-plane demagnetization energy.
- the equilibrium magnetic moment of the free layer 130 ′′′ should remain in-plane.
- the very high perpendicular anisotropy ferromagnetic layer 160 can include multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A.
- the repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of the free layer 130 ′′′.
- the magnetic elements 100 , 100 ′, 100 ′′, and 100 ′′′ utilize free layers having a high perpendicular anisotropy. Consequently, the magnetic elements 100 , 100 ′, 100 ′′, and 100 ′′′ can be written using spin transfer at a lower switching current density. Furthermore, aspects of the magnetic elements 100 , 100 ′, 100 ′′, and 100 ′′′ can be combined to further raise the perpendicular anisotropy. Thus, a further reduction in current or another improvement in the properties of the magnetic elements 100 , 100 ′, 100 ′′, and/or 100 ′′′ can be achieved.
- FIG. 4 depicts a second embodiment of a magnetic element 200 in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element 200 includes a spin valve portion 204 and a spin tunneling junction portion 202 that share a free layer 230 .
- the spin valve portion 204 includes a pinning layer 260 that is preferably an antiferromagnetic (AFM) layer 260 , pinned layer 250 , conductive spacer layer 240 such as Cu, and a free layer 230 .
- the conductive spacer layer 240 could be replaced by a barrier layer.
- the spin tunneling junction portion 202 includes a pinning layer 206 that is preferably an antiferromagnetic (AFM) layer 206 , pinned layer 210 , barrier layer 220 that is an insulator configured to allow electrons to tunnel through it, and the free layer 230 .
- AFM antiferromagnetic
- the layers 250 , 240 , and 230 are analogous to the layers 110 , 120 , and 130 in the magnetic element 100 when the spacer layer 120 is conducting.
- the layers 210 , 220 , and 230 are analogous to the layers 110 , 120 , and 130 , respectively, when the spacer layer 120 is an insulating barrier layer.
- the pinned layers 210 and 250 thus preferably correspond to the pinned layers 110 and can be configured using analogous materials, layers, and/or process.
- the pinned layer 210 and/or the pinned layer 250 may include multilayer (Fe x Co 1-x /Cu)n, where the n is the number of repeats that is greater than one.
- the Fe atomic percent, x is preferably approximately 0.5 and the Cu layers are preferably one through eight Angstroms thick.
- the free layer 230 is configured to be written using spin transfer and has a high perpendicular anisotropy.
- the magnetic element 200 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element.
- the magnetic element 200 also includes pinning layers 206 and 260 that are preferably AFM layers used in pinning the magnetizations of the pinned layers 210 and 250 , respectively.
- the free layer 230 is preferably configured in a manner analogous to the free layers 130 , 130 ′, 130 ′′, and/or 130 ′′′.
- analogous materials and principles to those discussed above may be used to achieve the high perpendicular anisotropy of the free layer 230 .
- Materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for the free layer 230 .
- the free layer 230 can be synthetic. Consequently, the magnetic element 200 can be written using spin transfer at a lower switching current density.
- the magnetic element 200 can share the benefits of the magnetic elements 100 , 100 ′, 100 ′′, 100 ′′′, and/or their combinations. Furthermore, when the pinned layers 210 and 250 are aligned antiparallel, both the spin valve portion 204 and the spin tunneling junction portion 202 can contribute to writing the free layer 230 . Because of the use of the barrier layer 220 , the magnetic element 200 has higher resistance and magnetoresistance. Consequently, a higher signal may be obtained during reading.
- FIG. 5A is a preferred version of the second embodiment of a magnetic element 300 in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element 300 is analogous to the magnetic element 200 depicted in FIG. 4 . Thus, analogous components are labeled similarly. Therefore, the magnetic element includes a free layer 330 , which corresponds to the free layer 230 , that has a high perpendicular anisotropy is written using spin transfer.
- the magnetic element 300 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the free layer 330 is preferably configured in a manner analogous to the free layers 130 , 130 ′, 130 ′′, 130 ′′′, and/or the free layer 230 .
- analogous materials and principles to those discussed above may be used to achieve the high perpendicular anisotropy of the free layer 330 .
- materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for the free layer 330 .
- the materials discussed above with respect to the free layers 130 , 130 ′, 130 ′′, and 130 ′′′ are preferred.
- the free layer 330 can be synthetic.
- the magnetic element 300 can be written using spin transfer at a lower switching current density. Stated differently, the magnetic element 300 can share the benefits of the magnetic elements 100 , 100 ′, 100 ′′, 100 ′′′ and/or their combinations. Because of the use of the barrier layer 320 , the magnetic element 300 has higher resistance and magnetoresistance. Consequently, a higher signal may be obtained during reading. In an alternate embodiment, the barrier layer 320 may be replaced by a conducting layer. However, in such an embodiment, the read signal is decreased for a given read current.
- the pinned layer 310 is synthetic.
- the pinned layer 310 thus includes ferromagnetic layers 312 and 316 separated by a nonmagnetic layer 314 , which is preferably Ru.
- the nonmagnetic layer 314 is configured such that the ferromagnetic layers 312 and 316 are antiferromagnetically aligned.
- the magnetic element 300 is configured such that the ferromagnetic layer 316 and the pinned layer 350 are antiparallel.
- the spin valve portion 304 and the spin tunneling junction portion 302 can both contribute to the spin transfer used to write to the magnetic element 300 .
- an even lower switching current can be used to write to the magnetic element 300 .
- the AFM layers 306 and 360 can be aligned in the same direction.
- the AFM layers 306 and 360 can, therefore, be aligned in the same step. Thus, processing is further simplified.
- FIG. 5B depicts another version of the second embodiment 300 ′ of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy.
- the magnetic element 300 ′ is analogous to the magnetic element 300 and, therefore, shares its advantages.
- the free layer 330 ′ has a high perpendicular anisotropy.
- the magnetic element 300 ′ includes stress increasing layer 380 that is analogous to the stress increasing layer 154 .
- the stress increasing layer 380 is depicted, another stress increasing layer could be used between the free layer 330 ′ and the barrier layer 320 ′. However, such a layer would strongly reduce the tunneling magnetoresistance because this layer would lie adjacent to the barrier layer 320 ′. With the use of the stress increasing layer 380 and/or, in an alternate embodiment, a stress increasing layer between the free layer 330 ′ and the barrier layer 320 ′, the high perpendicular anisotropy of the free layer 330 ′ may be obtained. Thus, the benefits of the magnetic element 100 ′′ may also be achieved.
- FIG. 5C depicts a third version of the second embodiment of a portion of a magnetic element 300 ′′ in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy.
- the magnetic element 300 ′′ is analogous to the magnetic element 300 and, therefore, shares its advantages.
- the free layer 330 ′′ has a high perpendicular anisotropy.
- the magnetic element 300 ′′ includes very high perpendicular anisotropy ferromagnetic layer 390 that is preferably analogous to the very high perpendicular anisotropy ferromagnetic layer 160 depicted in FIG.
- the very high perpendicular anisotropy ferromagnetic layer 390 is preferably a rare earth-transition metal alloy.
- the thicknesses of the very high perpendicular anisotropy ferromagnetic layer 390 and the ferromagnetic layers 391 and 393 are preferably tailored such that the equilibrium magnetizations of the very high perpendicular anisotropy ferromagnetic layer 390 and the ferromagnetic layers 391 and 393 are in plane, as depicted.
- the high perpendicular anisotropy of the free layer 330 ′′ that is analogous to the free layer 130 ′′′ may be achieved. Consequently, the benefits of the magnetic element 100 ′′′ may also be attained.
- the very high perpendicular anisotropy ferromagnetic layer 390 can include multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A.
- the repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of the free layer 330 ′′.
- FIG. 6 depicts a third embodiment of a portion of a magnetic element 400 in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element includes two structures 402 and 404 , each of which is analogous to the magnetic element 100 , 100 ′, 100 ′′, and/or 100 ′′′.
- the structure 402 includes a pinned layer 410 , a spacer layer 420 , and a free layer 430 that are analogous to, for example, the layers 110 , 120 , and 130 , respectively, of the magnetic element 100 .
- the structure 402 also includes pinning layer 406 that is preferably an AFM layer.
- the structure 404 includes a pinned layer 470 , a spacer layer 460 , and a free layer 450 that are analogous to, for example, the layers 110 , 120 , and 130 , respectively, of the magnetic element 100 .
- the structure 404 also includes pinning layer 480 that is preferably an AFM layer.
- One or both of the free layers 430 and 450 have a high perpendicular anisotropy.
- the free layer 430 and/or 450 may also be synthetic. In such a case the ferromagnetic layers (not explicitly shown) within the free layer 430 and/or 450 would have a high perpendicular anisotropy.
- the free layers 430 and 450 of the magnetic element 400 are magnetostatically coupled, preferably so that the layers 430 and 450 are antiferromagnetically aligned.
- the magnetic element 400 includes a separation layer 440 .
- the separation layer 440 is configured to ensure that the free layers 430 and 450 are only magnetostatically coupled.
- the thickness of the separation layer 440 which is preferably a nonmagnetic conductor, is preferably configured to ensure that the free layers 430 and 450 are antiferromagnetically aligned due to a magnetostatic interaction.
- the separation layer 440 serves to randomize the polarization of the spins passing through it.
- the separation layer 440 includes materials such as Cu, Ag, Au, Pt, Mn, CuPt, CuMn, a Cu/Pt[1-20 A]/Cu sandwich, a Cu/Mn[1-20 A]/Cu sandwich, or a Cu/PtMn[1-20 A]/Cu sandwich.
- the separation layer is used in the magnetic element 400 , nothing prevents another mechanism from being used.
- the structure 402 might be a dual structure including a second pinned layer (not shown), a second spacer layer (not shown), and a pinning layer (not shown). The thicknesses of the second pinned and spacer layers, as well as the pinning layer may be configured to ensure that the free layers 430 and 450 are magnetostatically coupled.
- the free layer 430 and/or the free layer 450 are configured to have a high perpendicular anisotropy, as defined above.
- the free layer 430 and/or 450 may correspond to the free layers 130 , 130 ′, 130 ′′, and/or 130 ′′′.
- the materials and/or properties used in the free layer 430 and/or the free layer 450 are the same as or analogous to those described above with respect to the magnetic elements 100 , 100 ′, 100 ′′, and 100 ′′′.
- the magnetic element 400 shares many of the benefits of the magnetic elements 100 , 100 ′, 100 ′′, and 100 ′′′.
- the magnetic element can be written using spin transfer at a lower switching current density.
- the magnetostatic coupling between the free layers 430 and 450 provides further benefits. Because the free layers 450 and 430 are magnetostatically coupled, a change in magnetization of the free layer 450 is reflected in the free layer 430 .
- the spacer layer 420 can be either a conductive layer or a barrier layer that provides a high signal. Furthermore, because they have separate free layers 450 and 430 the properties of the spin valve 404 and the spin tunneling junction 402 , respectively, can be separately tailored to improve their functions of the spin valve and spin tunneling junction, respectively.
- FIG. 7A is a preferred version of the third embodiment of a magnetic element 500 in accordance with the present invention having a reduced write current density for spin transfer.
- the magnetic element 500 is analogous to the magnetic element 400 depicted in FIG. 6 .
- the magnetic element includes free layers 530 and 550 , which corresponds to the free layers 430 and 450 , respectively, either or both of which has a high perpendicular anisotropy and both of which are written using spin transfer.
- the free layer 530 and/or 550 may also be synthetic. In such a case the ferromagnetic layers (not explicitly shown) within the free layer 530 and/or 550 would have a high perpendicular anisotropy.
- the magnetic element 500 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element 500 .
- the pinned layers 510 and 570 are synthetic.
- the pinned layer 510 includes ferromagnetic layers 512 and 516 separated by a nonmagnetic layer 514 that is preferably Ru. The magnetizations of the ferromagnetic layers 512 and 516 are also aligned antiparallel.
- the pinned layer 570 includes ferromagnetic layers 572 and 576 separated by a nonmagnetic layer 574 that is preferably Ru. The magnetizations of the ferromagnetic layers 572 and 576 are also aligned antiparallel.
- the spacer layer 520 is preferably a barrier layer that is insulating yet allows electrons to tunnel between the ferromagnetic layer 516 and the free layer 530 .
- the spacer layer 560 is preferably a conductive layer.
- the structure 502 is a spin tunneling junction, while the structure 504 is a spin valve.
- the free layers 530 and/or 550 are preferably configured in a manner analogous to the free layers 130 , 130 ′, 130 ′′, 130 ′′′, and/or the free layers 430 and 450 , respectively.
- analogous materials and principles to those discussed above may be used to achieve the high perpendicular anisotropy of the free layers 530 and/or 550 .
- materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for the free layer 530 and/or 550 .
- the materials discussed above with respect to the free layers 130 , 130 ′, 130 ′′, and 130 ′′′ are preferred.
- the free layers 530 and/or 550 can be synthetic. Because of the high perpendicular anisotropy, the magnetic element 500 can be written using spin transfer at a lower switching current density. Stated differently, the magnetic element 500 can share the benefits of the magnetic elements 100 , 100 ′, 100 ′′, 100 ′′′, and/or their combinations.
- the free layers 530 and 550 are magnetostatically coupled, a change in magnetization direction of the free layer 550 , for example due to spin transfer induced writing, is reflected in the magnetization of the free layer 530 .
- the spin tunneling junction 502 provides a high signal.
- the barrier layer 520 may be replaced by a conducting layer.
- the read signal is decreased for a given read current.
- FIG. 7B is another version of the third embodiment of a magnetic element 500 ′ in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy.
- the magnetic element 500 ′ is analogous to the magnetic element 500 and, therefore, shares its advantages.
- the free layers 530 ′ and/or 550 ′ have a high perpendicular anisotropy.
- the magnetic element 500 ′ includes optional stress increasing layers 582 , 584 and 586 that are analogous to the optional stress increasing layers 152 and 154 .
- the bottom, the top, or both of the optional stress increasing layers 582 , 584 , and 586 may be used.
- an optional stress increasing layer could be placed between the free layer 530 ′ and the barrier layer 520 ′.
- such an optional stress increasing layer may result in a lower magnetoresistance.
- use of the optional stress increasing layer 586 may result in a lower spin torque for spin transfer as well as a lower magnetoresistance for the spin valve 504 ′.
- the high perpendicular anisotropy of the free layer 530 ′ and/or 550 ′ may be obtained.
- the benefits of the magnetic element 100 ′′ may also be achieved.
- FIG. 7C depicts a third version of the second embodiment of a portion of a magnetic element 500 ′′ in accordance with the present invention having a reduced write current density for spin transfer due to a high perpendicular anisotropy.
- the magnetic element 500 ′′ is analogous to the magnetic element 500 and, therefore, shares its advantages.
- the free layer 530 ′′ and/or 550 ′′ have a high perpendicular anisotropy.
- the free layer(s) 530 ′′ and 550 ′′ include very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 , respectively, that are preferably analogous to the very high perpendicular anisotropy ferromagnetic layer 160 depicted in FIG. 3B .
- the free layer(s) 530 ′′ and 550 ′′ also include ferromagnetic layers 592 and 593 having a high spin polarization.
- a seed layer such as AICu 25 nm, can be optionally inserted between layers 540 ′′ and 591 to help enhance the perpendicular anisotropy of layer 591 .
- the thicknesses of the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 and the ferromagnetic layer(s) 592 and 593 , respectively, are preferably tailored such that the equilibrium magnetizations of the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 and the ferromagnetic layer(s) 592 and 593 are in plane, as depicted.
- the very high perpendicular anisotropy ferromagnetic layers 590 and 591 are preferably a rare earth-transition metal alloy.
- the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 can be multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A.
- the repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of the free layer 530 ′′ and/or 550 ′′.
- the high perpendicular anisotropy of the free layer 530 ′′ and/or 550 ′′ may be achieved. Consequently, the benefit of the magnetic element 100 ′′′ may also be provided.
- the magnetic elements 100 , 100 ′, 100 ′′, 100 ′′′, 200 , 300 , 300 ′, 300 ′′, 400 , 500 , 500 ′, and 500 ′′ can be written using spin transfer at a lower switching current density due to high perpendicular anisotropy and/or low saturation magnetization in at least one free layer. Furthermore, aspects of the magnetic elements 100 , 100 ′, 100 ′′, 100 ′′′, 200 , 300 , 300 ′, 300 ′′, 400 , 500 , 500 ′, and 500 ′′ can be combined to provide further benefits.
- FIG. 8 depicts a flow chart of a one embodiment of a method 600 in accordance with the present invention for providing one embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer.
- the method 600 is described in the context of the magnetic element 100 . However, nothing prevents the method 600 from being adapted to provide the magnetic elements 100 ′, 100 ′′, 100 ′′′, 200 , 300 , 300 ′, 300 ′′, 400 , 500 , 500 ′, and/or 500 ′′.
- a pinned layer, such as the pinned layer 110 is provided, via step 602 .
- step 602 includes providing a synthetic pinned layer.
- the spacer layer 120 is provided, via step 604 .
- Step 604 can include providing a barrier layer or a conducting layer.
- the free layer 130 having a high perpendicular anisotropy is provided, via step 606 .
- the very high perpendicular anisotropy ferromagnetic layer or the stress inducing layer may be provided prior to step 606 .
- Step 606 can include providing a synthetic free layer.
- step 606 may also include providing high spin polarization layers between the ferromagnetic layers of the free layer. If the magnetic elements 200 , 300 , 300 ′, 300 ′′, 400 , 500 , 500 ′, and/or 500 ′′ are being provided, additional pinned layers, spacer layers and, in some embodiments, free layers are provided, via step 608 .
- the free layers may have a high perpendicular anisotropy.
- the magnetic elements 100 ′, 100 ′′, 100 ′′′, 200 , 300 , 300 ′, 300 ′′, 400 , 500 , 500 ′, and/or 500 ′′ may be provided.
- layers in a magnetic element may have a very high perpendicular anisotropy.
- the perpendicular anisotropy energy of such a layer is greater than the out-of-plane demagnetization energy of the layer. Therefore, the free layer as well as the pinned layer(s), which may also be termed a reference layer, may have their magnetizations perpendicular to the layers.
- a layer having a very high perpendicular anisotropy may be termed a “perpendicular” layer.
- a magnetic element in which all magnetic layers have a very high perpendicular anisotropy is termed hereafter a fully perpendicular magnetic element.
- the magnetic field generated by the perpendicular pinned layer(s) adversely affects the response of the free layer.
- the magnetic field from the perpendicular pinned layer(s) may shift the magnetization versus magnetic field (M-H) and/or resistance versus magnetic field (R-H) response.
- M-H magnetization versus magnetic field
- R-H resistance versus magnetic field
- the perpendicular pinned layers have magnetic pole at their top and bottom interfaces. These poles can result in a net magnetic field at the free layer even when no external field is applied. In such cases, the M-H and/or R-H loop may be shifted so that the loops are not centered at a zero applied magnetic field.
- the free layer magnetization may be more likely to point in the direction of magnetization of the pinned layer.
- the magnetization versus magnetic field or resistance versus magnetic field can shift so that the M-H and/or R-H loop is shifted away from zero field.
- the magnetic element may not be used in a memory because at least two stable states are desired at zero applied magnetic field.
- FIG. 9 depicts one embodiment of a magnetic element 650 having very high perpendicular anisotropy magnetic layer(s) and which is switchable using spin transfer torque.
- the magnetic element 650 may be used in a magnetic memory, such as a MRAM.
- the magnetic element 650 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories.
- the magnetic element 650 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the magnetic element 650 includes a first pinned layer 652 , a first spacer layer 654 that may be a barrier layer 654 , a free layer 656 , a second barrier layer 658 , and a second pinned layer 660 .
- no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used.
- magnetic layers 652 , 656 , and 660 are each configured to have a very high perpendicular anisotropy.
- the magnetic element 650 is configured such that the free layer 656 can be written using spin transfer.
- the lateral dimensions, such as the width w, of the free layer 656 may be small. In some embodiments, the width is less than two hundred nanometers.
- the pinned layers 652 and 660 are also ferromagnetic.
- the pinned layer 652 and/or 660 is synthetic.
- the pinned layer 652 and/or 660 includes ferromagnetic layers separated by nonmagnetic layers.
- such a pinned layer 652 and/or 660 is configured such that the ferromagnetic layers are aligned antiparallel.
- the free layer 656 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for the free layer 656 when the perpendicular anisotropy of the free layer 656 is greater than the out of plane demagnetization energy.
- the free layer 656 may be a synthetic layer.
- One or more of the spacer layers 654 and 658 may be barrier layers. In some embodiments, both spacer layers 654 and 658 are barrier layers. In the embodiment shown, the spacer layers 654 and 658 have different resistance area products. More specifically, one spacer layer 654 or 658 has a higher resistance area product than the other spacer layer 658 or 654 . In an embodiment where the layers 654 and 658 are barrier layers, one of the barrier layers 654 or 658 has a higher resistance area product than the other barrier layers 658 or 654 , respectively. For example, in some embodiments, the resistance area product of one barrier layer 658 may be at least three and not more than ten times the resistance area product of the other barrier layer 654 .
- the resistance area product of a barrier layer 6584 may be at least three and not more than ten times the resistance area product of the other barrier layer 658 . Consequently, there may be less cancellation of tunneling magnetoresistance (TMR) between the barrier layers. A higher total TMR ratio, and thus a higher signal, may thus be achieved
- the magnetic element 650 may also be considered to be magnetically balanced.
- the pinned layers 652 and 660 may have their magnetizations 653 and 661 antiparallel. Because the magnetizations 653 and 661 of the pinned layers 652 and 660 are in opposite directions, their magnetic poles substantially cancel. Stated differently, the magnetizations 653 and 661 are magnetically balanced. As a result, the magnetic field at the free layer 656 due to the magnetizations 653 and 661 is substantially zero. Because the biasing field due to the pinned layers 652 and 660 is substantially zero, the free layer 656 may have a substantially symmetric response. Thus, asymmetries in the magnetic element 650 may result in improved performance of the magnetic element 650 .
- FIG. 10 depicts another embodiment of a magnetic element 670 having a very high perpendicular anisotropy.
- the magnetic element 670 may be used in a magnetic memory, such as a MRAM.
- the magnetic element 670 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories.
- the magnetic element 670 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the magnetic element 670 includes a first pinned layer 672 , a first spacer layer 674 that may be a barrier layer 674 , and a free layer 676 .
- no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used.
- magnetic layers 672 and 676 are each configured to have a very high perpendicular anisotropy.
- the magnetic element 670 is configured such that the free layer 676 can be written using spin transfer.
- the lateral dimensions, such as the width w, of the free layer 676 may be small. In some embodiments, the width is less than two hundred nanometers.
- the free layer 676 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for the free layer 676 when the perpendicular anisotropy of the free layer 676 is greater than the out of plane demagnetization energy.
- the free layer 676 may be a synthetic layer.
- the pinned layer 672 is also ferromagnetic in that the pinned layer has a magnetization.
- the pinned layer 672 is synthetic.
- the pinned layer 672 includes ferromagnetic layers separated by nonmagnetic layers.
- the pinned layer 672 may also be considered to be magnetically balanced.
- the pinned layer 672 has two sublattices, 671 and 673 which are opposite in direction.
- one or more rare earth transitional metal perpendicular magnetic alloys, such as CoFeGd and/or CoFeTb may be used in the pinned layer 672 .
- the magnetic poles generated by the two sub-lattices are opposite in sign, and thus cancel each other.
- the sublattices 671 and 673 may thus be considered to be magnetically balanced.
- the cancellation of the poles may result in substantially reduced to near zero magnetic biasing field on the free layer 676 .
- the response of the free layer magnetization 675 may be more symmetric.
- the magnetic moment versus magnetic field and/or resistance versus magnetic field response curves may be closer to centered around zero magnetic field/currently.
- the response of the magnetic element 670 may be improved.
- FIG. 11 depicts another exemplary embodiment of a magnetic element 670 ′.
- the magnetic element 670 ′ is analogous to the magnetic element 670 . Consequently, analogous components are labeled similarly.
- the magnetic element 670 ′ thus includes a pinned layer 672 ′, a spacer layer 674 ′ that may be a barrier layer and a free layer 676 ′.
- the free layer 676 ′ is also magnetically balanced.
- the free layer 676 ′ has two sublattices, 675 ′ and 677 which are magnetically balanced in that they are in opposite directions.
- one or more rare earth transitional metal perpendicular magnetic alloys such as CoFeGd and/or CoFeTb may be used in the free layer 676 ′.
- the pinned layer 672 ′ is asymmetric.
- the magnetic element 670 ′ shares the benefits of the magnetic element 670 .
- FIG. 12 depicts another exemplary embodiment of a magnetic element 670 ′′.
- the magnetic element 670 ′′ is analogous to the magnetic elements 670 and 670 ′. Consequently, analogous components are labeled similarly.
- the magnetic element 670 ′′ thus includes a pinned layer 672 ′′, a spacer layer 674 ′′ that may be a barrier layer and a free layer 676 ′′.
- the magnetic element 670 ′′ is a dual structure.
- the magnetic element 670 ′′ also includes an additional spacer layer 678 that may be a barrier layer and a pinned layer 680 .
- the pinned layer 680 is magnetically balanced.
- one or more rare earth transitional metal perpendicular magnetic alloys such as CoFeGd and/or CoFeTb may be used in the pinned layer 680 .
- the pinned layer 680 has two sublattices, 679 and 681 which are magnetically balanced in that they are in opposite directions.
- the pinned layer 680 is thus analogous to the pinned layer 672 .
- the pinned layer 672 ′′ is magnetically balanced as previously described for the pinned layer 672 .
- the net magnetizations of the pinned layers 672 ′′ and 680 may be in opposite directions, as depicted in FIG. 12 .
- the layers 672 ′′ and 680 magnetically balance each other.
- the magnetic element 670 ′′ not only shares the benefits of the magnetic element 670 , but also shares the benefits of the magnetic elements 650 .
- the poles of the pinned layer 672 ′′ and 680 tend to cancel, further reducing the biasing field on the free layer 676 ′′.
- the response of the free layer 676 ′′ may be more symmetric.
- FIG. 13 depicts another exemplary embodiment of a magnetic element 670 ′′′.
- the magnetic element 670 ′′′ is analogous to the magnetic elements 670 , 670 ′ and 670 ′′. Consequently, analogous components are labeled similarly.
- the magnetic element 670 ′′′ thus includes a pinned layer 672 ′′′, a spacer layer 674 ′′′ that may be a barrier layer and a free layer 676 ′′′, an additional spacer layer 678 ′ that may be a barrier layer, and a pinned layer 680 ′. Further, the free layer 676 ′′′ is magnetically balanced.
- the free layer 676 ′′′ has two sublattices, 675 ′′′ and 677 ′ which are magnetically balanced in that they are in opposite directions.
- one or more rare earth transitional metal perpendicular magnetic alloys such as CoFeGd and/or CoFeTb may be used in the free layer 676 ′′′.
- the magnetic element 670 ′′′ thus shares the benefits of the magnetic elements 670 , 670 ′, and 670 ′′.
- FIG. 14 depicts another embodiment of a magnetic element 700 having a very high perpendicular anisotropy.
- the magnetic element 700 may be used in a magnetic memory, such as a MRAM.
- the magnetic element 700 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories.
- the magnetic element 700 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the magnetic element 700 includes a first pinned layer 712 , a spacer layer 714 that may be a barrier layer 714 , and a free layer 716 having a magnetization 717 .
- no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used.
- magnetic layers 712 and 716 are each configured to have a very high perpendicular anisotropy.
- the magnetic element 700 is configured such that the free layer 716 can be written using spin transfer.
- the lateral dimensions, such as the width w, of the free layer 716 may be small. In some embodiments, the width is less than two hundred nanometers.
- the free layer 716 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for the free layer 716 when the perpendicular anisotropy of the free layer 716 is greater than the out of plane demagnetization energy.
- the free layer 716 may be a synthetic layer.
- the pinned layer 712 is also ferromagnetic and a perpendicular pinned layer.
- the pinned layer 712 includes ferromagnetic layers 702 , 706 , and 710 interleaved with nonmagnetic layers 704 and 708 . Although three magnetic layers 702 , 706 and 720 and two nonmagnetic layers 704 and 708 are shown, another number (even or odd) may be used.
- the pinned layer 712 may also be considered to be magnetically balanced.
- the ferromagnetic layers 702 , 706 , and 710 are thin. In some embodiments, the ferromagnetic layers 702 , 706 , and 720 may be as thin as one atomic layer (e.g. 0.3 nm) thick.
- the ferromagnetic layers 702 , 706 , and 720 may be as thick as 3 nm.
- the poles at the ends of the magnetic moments 701 , 705 , and 709 are very close to each other. Because the poles in each layer 702 , 706 , and 710 are close, the poles of the layer may be considered to cancel.
- each layer 702 , 706 , and 710 is magnetically balanced. As a result, the magnetic field in proximity to the free layer 716 from the pinned layer 712 is at or near zero.
- the response of the magnetic element 700 has improved symmetry.
- FIG. 15 depicts another exemplary embodiment of a magnetic element 700 ′.
- the magnetic element 700 ′ is analogous to the magnetic element 700 . Consequently, analogous components are labeled similarly.
- the magnetic element 700 ′ thus includes a pinned layer 712 ′, a spacer layer 714 ′ that may be a barrier layer and a free layer 716 ′.
- the free layer 716 ′ includes multiple layers 718 , 720 , and 722 .
- the free layer 716 ′ may be a synthetic structure. Although two magnetic layers 718 and 722 and one nonmagnetic layer 720 are shown, another number (even or odd) may be used. Because the pinned layer 712 ′ is balanced, the magnetic element 700 ′ shares the benefits of the magnetic element 700 .
- FIG. 16 depicts another exemplary embodiment of a magnetic element 700 ′′.
- the magnetic element 700 ′′ is analogous to the magnetic elements 700 and 700 ′. Consequently, analogous components are labeled similarly.
- the magnetic element 700 ′′ thus includes a pinned layer 712 ′′, a spacer layer 714 ′′ that may be a barrier layer and a free layer 716 ′′.
- the magnetic element 700 ′′ includes an additional spacer layer 724 that may be a barrier layer and an additional pinned layer 726 .
- the additional pinned layer 726 includes ferromagnetic layers 728 , 732 , and 736 interleaved with nonmagnetic layers 730 and 734 .
- the additional pinned layer 726 is analogous to the pinned layer 712 / 712 ′.
- the ferromagnetic layers 728 , 732 , and 736 are sufficiently thin that poles (not shown) within a ferromagnetic layer 728 , 732 , and 736 due to the magnetizations 729 , 731 , and 735 , respectively, within a layer 728 , 732 , and 736 , respectively, magnetically balance.
- the magnetizations of the layers 712 ′′ and 726 are in opposite directions.
- the poles of the pinned layer 712 ′′ may also magnetically balance with the pole of the pinned layer 726 . Consequently, the magnetic field in proximity to the free layer 716 ′′ from each of the pinned layers 712 ′′ and 726 is at or near zero. Thus, the response of the magnetic element 700 ′′ has improved symmetry.
- FIG. 17 depicts another exemplary embodiment of a magnetic element 700 ′′′.
- the magnetic element 700 ′′′ is analogous to the magnetic elements 700 , 700 ′, and 700 ′′. Consequently, analogous components are labeled similarly.
- the magnetic element 700 ′′′ thus includes a pinned layer 712 ′′′, a spacer layer 714 ′′′ that may be a barrier layer, a free layer 716 ′′′, an additional spacer layer 724 ′ that may be a barrier layer, and an additional pinned layer 726 ′.
- the ferromagnetic layers 702 ′′′, 706 ′′′, and 710 ′′′ are sufficiently thin that poles (not shown) within a ferromagnetic layer 702 ′′′, 706 ′′′, and 710 ′′′ due to the magnetizations 701 ′′′, 705 ′′′, and 709 ′′′, respectively, are magnetically balanced.
- the ferromagnetic layers 728 ′, 732 ′, and 736 ′ are sufficiently thin that poles (not shown) within a ferromagnetic layer 728 ′, 732 ′, and 736 ′ due to the magnetizations 729 ′, 731 ′, and 735 ′, respectively, are magnetically balanced.
- the poles from one layer 712 ′′′ may balance the poles for the other pinned layer 726 ′. Consequently, the magnetic field in proximity to the free layer 716 ′′′ from each of the pinned layers 712 ′′′ and 726 ′ is at or near zero. Thus, the response of the magnetic element 700 ′′′ has improved symmetry.
- the free layer 716 ′′′ includes magnetic layers 718 ′ and 722 ′ separated by nonmagnetic layer 720 ′.
- the free layer 716 ′′′ is analogous to the free layer 716 ′. Consequently, the magnetic element 700 ′′′ may share the benefits of the magnetic elements 700 , 700 ′, and/or 700 ′′.
- FIG. 18 depicts another embodiment of a magnetic element 750 having a very high perpendicular anisotropy.
- the magnetic element 750 may be used in a magnetic memory, such as a MRAM.
- the magnetic element 750 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories.
- the magnetic element 750 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element.
- the magnetic element 750 includes a pinned layer 762 , a spacer layer 764 that may be a barrier layer 764 , and a free layer 766 having a magnetization 767 .
- no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used.
- magnetic layers 762 and 766 are each configured to have a very high perpendicular anisotropy.
- the magnetic element 750 is configured such that the free layer 766 can be written using spin transfer.
- the lateral dimensions, such as the width w, of the free layer 766 may be small. In some embodiments, the width is less than two hundred nanometers.
- the free layer 766 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for the free layer 766 when the perpendicular anisotropy of the free layer 766 is greater than the out of plane demagnetization energy.
- the free layer 766 may be a synthetic layer.
- the pinned layer 762 is also ferromagnetic and a perpendicular pinned layer.
- the pinned layer 762 includes ferromagnetic layers 756 and 760 interleaved with nonmagnetic layer 758 . Although two magnetic layers 756 and 760 and nonmagnetic layer 758 are shown, another number (even or odd) may be used.
- the pinned layer 762 may also be considered to be magnetically balanced.
- the ferromagnetic layers 756 and 760 are thin. For example, as discussed above, in some embodiments, the ferromagnetic layers 756 and 760 may be as thin as one atomic layer (e.g. 0.3 nm) thick. In some embodiments, the ferromagnetic layers 756 and 760 may be as thick as 3 nm.
- each layer 756 and 760 is magnetically balanced.
- the magnetic field in proximity to the free layer 766 from the pinned layer 762 is at or near zero.
- the response of the magnetic element 750 has improved symmetry.
- FIG. 19 depicts another exemplary embodiment of a magnetic element 750 ′.
- the magnetic element 750 ′ is analogous to the magnetic element 750 . Consequently, analogous components are labeled similarly.
- the magnetic element 750 ′ thus includes a pinned layer 762 ′, a spacer layer 764 ′ that may be a barrier layer and a free layer 766 ′.
- the free layer 766 ′ includes multiple layers 768 , 770 , and 772 .
- the free layer 766 ′ may be a synthetic structure.
- the pinned layer 762 ′ also includes an additional ferromagnetic layer 752 and nonmagnetic layer 754 . However, the ferromagnetic layer 752 is also thin such that the magnetic poles within the layer 752 are magnetically balanced. Because the pinned layer 762 ′ is still balanced, the magnetic element 750 ′ shares the benefits of the magnetic element 750 .
- FIG. 20 depicts another exemplary embodiment of a magnetic element 750 ′′.
- the magnetic element 750 ′′ is analogous to the magnetic elements 750 and 750 ′. Consequently, analogous components are labeled similarly.
- the magnetic element 750 ′′ thus includes a pinned layer 762 ′′, a spacer layer 764 ′′ that may be a barrier layer and a free layer 766 ′′.
- the magnetic element 750 ′′ includes an additional spacer layer 774 that may be a barrier layer and an additional pinned layer 776 .
- the pinned layer 762 ′′ includes additional ferromagnetic layer 752 ′ and nonmagnetic layer 754 ′.
- the additional pinned layer 776 includes ferromagnetic layers 778 , 782 , and 786 interleaved with nonmagnetic layers 780 and 784 .
- the additional pinned layer 776 is analogous to the pinned layer 712 / 712 ′.
- the ferromagnetic layers 778 , 782 , and 786 are sufficiently thin that poles (not shown) within a ferromagnetic layer 778 , 782 , and 786 due to the magnetizations 779 , 781 , and 785 , respectively, within a layer 776 and 786 , respectively, magnetically balance.
- the magnetizations of the layers 712 ′′ and 726 are in opposite directions.
- the poles of the pinned layer 762 ′′ may also magnetically balance with the pole of the pinned layer 776 . Consequently, the magnetic field in proximity to the free layer 766 ′′ from each of the pinned layers 762 ′′ and 776 is at or near zero. Thus, the response of the magnetic element 700 ′′ has improved symmetry.
- FIG. 21 depicts another exemplary embodiment of a magnetic element 750 ′′′.
- the magnetic element 750 ′′′ is analogous to the magnetic elements 750 , 750 ′, and 750 ′′. Consequently, analogous components are labeled similarly.
- the magnetic element 750 ′′′ thus includes a pinned layer 762 ′′′, a spacer layer 764 ′′′ that may be a barrier layer, a free layer 766 ′′′, an additional spacer layer 774 ′ that may be a barrier layer, and an additional pinned layer 776 ′.
- the ferromagnetic layers 752 ′′′, 756 ′′′, and 760 ′′′ are sufficiently thin that poles (not shown) within a ferromagnetic layer 752 ′′′, 756 ′′′, and 760 ′′′ due to the magnetizations 751 ′′′, 755 ′′′, and 789 ′′′, respectively, are magnetically balanced.
- the ferromagnetic layers 778 ′, 782 ′, and 786 ′ are sufficiently thin that poles (not shown) within a ferromagnetic layer 778 ′, 782 ′, and 786 ′ due to the magnetizations 779 ′, 781 ′, and 785 ′, respectively, are magnetically balanced.
- the poles from one layer 752 ′′′ may balance the poles for the other pinned layer 776 ′. Consequently, the magnetic field in proximity to the free layer 766 ′′ from each of the pinned layers 762 ′′ and 776 ′ is at or near zero. Thus, the response of the magnetic element 750 ′′′ has improved symmetry.
- the free layer 766 ′′′ includes magnetic layers 768 ′ and 772 ′ separated by nonmagnetic layer 770 ′.
- the free layer 766 ′′′ is analogous to the free layer 716 ′. Consequently, the magnetic element 750 ′′′ may share the benefits of the magnetic elements 750 , 750 ′, and/or 700 ′′.
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Abstract
A method and system for providing a magnetic element that can be used in a magnetic memory is disclosed. The magnetic element includes pinned, nonmagnetic spacer, and free layers. The spacer layer resides between the pinned and free layers. The free layer can be switched using spin transfer when a write current is passed through the magnetic element. The free layer includes a first ferromagnetic layer and a second ferromagnetic layer. The second ferromagnetic layer has a very high perpendicular anisotropy and an out-of-plane demagnetization energy. The very high perpendicular anisotropy energy is greater than the out-of-plane demagnetization energy of the second layer.
Description
- The present application is a continuation-in-part of co-pending U.S. patent application Ser. No. 12/893,924, filed on Sep. 29, 2009; which is a continuation of co-pending U.S. patent application Ser. No. 12,133,671 filed on Jun. 5, 2008; which is a continuation of co-pending U.S. patent application Ser. No. 11/239,969, filed on Sep. 30, 2005, issued on as U.S. Pat. No. 7,531,882; which is a continuation of U.S. patent application Ser. No. 10/789,334, filed on Feb. 26, 2004, issued on Jan. 31, 2006, as U.S. Pat. No. 6,992,359, and incorporated herein by reference.
- The present invention relates to magnetic memory systems, and more particularly to a method and system for providing a magnetic element that employs a spin transfer effect in switching, and that can be switched using a lower switching current density.
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FIGS. 1A and 1B depict conventionalmagnetic elements magnetic element 10 is a spin valve and includes a conventional antiferromagnetic (AFM)layer 12, a conventional pinnedlayer 14, a conventionalconductive spacer layer 16 and a conventionalfree layer 18. Other layers (not shown), such as seed or capping layer may also be used. The conventional pinnedlayer 14 and the conventionalfree layer 18 are ferromagnetic. Thus, the conventionalfree layer 18 is depicted as having achangeable magnetization 19. Theconventional spacer layer 16 is nonmagnetic. TheAFM layer 12 is used to fix, or pin, the magnetization of thepinned layer 14 in a particular direction. The magnetization of thefree layer 18 is free to rotate, typically in response to an external magnetic field. Also depicted aretop contact 20 andbottom contact 22 that can be used to drive current through the conventionalmagnetic element 10. The conventionalmagnetic element 10′ depicted inFIG. 1B is a spin tunneling junction. Portions of the conventionalspin tunneling junction 10′ are analogous to theconventional spin valve 10. Thus, the conventionalmagnetic element 10′ includes anAFM layer 12′, a conventional pinnedlayer 14′, a conventionalinsulating barrier layer 16′ and a conventionalfree layer 18′ having achangeable magnetization 19′. Theconventional barrier layer 16′ is thin enough for electrons to tunnel through in a conventionalspin tunneling junction 10′. - Depending upon the orientations of the
magnetization 19/19′ of the conventionalfree layer 18/18′ and the conventionalpinned layer 14/14′, respectively, the resistance of the conventionalmagnetic element 10/10′, respectively, changes. When themagnetization 19/19′ of the conventionalfree layer 18/18′ is parallel to the magnetization of the conventionalpinned layer 14/14′, the resistance of the conventionalmagnetic element 10/10′ is low. When themagnetization 19/19′ of the conventionalfree layer 18/18′ is antiparallel to the magnetization of the conventionalpinned layer 14/14′, the resistance of the conventionalmagnetic element 10/10′ is high. To sense the resistance of the conventionalmagnetic element 10/10′, current is driven through the conventionalmagnetic element 10/10′. Typically in memory applications, current is driven in a CPP (current perpendicular to the plane) configuration, perpendicular to the layers of conventionalmagnetic element 10/10′ (up or down, in the z-direction as seen inFIG. 1A or 1B). - In addition, films having a perpendicular anisotropy have been used in conventional MRAM to obtain certain desired properties. For example, GdFe and GdCoFe having perpendicular anisotropy have been used in magnetic elements, as disclosed by Naoki Nishimura, et al. in “Magnetic tunnel junction device with perpendicular magnetization films for high-density magnetic random access memory”, Journal of Applied Physics, Volume 91, Number 8, pp. 5246-5249, 15 Apr. 2002. However, the structures disclosed by Nishimura's were designed for standard field-based-writing MRAM devices. Thus, the magnetization of such conventional free layers is switched by applying an external magnetic field to the magnetic element. In addition, in contrast to the
magnetic elements 10/10′, the magnetic elements disclosed by Nishimura have their equilibrium magnetizations oriented perpendicular to the film plane. Thus, the magnetization of the free layer would be in the z-direction as depicted inFIGS. 1A and 1B in such conventional magnetic elements. - In order to overcome certain issues associated with magnetic memories having a higher density of memory cells, spin transfer may be utilized to switch the
magnetizations 19/19′ of the conventionalfree layers 10/10′. Spin transfer is described in the context of the conventionalmagnetic element 10′, but is equally applicable to the conventionalmagnetic element 10. Current knowledge of spin transfer is described in detail in the following publications: J. C. Slonczewski, “Current-driven Excitation of Magnetic Multilayers,” Journal of Magnetism and Magnetic Materials, vol. 159, p. L1 (1996); L. Berger, “Emission of Spin Waves by a Magnetic Multilayer Traversed by a Current,” Phys. Rev. B, vol. 54, p. 9353 (1996), and F. J. Albert, J. A. Katine and R. A. Buhrman, “Spin-polarized Current Switching of a Co Thin Film Nanomagnet,” Appl. Phys. Lett., vol. 77, No. 23, p. 3809 (2000). Thus, the following description of the spin transfer phenomenon is based upon current knowledge and is not intended to limit the scope of the invention. - When a spin-polarized current traverses a magnetic multilayer such as the
spin tunneling junction 10′ in a CPP configuration, a portion of the spin angular momentum of electrons incident on a ferromagnetic layer may be transferred to the ferromagnetic layer. In particular, electrons incident on the conventionalfree layer 18′ may transfer a portion of their spin angular momentum to the conventionalfree layer 18′. As a result, a spin-polarized current can switch themagnetization 19′ direction of the conventionalfree layer 18′ if the current density is sufficiently high (approximately 107-108 A/cm2) and the lateral dimensions of the spin tunneling junction are small (approximately less than two hundred nanometers). In addition, for spin transfer to be able to switch themagnetization 19′ direction of the conventionalfree layer 18′, the conventionalfree layer 18′ should be sufficiently thin, for instance, preferably less than approximately ten nanometers for Co. Spin transfer based switching of magnetization dominates over other switching mechanisms and becomes observable when the lateral dimensions of the conventionalmagnetic element 10/10′ are small, in the range of few hundred nanometers. Consequently, spin transfer is suitable for higher density magnetic memories having smallermagnetic elements 10/10′. - The phenomenon of spin transfer can be used in the CPP configuration as an alternative to or in addition to using an external switching field to switch the direction of magnetization of the conventional
free layer 18′ of the conventionalspin tunneling junction 10′. For example, themagnetization 19′ of the conventionalfree layer 18′ can be switched from antiparallel to the magnetization of the conventional pinnedlayer 14′ to parallel to the magnetization of the conventionalpinned layer 14′. Current is driven from the conventionalfree layer 18′ to the conventional pinnedlayer 14′ (conduction electrons traveling from the conventional pinnedlayer 14′ to the conventionalfree layer 18′). The majority electrons traveling from the conventional pinnedlayer 14′ have their spins polarized in the same direction as the magnetization of the conventional pinnedlayer 14′. These electrons may transfer a sufficient portion of their angular momentum to the conventionalfree layer 18′ to switch themagnetization 19′ of the conventionalfree layer 18′ to be parallel to that of the conventionalpinned layer 14′. Alternatively, the magnetization of thefree layer 18′ can be switched from a direction parallel to the magnetization of the conventional pinnedlayer 14′ to antiparallel to the magnetization of the conventional pinnedlayer 14′. When current is driven from the conventionalpinned layer 14′ to the conventionalfree layer 18′ (conduction electrons traveling in the opposite direction), majority electrons have their spins polarized in the direction of magnetization of the conventionalfree layer 18′. These majority electrons are transmitted by the conventional pinnedlayer 14′. The minority electrons are reflected from the conventional pinnedlayer 14′, return to the conventionalfree layer 18′ and may transfer a sufficient amount of their angular momentum to switch themagnetization 19′ of thefree layer 18′ antiparallel to that of the conventionalpinned layer 14′. - Although spin transfer functions as a mechanism for switching the conventional
magnetic elements magnetic elements conventional element 10 is used, the output signal is small. In the conventionalmagnetic element 10, both the total resistance and the change in resistance in SV-based spin transfer elements are small typically less than two Ohms and five percent, respectively. - One proposed method of increasing the output signal is to use a spin tunneling junction, such as the conventional
magnetic element 10′, for the spin transfer device. The conventionalmagnetic element 10′ can exhibit large resistance and large signal. For example resistances in excess of one thousand Ohms and a greater than forty percent percentage change in resistance, respectively. However, one of ordinary skill in the art will readily recognize that the use of the conventionalmagnetic element 10′ requires a small operating current to keep the conventionalmagnetic element 10′ from deteriorating or breaking down. - Accordingly, what is needed is a system and method for providing a magnetic memory element having elements that can be switched using spin transfer at a lower current density and that consume less power. The present invention addresses such a need.
- The present invention provides a method and system for providing a magnetic element that can be used in a magnetic memory. The magnetic element includes pinned, nonmagnetic spacer, and free layers. The spacer layer resides between the pinned and free layers. The free layer can be switched using spin transfer when a write current is passed through the magnetic element. The free layer includes a first ferromagnetic layer and a second ferromagnetic layer. The second ferromagnetic layer has a very high perpendicular anisotropy and an out-of-plane demagnetization energy. The very high perpendicular anisotropy energy is greater than the out-of-plane demagnetization energy of the second layer.
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FIG. 1A is a diagram of a conventional magnetic element, a spin valve. -
FIG. 1B is a diagram of another conventional magnetic element, a spin tunneling junction. -
FIG. 2A depicts a first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 2B depicts another version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 3A depicts a second version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least a high perpendicular anisotropy. -
FIG. 3B depicts a third version of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least a high perpendicular anisotropy. -
FIG. 4 depicts a second embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 5A is a preferred version of the second embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 5B depicts a second version of the second embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to high perpendicular anisotropy. -
FIG. 5C depicts a third version of the second embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to high perpendicular anisotropy. -
FIG. 6 depicts a third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 7A is a preferred version of the third embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 7B depicts another version of the third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least high perpendicular anisotropy. -
FIG. 7C depicts another version of the third embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching due to at least high perpendicular anisotropy. -
FIG. 8 depicts a flow chart of a one embodiment of a method in accordance with the present invention for providing one embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. -
FIG. 9 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 10 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 11 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 12 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 13 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 14 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 15 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 16 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy -
FIG. 17 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 18 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 19 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 20 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. -
FIG. 21 depicts another embodiment of a magnetic element having a very high perpendicular anisotropy. - The present invention relates to an improvement in magnetic elements and magnetic memories, such as MRAM. The following description is presented to enable one of ordinary skill in the art to make and use the invention and is provided in the context of a patent application and its requirements. Various modifications to the preferred embodiments will be readily apparent to those skilled in the art and the generic principles herein may be applied to other embodiments. Thus, the present invention is not intended to be limited to the embodiments shown, but is to be accorded the widest scope consistent with the principles and features described herein.
- The present invention provides a method and system for providing a magnetic element that can be used in a magnetic memory. The magnetic element comprises at least pinned, nonmagnetic spacer, and free layers. The spacer layer resides between the pinned and free layers. The magnetic element is configured to allow the free layer to be switched using spin transfer when a write current is passed through the magnetic element. In some aspects, the magnetic element further comprises a barrier layer, a second pinned layer. In other aspects, the magnetic element further comprises a second spacer layer, a second pinned layer and a second free layer magnetostatically coupled to the first free layer. In such an aspect, the second spacer layer is between the second pinned and second free layers and a separation layer is preferably provided between the first and second free layers to ensure they are magnetostatically coupled. In one aspect, one or more of the free layers has a perpendicular anisotropy. The perpendicular anisotropy has a perpendicular anisotropy energy at least twenty percent and, in general, less than one hundred percent of the out-of-plane demagnetization energy.
- The present invention will be described in terms of a particular magnetic memory and a particular magnetic element having certain components. However, one of ordinary skill in the art will readily recognize that this method and system will operate effectively for other magnetic memory elements having different and/or additional components and/or other magnetic memories having different and/or other features not inconsistent with the present invention. The present invention is also described in the context of current understanding of the spin transfer phenomenon. Consequently, one of ordinary skill in the art will readily recognize that theoretical explanations of the behavior of the method and system are made based upon this current understanding of spin transfer. One of ordinary skill in the art will also readily recognize that the method and system are described in the context of a structure having a particular relationship to the substrate. For example, as depicted in the drawings, the bottoms of the structures are typically closer to an underlying substrate than the tops of the structures. However, one of ordinary skill in the art will readily recognize that the method and system are consistent with other structures having different relationships to the substrate. In addition, the method and system are described in the context of certain layers being synthetic and/or simple. However, one of ordinary skill in the art will readily recognize that the layers could have another structure. For example, although the method and system are described in the context of simple free layers, nothing prevents the present invention from being used with synthetic free layers. Furthermore, the present invention is described in the context of magnetic elements having particular layers. However, one of ordinary skill in the art will readily recognize that magnetic elements having additional and/or different layers not inconsistent with the present invention could also be used. Moreover, certain components are described as being ferromagnetic. However, as used herein, the term ferromagnetic could include ferrimagnetic or like structures. Thus, as used herein, the term “ferromagnetic” includes, but is not limited to ferromagnets and ferrimagnets. The present invention is also described in the context of single elements. However, one of ordinary skill in the art will readily recognize that the present invention is consistent with the use of magnetic memories having multiple elements, bit lines, and word lines. The present invention is also described in the context of a particular mechanism, a high anisotropy, for providing a lower switching current density. However, one of ordinary skill in the art will readily recognize that the method and system described herein can be combined with other mechanisms for reducing the switching current density, such as a low saturation magnetization free layer.
- To more particularly illustrate the method and system in accordance with the present invention, refer now to
FIG. 2A , depicting a first embodiment of a portion of amagnetic element 100 in accordance with the present invention having a reduced write current density for spin transfer. Themagnetic element 100 is preferably used in a magnetic memory, such as a MRAM. Thus, themagnetic element 100 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories. Moreover, themagnetic element 100 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. Themagnetic element 100 includes a pinnedlayer 110, aspacer layer 120, and afree layer 130. As described below, thefree layer 130 is configured to have a high perpendicular anisotropy. Themagnetic element 100 generally also includes an AFM layer (not shown) used to pin themagnetization 111 of the pinnedlayer 110, as well as seed layers (not shown) and capping layers (not shown). Furthermore, themagnetic element 100 is configured such that thefree layer 130 can be written using spin transfer. In a preferred embodiment, the lateral dimensions, such as the width w, of thefree layer 130 are thus small and preferably less than two hundred nanometers. In addition, some difference is preferably provided between the lateral dimensions to ensure that thefree layer 130 has a particular easy axis in the plane of thefree layer 130. - The pinned
layer 110 is ferromagnetic. In one embodiment the pinnedlayer 110 is synthetic. In such an embodiment, the pinnedlayer 110 includes ferromagnetic layers separated by nonmagnetic layers and is configured such that the ferromagnetic layers are aligned antiparallel. The pinnedlayer 110 may be configured to increase the spin dependence of the bulk resistivity of themagnetic element 100. For example, the pinnedlayer 110, or its ferromagnetic layers, may be a multilayer made up of repeated bilayers (not explicitly shown inFIG. 2A ). In one such embodiment, the pinnedlayer 110 could be a multilayer of (FexCo1-x/Cu)n, where n is the number of times the FexCo1-x/Cu bilayer is repeated. In such embodiment, n is greater than one and the Cu layer of the bilayer is preferably one through eight Angstroms thick. Thespacer layer 120 is nonmagnetic. In one embodiment, thespacer layer 120 may be conductive, for example including Cu. In another embodiment, thespacer layer 120 is a barrier layer including an insulator such as alumina. In such an embodiment, thebarrier layer 120 is less than two nanometers thick such that charge carriers can tunnel between thefree layer 130 and the pinnedlayer 110. - The
free layer 130 is ferromagnetic and is configured to have a high perpendicular anisotropy. As used herein, a high perpendicular anisotropy occurs for the simplefree layer 130 when the perpendicular anisotropy of thefree layer 130 has a corresponding perpendicular anisotropy energy that is at least twenty percent and less than one hundred percent of the demagnetization energy.FIG. 2B depicts amagnetic element 100′ that is analogous to themagnetic element 100. Thus, analogous components are labeled similarly. Themagnetic element 100′, therefore, includes afree layer 130′ that can be written using spin transfer and that has a high perpendicular anisotropy. However, thefree layer 130′ is synthetic, including twoferromagnetic layers nonmagnetic layer 134 that is preferably Ru. Thenonmagnetic layer 134 is configured so that themagnetizations free layer 130′ are aligned antiparallel. Thefree layer 130′ has a high perpendicular anisotropy because theferromagnetic layers ferromagnetic layers ferromagnetic layers FIGS. 2A and 2B , the high perpendicular anisotropy is defined to have a perpendicular anisotropy energy that is at least twenty percent but less than one hundred percent of the demagnetization energy. Consequently, although the perpendicular anisotropy is substantial, the equilibrium magnetization of thefree layer 130 or the constituentferromagnetic layers FIGS. 2A and 2B ). For clarity, the discussion below primarily refers to thefree layer 130. However, the principles discussed also apply to thefree layer 130′, includingferromagnetic layers magnetic element 100′. - A high perpendicular anisotropy occurs when the perpendicular anisotropy energy of the
free layer 130 is greater than twenty percent but less than one hundred percent of the out-of-plane demagnetization energy of thefree layer 130. As a result, themagnetization 131 of thefree layer 130 lies in plane at equilibrium (in the absence of a write current or a sufficient external magnetic field). The high perpendicular anisotropy is preferably provided using materials having a high perpendicular crystalline anisotropy and/or by stressing the layer in some manner. The high perpendicular anisotropy should reduce the critical switching current density, Jc, required to switch the magnetization of thefree layer 130 due to spin transfer. - The ability of the high perpendicular anisotropy free layer to reduce the switching current density can be understood using the prevalent spin transfer spin-torque model described in J. C. Slonczewski, “Current-driven Excitation of Magnetic Multilayers,” Journal of Magnetism and Magnetic Materials, vol. 159, p. L1-L5 (1996). According to Slonczewski's model, the switching current density Jc for the free layer of a spin transfer stack is proportional to:
-
αtM s [H eff−2πM s ]/g(θ) - where:
- α=the phenomenological Gilbert damping constant;
- t=the thickness of the free layer;
- Ms=saturation magnetization of the free layer;
- Heff=effective field for the free layer;
- g(θ) reflects the spin-transfer efficiency
- The effective field, Heff, includes the external magnetic field, shape anisotropy fields, in-plane and out-of-plane (i.e. perpendicular) anisotropies, and dipolar and exchange fields. The perpendicular anisotropy typically arises from crystalline anisotropy. The term g(θ) depends on the relative angular orientations of the magnetizations of the pinned
layer 110 and thefree layer 130. - The ability of a high perpendicular anisotropy to reduce the switching current density can be explained as follows. For the majority of magnetic materials, the out-of-plane demagnetization term 2πMs is much greater than Heff. For instance, for a thin film ellipse of Co with the majority axis of 200 nm, minority axis of 100 nm, and thickness of 20 A, the term 2πMs is approximately 8 kOe, which is much larger than Heff that is less than a few hundred Oe. A high perpendicular anisotropy, generally a crystalline anisotropy, can be introduced into the
free layer 130 to offset most, but not all, of the out-of-plane demagnetization. Thus, as defined above, the high perpendicular anisotropy has a perpendicular anisotropy energy that is less than one hundred percent of the demagnetization energy. The high perpendicular anisotropy has a perpendicular anisotropy energy that is preferably between twenty and ninety five percent (and in a preferred embodiment, is ninety percent) of the demagnetization energy. Because the out-of-plane demagnetization energy would then be still larger than the perpendicular anisotropy energy, theequilibrium magnetization 131 of thefree layer 130 should remain in-plane. However, because the perpendicular anisotropy has been greatly increased, the difference between the effective field Heff (which includes the perpendicular anisotropy), and the demagnetization term 2πMs, is decreased. Thus, the equilibrium magnetic moment of thefree layer 130 remains in plane, but can be switched using a lower switching current density. In short, to reduce the switching current density for a spin transfer induced switching of themagnetization 131 of thefree layer 130, a high perpendicular anisotropy should be provided for thefree layer 130. - The high perpendicular anisotropy for the
free layer 130 can be provided in a number of ways. In order to provide a high perpendicular anisotropy, materials used in thefree layer 130, or the constituentferromagnetic layers free layer 130 or theferromagnetic layers - In an alternative embodiment, the
free layer 130 or theferromagnetic layers -
FIG. 3A depicts anotherversion 100″ of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer switching. Themagnetic element 100″ is analogous to themagnetic element 100. Thus, analogous components are labeled similarly. Therefore, the magnetic element includes afree layer 130″ that has a high perpendicular anisotropy and which is written using spin transfer. Moreover, themagnetic element 100″ preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. In a preferred embodiment, thefree layer 130″ includes Co, CoCr, CoPt, CoCrPt, CoFe, CoFeCr, CoFePt, CoFeCrPt, or their multilayer combinations, which have an intrinsic high perpendicular anisotropy. Themagnetic element 100″ also includes optionalstress increasing layers stress increasing layers layer 154 is used to alter the stress and the surface anisotropy of thefree layer 130″, leading to further enhancement of the total perpendicular anisotropy. Thestress increasing layer 152 is a seed layer that also enhances the total perpendicular anisotropy of thefree layer 130″. Thestress increasing layer 152 may act as part of thespacer layer 120″ when thespacer layer 120″ is conductive. However, if thespacer layer 120″ is an insulating barrier layer, the inclusion of thestress increasing layer 152 can cause a significant degradation in signal. In such an embodiment, thestress increasing layer 152 is, therefore, undesirable. Thestress increasing layers free layer 130″. However, note that the use of Pt and Pd either within thefree layer 130″ oradjacent layers free layer 130″. In addition, the perpendicular anisotropy of the materials above, such as Co, CoCr, CoPt, CoCrPt, CoFe, CoFeCr, CoFePt, and CoFeCrPt, can be further increased by intrinsic stress in the film itself. This intrinsic stress may be induced during the film deposition and/or by surrounding the spin transfer stack (containing thefree layer 130″) with an insulator (dielectric) of high compressive stress. -
FIG. 3B depicts anotherversion 100′″ of the first embodiment of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer. Themagnetic element 100′″ is analogous to themagnetic element 100. Therefore, themagnetic element 100″' includes afree layer 130′″ that has a high perpendicular anisotropy, an optional low saturation magnetization, and which is written using spin transfer. Moreover, themagnetic element 100′″ preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. - The
free layer 130′″ has a high perpendicular anisotropy, as defined above. Thefree layer 130′″ also includes a very high perpendicular anisotropyferromagnetic layer 160 and aferromagnetic layer 162. In a preferred embodiment, the high perpendicular anisotropy of thefree layer 130′″ is provided at least in part due to the very high perpendicular anisotropyferromagnetic layer 160. The very high perpendicular anisotropyferromagnetic layer 160 has a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy has a perpendicular anisotropy energy that exceeds the out-of-plane demagnetization energy. As a result, a film having a very high perpendicular anisotropy, when standing alone, would have its equilibrium magnetization perpendicular to the plane. The very high perpendicular anisotropyferromagnetic layer 160 is preferably a rare earth-transition metal alloy, such as GdFe and GdCoFe, where the rare earth may be in the range of five to sixty atomic percent. Such rare earth-transition metal alloys have relatively low damping constants and high or very high perpendicular anisotropy. The very high perpendicular anisotropyferromagnetic layer 160 preferably has a perpendicular anisotropy energy larger than its own out-of-plane demagnetization energy. Theferromagnetic layer 162 has a high spin polarization. Thus, theferromagnetic layer 162 preferably includes one or more high spin-polarization materials such as Co, Fe, or CoFe. Theferromagnetic layer 162 has a perpendicular anisotropy energy that is smaller than its out-of-plane demagnetization energy. The very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 are exchange-coupled. - The exchange-coupled combination of the very high
perpendicular anisotropy sublayer 160 and the high spin polarization ferromagnetic layer provide a total high perpendicular anisotropy for thefree layer 130′″. At larger thickness of the very high perpendicular anisotropyferromagnetic layer 160, the total perpendicular anisotropy energy of the combination of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 exceeds the total out-of-plane demagnetization energy for the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162. In such a case, the magnetizations of both the very high perpendicular anisotropyferromagnetic layer 160, theferromagnetic layer 162 and thus thefree layer 130′″ would be oriented perpendicular to the film plane. If the thickness of the very high perpendicular anisotropyferromagnetic layer 160 is reduced, however, the total perpendicular anisotropy energy of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 is reduced faster than the total out-of-plane demagnetization energy of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162. Stated differently, the total perpendicular anisotropy energy of thefree layer 130′″ is reduced more rapidly than the total out-of-plane demagnetization energy of thefree layer 130′″. Alternatively, if the thickness of the high spin-polarization ferromagnetic 162 is increased, the total perpendicular anisotropy energy of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 is increased more slowly than the total out-of-plane demagnetization energy of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162. Stated differently, the total perpendicular anisotropy energy of thefree layer 130′″ is increased more slowly than the out-of-plane demagnetization energy of thefree layer 130′″. When the total perpendicular anisotropy energy becomes less than the total out-of-plane demagnetization energy, the equilibrium magnetizations of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 rotate into the film plane. Stated differently, the perpendicular anisotropy energy of thefree layer 130′″ is less than the out-of-plane demagnetization energy of thefree layer 130′″ and the magnetization of thefree layer 130′″ is in plane even though thefree layer 130′″ has a high perpendicular anisotropy. Thus, to decrease the spin-transfer switching current, the thicknesses of the very high perpendicular anisotropyferromagnetic layer 160 and theferromagnetic layer 162 are tailored such that the total perpendicular crystalline anisotropy is high. Stated differently, the perpendicular anisotropy of the combination of thelayers magnetic element 100′″ could be a top MTJ, having thefree layer 130′″ at the bottom closest to the substrate, the spacer orbarrier layer 120′″ and a pinnedlayer 110′″ at the top. Such a magnetic element would include: very high perpendicular anisotropyferromagnetic layer 160/ferromagnetic layer 162/spacer (barrier)layer 120′″/pinnedlayer 110′″/pinning or AFM layer (not shown). Thus, an example of themagnetic element 100′″ is given by: AlCu[250 A]/GdFeCo[t]/CoFe[10 A]/Al2O3[8 A]/CoFe[30 A]/PtMn[150 A], where the thickness, t, of GdFeCo is preferably adjusted between ten and four hundred Angstroms so that the that the total perpendicular crystalline anisotropy energy is between at least twenty and less than one hundred percent, preferably ninety percent, of the total out-of-plane demagnetization energy. Thus, the equilibrium magnetic moment of thefree layer 130′″ should remain in-plane. - In an alternative embodiment, the very high perpendicular anisotropy
ferromagnetic layer 160 can include multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A. The repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of thefree layer 130′″. - Thus, the
magnetic elements magnetic elements magnetic elements magnetic elements -
FIG. 4 depicts a second embodiment of amagnetic element 200 in accordance with the present invention having a reduced write current density for spin transfer. Themagnetic element 200 includes aspin valve portion 204 and a spintunneling junction portion 202 that share afree layer 230. Thespin valve portion 204 includes a pinninglayer 260 that is preferably an antiferromagnetic (AFM)layer 260, pinnedlayer 250,conductive spacer layer 240 such as Cu, and afree layer 230. In an alternate embodiment, theconductive spacer layer 240 could be replaced by a barrier layer. The spintunneling junction portion 202 includes a pinninglayer 206 that is preferably an antiferromagnetic (AFM)layer 206, pinnedlayer 210,barrier layer 220 that is an insulator configured to allow electrons to tunnel through it, and thefree layer 230. Referring toFIGS. 2A and 4 , thelayers layers magnetic element 100 when thespacer layer 120 is conducting. Similarly, thelayers layers spacer layer 120 is an insulating barrier layer. The pinned layers 210 and 250 thus preferably correspond to the pinnedlayers 110 and can be configured using analogous materials, layers, and/or process. For example, the pinnedlayer 210 and/or the pinnedlayer 250 may include multilayer (FexCo1-x/Cu)n, where the n is the number of repeats that is greater than one. In addition, the Fe atomic percent, x, is preferably approximately 0.5 and the Cu layers are preferably one through eight Angstroms thick. Thefree layer 230 is configured to be written using spin transfer and has a high perpendicular anisotropy. Moreover, themagnetic element 200 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of themagnetic element 200. Themagnetic element 200 also includes pinninglayers layers - The
free layer 230 is preferably configured in a manner analogous to thefree layers free layer 230. Materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for thefree layer 230. In addition, as discussed above with respect to thefree layer 130′, thefree layer 230 can be synthetic. Consequently, themagnetic element 200 can be written using spin transfer at a lower switching current density. Stated differently, themagnetic element 200 can share the benefits of themagnetic elements layers spin valve portion 204 and the spintunneling junction portion 202 can contribute to writing thefree layer 230. Because of the use of thebarrier layer 220, themagnetic element 200 has higher resistance and magnetoresistance. Consequently, a higher signal may be obtained during reading. -
FIG. 5A is a preferred version of the second embodiment of amagnetic element 300 in accordance with the present invention having a reduced write current density for spin transfer. Themagnetic element 300 is analogous to themagnetic element 200 depicted inFIG. 4 . Thus, analogous components are labeled similarly. Therefore, the magnetic element includes afree layer 330, which corresponds to thefree layer 230, that has a high perpendicular anisotropy is written using spin transfer. Moreover, themagnetic element 300 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. - The
free layer 330 is preferably configured in a manner analogous to thefree layers free layer 230. Thus, analogous materials and principles to those discussed above may be used to achieve the high perpendicular anisotropy of thefree layer 330. For example, materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for thefree layer 330. Thus, the materials discussed above with respect to thefree layers free layer 130′, thefree layer 330 can be synthetic. Because of the high perpendicular anisotropy, themagnetic element 300 can be written using spin transfer at a lower switching current density. Stated differently, themagnetic element 300 can share the benefits of themagnetic elements barrier layer 320, themagnetic element 300 has higher resistance and magnetoresistance. Consequently, a higher signal may be obtained during reading. In an alternate embodiment, thebarrier layer 320 may be replaced by a conducting layer. However, in such an embodiment, the read signal is decreased for a given read current. - In the
magnetic element 300, the pinnedlayer 310 is synthetic. The pinnedlayer 310 thus includesferromagnetic layers nonmagnetic layer 314, which is preferably Ru. Thenonmagnetic layer 314 is configured such that theferromagnetic layers magnetic element 300 is configured such that theferromagnetic layer 316 and the pinnedlayer 350 are antiparallel. As a result, thespin valve portion 304 and the spintunneling junction portion 302 can both contribute to the spin transfer used to write to themagnetic element 300. Thus, an even lower switching current can be used to write to themagnetic element 300. In addition, becauseadjacent layers - The
free layers magnetic elements FIG. 5B depicts another version of thesecond embodiment 300′ of a portion of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy. Themagnetic element 300′ is analogous to themagnetic element 300 and, therefore, shares its advantages. For example, thefree layer 330′ has a high perpendicular anisotropy. Furthermore, in a manner similar to themagnetic element 100″, themagnetic element 300′ includesstress increasing layer 380 that is analogous to thestress increasing layer 154. Although only thestress increasing layer 380 is depicted, another stress increasing layer could be used between thefree layer 330′ and thebarrier layer 320′. However, such a layer would strongly reduce the tunneling magnetoresistance because this layer would lie adjacent to thebarrier layer 320′. With the use of thestress increasing layer 380 and/or, in an alternate embodiment, a stress increasing layer between thefree layer 330′ and thebarrier layer 320′, the high perpendicular anisotropy of thefree layer 330′ may be obtained. Thus, the benefits of themagnetic element 100″ may also be achieved. -
FIG. 5C depicts a third version of the second embodiment of a portion of amagnetic element 300″ in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy. Themagnetic element 300″ is analogous to themagnetic element 300 and, therefore, shares its advantages. For example, thefree layer 330″ has a high perpendicular anisotropy. Furthermore, in a manner similar to themagnetic element 100′″, themagnetic element 300″ includes very high perpendicular anisotropyferromagnetic layer 390 that is preferably analogous to the very high perpendicular anisotropyferromagnetic layer 160 depicted inFIG. 3B and a high spin polarizationferromagnetic layers spin polarization layer 162. Thus, the very high perpendicular anisotropyferromagnetic layer 390 is preferably a rare earth-transition metal alloy. Furthermore, the thicknesses of the very high perpendicular anisotropyferromagnetic layer 390 and theferromagnetic layers ferromagnetic layer 390 and theferromagnetic layers free layer 330″ that is analogous to thefree layer 130′″ may be achieved. Consequently, the benefits of themagnetic element 100′″ may also be attained. - In an alternative embodiment, the very high perpendicular anisotropy
ferromagnetic layer 390 can include multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A. The repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of thefree layer 330″. -
FIG. 6 depicts a third embodiment of a portion of amagnetic element 400 in accordance with the present invention having a reduced write current density for spin transfer. The magnetic element includes twostructures magnetic element structure 402 includes a pinnedlayer 410, aspacer layer 420, and afree layer 430 that are analogous to, for example, thelayers magnetic element 100. Thestructure 402 also includes pinninglayer 406 that is preferably an AFM layer. Similarly, thestructure 404 includes a pinnedlayer 470, aspacer layer 460, and afree layer 450 that are analogous to, for example, thelayers magnetic element 100. Thestructure 404 also includes pinninglayer 480 that is preferably an AFM layer. One or both of thefree layers free layer 430 and/or 450 may also be synthetic. In such a case the ferromagnetic layers (not explicitly shown) within thefree layer 430 and/or 450 would have a high perpendicular anisotropy. Furthermore, thefree layers magnetic element 400 are magnetostatically coupled, preferably so that thelayers magnetic element 400 includes aseparation layer 440. Theseparation layer 440 is configured to ensure that thefree layers separation layer 440, which is preferably a nonmagnetic conductor, is preferably configured to ensure that thefree layers separation layer 440 serves to randomize the polarization of the spins passing through it. For example, theseparation layer 440 includes materials such as Cu, Ag, Au, Pt, Mn, CuPt, CuMn, a Cu/Pt[1-20 A]/Cu sandwich, a Cu/Mn[1-20 A]/Cu sandwich, or a Cu/PtMn[1-20 A]/Cu sandwich. Although the separation layer is used in themagnetic element 400, nothing prevents another mechanism from being used. For example, in one embodiment, thestructure 402 might be a dual structure including a second pinned layer (not shown), a second spacer layer (not shown), and a pinning layer (not shown). The thicknesses of the second pinned and spacer layers, as well as the pinning layer may be configured to ensure that thefree layers - The
free layer 430 and/or thefree layer 450 are configured to have a high perpendicular anisotropy, as defined above. Thus, thefree layer 430 and/or 450 may correspond to thefree layers free layer 430 and/or thefree layer 450 are the same as or analogous to those described above with respect to themagnetic elements magnetic element 400 shares many of the benefits of themagnetic elements - The magnetostatic coupling between the
free layers free layers free layer 450 is reflected in thefree layer 430. Thespacer layer 420 can be either a conductive layer or a barrier layer that provides a high signal. Furthermore, because they have separatefree layers spin valve 404 and thespin tunneling junction 402, respectively, can be separately tailored to improve their functions of the spin valve and spin tunneling junction, respectively. -
FIG. 7A is a preferred version of the third embodiment of amagnetic element 500 in accordance with the present invention having a reduced write current density for spin transfer. Themagnetic element 500 is analogous to themagnetic element 400 depicted inFIG. 6 . Thus, analogous components are labeled similarly. Therefore, the magnetic element includesfree layers free layers free layer 530 and/or 550 may also be synthetic. In such a case the ferromagnetic layers (not explicitly shown) within thefree layer 530 and/or 550 would have a high perpendicular anisotropy. Moreover, themagnetic element 500 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of themagnetic element 500. - The pinned layers 510 and 570 are synthetic. Thus, the pinned
layer 510 includesferromagnetic layers nonmagnetic layer 514 that is preferably Ru. The magnetizations of theferromagnetic layers layer 570 includesferromagnetic layers nonmagnetic layer 574 that is preferably Ru. The magnetizations of theferromagnetic layers spacer layer 520 is preferably a barrier layer that is insulating yet allows electrons to tunnel between theferromagnetic layer 516 and thefree layer 530. Thespacer layer 560 is preferably a conductive layer. Thus, thestructure 502 is a spin tunneling junction, while thestructure 504 is a spin valve. - The
free layers 530 and/or 550 are preferably configured in a manner analogous to thefree layers free layers free layers 530 and/or 550. For example, materials having a high crystalline perpendicular anisotropy and/or other conditions such as stress could be used to achieve the high perpendicular anisotropy for thefree layer 530 and/or 550. Thus, the materials discussed above with respect to thefree layers free layer 130′, thefree layers 530 and/or 550 can be synthetic. Because of the high perpendicular anisotropy, themagnetic element 500 can be written using spin transfer at a lower switching current density. Stated differently, themagnetic element 500 can share the benefits of themagnetic elements - Furthermore, because the
free layers free layer 550, for example due to spin transfer induced writing, is reflected in the magnetization of thefree layer 530. With thebarrier layer 520, thespin tunneling junction 502 provides a high signal. In an alternate embodiment, thebarrier layer 520 may be replaced by a conducting layer. However, in such an embodiment, the read signal is decreased for a given read current. - As previously mentioned, the
free layers magnetic element 500, can be configured in an analogous manner to that discussed above. For example,FIG. 7B is another version of the third embodiment of amagnetic element 500′ in accordance with the present invention having a reduced write current density for spin transfer due to at least a high perpendicular anisotropy. Themagnetic element 500′ is analogous to themagnetic element 500 and, therefore, shares its advantages. For example, thefree layers 530′ and/or 550′ have a high perpendicular anisotropy. Furthermore, in a manner similar to themagnetic element 100″, themagnetic element 500′ includes optionalstress increasing layers stress increasing layers stress increasing layers free layer 530′ and thebarrier layer 520′. However, such an optional stress increasing layer may result in a lower magnetoresistance. In addition, use of the optionalstress increasing layer 586 may result in a lower spin torque for spin transfer as well as a lower magnetoresistance for thespin valve 504′. Thus, the high perpendicular anisotropy of thefree layer 530′ and/or 550′ may be obtained. Thus, the benefits of themagnetic element 100″ may also be achieved. -
FIG. 7C depicts a third version of the second embodiment of a portion of amagnetic element 500″ in accordance with the present invention having a reduced write current density for spin transfer due to a high perpendicular anisotropy. Themagnetic element 500″ is analogous to themagnetic element 500 and, therefore, shares its advantages. For example, thefree layer 530″ and/or 550″ have a high perpendicular anisotropy. Furthermore, in a manner similar to themagnetic element 100′″, the free layer(s) 530″ and 550″ include very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591, respectively, that are preferably analogous to the very high perpendicular anisotropyferromagnetic layer 160 depicted inFIG. 3B . The free layer(s) 530″ and 550″ also includeferromagnetic layers layers 540″ and 591 to help enhance the perpendicular anisotropy oflayer 591. Furthermore, the thicknesses of the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 and the ferromagnetic layer(s) 592 and 593, respectively, are preferably tailored such that the equilibrium magnetizations of the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 and the ferromagnetic layer(s) 592 and 593 are in plane, as depicted. Thus, the very high perpendicular anisotropyferromagnetic layers - Alternatively, the very high perpendicular anisotropy ferromagnetic layer(s) 590 and 591 can be multilayers [Co/Pd]n/Co, [Co/Pt]n/Co, [CoFe/Pd]n/CoFe, [CoFe/Pt]n/CoFe, [CoCr/Pd]n/CoCr, or [CoCr/Pt]n/CoCr where n is between 1 and 10, Co 3 A to 20 A, CoFe 3 A to 20 A, CoCr 3 A to 20 A, Pd 10 A to 100 A, Pt 10 A to 100 A. The repeat number n and the exact thicknesses of Co, CoFe, CoCr, Pd, and Pt are chosen so that the total perpendicular anisotropy energy is between twenty and ninety five percent of the total out-of-plane demagnetization energy of the
free layer 530″ and/or 550″. Thus, the high perpendicular anisotropy of thefree layer 530″ and/or 550″ may be achieved. Consequently, the benefit of themagnetic element 100′″ may also be provided. - Thus, the
magnetic elements magnetic elements -
FIG. 8 depicts a flow chart of a one embodiment of amethod 600 in accordance with the present invention for providing one embodiment of a magnetic element in accordance with the present invention having a reduced write current density for spin transfer. Themethod 600 is described in the context of themagnetic element 100. However, nothing prevents themethod 600 from being adapted to provide themagnetic elements 100′, 100″, 100′″, 200, 300, 300′, 300″, 400, 500, 500′, and/or 500″. A pinned layer, such as the pinnedlayer 110 is provided, viastep 602. In one embodiment,step 602 includes providing a synthetic pinned layer. Thespacer layer 120 is provided, viastep 604. Step 604 can include providing a barrier layer or a conducting layer. Thefree layer 130 having a high perpendicular anisotropy is provided, viastep 606. In some embodiments, the very high perpendicular anisotropy ferromagnetic layer or the stress inducing layer may be provided prior to step 606. Step 606 can include providing a synthetic free layer. In such an embodiment, step 606 may also include providing high spin polarization layers between the ferromagnetic layers of the free layer. If themagnetic elements step 608. In such embodiments, the free layers may have a high perpendicular anisotropy. Thus, themagnetic elements 100′, 100″, 100′″, 200, 300, 300′, 300″, 400, 500, 500′, and/or 500″ may be provided. - As discussed above, layers in a magnetic element may have a very high perpendicular anisotropy. The perpendicular anisotropy energy of such a layer is greater than the out-of-plane demagnetization energy of the layer. Therefore, the free layer as well as the pinned layer(s), which may also be termed a reference layer, may have their magnetizations perpendicular to the layers. As such a layer having a very high perpendicular anisotropy may be termed a “perpendicular” layer. A magnetic element in which all magnetic layers have a very high perpendicular anisotropy is termed hereafter a fully perpendicular magnetic element.
- It has been determined that for some fully perpendicular magnetic elements, the magnetic field generated by the perpendicular pinned layer(s) adversely affects the response of the free layer. In particular, the magnetic field from the perpendicular pinned layer(s) may shift the magnetization versus magnetic field (M-H) and/or resistance versus magnetic field (R-H) response. The perpendicular pinned layers have magnetic pole at their top and bottom interfaces. These poles can result in a net magnetic field at the free layer even when no external field is applied. In such cases, the M-H and/or R-H loop may be shifted so that the loops are not centered at a zero applied magnetic field. In such magnetic elements, the free layer magnetization may be more likely to point in the direction of magnetization of the pinned layer. In severe cases, the magnetization versus magnetic field or resistance versus magnetic field can shift so that the M-H and/or R-H loop is shifted away from zero field. For such magnetic elements, there is only one stable state for zero applied magnetic field. In such cases, the magnetic element may not be used in a memory because at least two stable states are desired at zero applied magnetic field.
-
FIG. 9 depicts one embodiment of amagnetic element 650 having very high perpendicular anisotropy magnetic layer(s) and which is switchable using spin transfer torque. For clarity,FIG. 9 is not to scale. Themagnetic element 650 may be used in a magnetic memory, such as a MRAM. Thus, themagnetic element 650 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories. Moreover, themagnetic element 650 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. Themagnetic element 650 includes a first pinnedlayer 652, afirst spacer layer 654 that may be abarrier layer 654, afree layer 656, asecond barrier layer 658, and a second pinnedlayer 660. In the embodiment shown, no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used. As described below,magnetic layers magnetic element 650 is configured such that thefree layer 656 can be written using spin transfer. In a preferred embodiment, the lateral dimensions, such as the width w, of thefree layer 656 may be small. In some embodiments, the width is less than two hundred nanometers. - The pinned layers 652 and 660 are also ferromagnetic. In some embodiments the pinned
layer 652 and/or 660 is synthetic. In such an embodiment, the pinnedlayer 652 and/or 660 includes ferromagnetic layers separated by nonmagnetic layers. In some embodiments, such a pinnedlayer 652 and/or 660 is configured such that the ferromagnetic layers are aligned antiparallel. - The
free layer 656 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for thefree layer 656 when the perpendicular anisotropy of thefree layer 656 is greater than the out of plane demagnetization energy. In some embodiments, thefree layer 656 may be a synthetic layer. - One or more of the spacer layers 654 and 658 may be barrier layers. In some embodiments, both spacer layers 654 and 658 are barrier layers. In the embodiment shown, the spacer layers 654 and 658 have different resistance area products. More specifically, one
spacer layer other spacer layer layers barrier layer 658 may be at least three and not more than ten times the resistance area product of theother barrier layer 654. Alternatively, the resistance area product of a barrier layer 6584 may be at least three and not more than ten times the resistance area product of theother barrier layer 658. Consequently, there may be less cancellation of tunneling magnetoresistance (TMR) between the barrier layers. A higher total TMR ratio, and thus a higher signal, may thus be achieved - Thus, the
magnetic element 650 may also be considered to be magnetically balanced. For example, the pinnedlayers magnetizations magnetizations layers magnetizations free layer 656 due to themagnetizations layers free layer 656 may have a substantially symmetric response. Thus, asymmetries in themagnetic element 650 may result in improved performance of themagnetic element 650. -
FIG. 10 depicts another embodiment of amagnetic element 670 having a very high perpendicular anisotropy. For clarity,FIG. 10 is not to scale. Themagnetic element 670 may be used in a magnetic memory, such as a MRAM. Thus, themagnetic element 670 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories. Moreover, themagnetic element 670 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. Themagnetic element 670 includes a first pinnedlayer 672, afirst spacer layer 674 that may be abarrier layer 674, and afree layer 676. In the embodiment shown, no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used. As described below,magnetic layers magnetic element 670 is configured such that thefree layer 676 can be written using spin transfer. In a preferred embodiment, the lateral dimensions, such as the width w, of thefree layer 676 may be small. In some embodiments, the width is less than two hundred nanometers. - The
free layer 676 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for thefree layer 676 when the perpendicular anisotropy of thefree layer 676 is greater than the out of plane demagnetization energy. In some embodiments, thefree layer 676 may be a synthetic layer. - The pinned
layer 672 is also ferromagnetic in that the pinned layer has a magnetization. In some embodiments the pinnedlayer 672 is synthetic. In such an embodiment, the pinnedlayer 672 includes ferromagnetic layers separated by nonmagnetic layers. In addition, the pinnedlayer 672 may also be considered to be magnetically balanced. In the embodiment shown, the pinnedlayer 672 has two sublattices, 671 and 673 which are opposite in direction. For example, one or more rare earth transitional metal perpendicular magnetic alloys, such as CoFeGd and/or CoFeTb may be used in the pinnedlayer 672. The magnetic poles generated by the two sub-lattices are opposite in sign, and thus cancel each other. Thesublattices free layer 676. As a result, the response of thefree layer magnetization 675 may be more symmetric. Stated differently, the magnetic moment versus magnetic field and/or resistance versus magnetic field response curves may be closer to centered around zero magnetic field/currently. Thus, the response of themagnetic element 670 may be improved. -
FIG. 11 depicts another exemplary embodiment of amagnetic element 670′. For clarity,FIG. 11 is not to scale. Themagnetic element 670′ is analogous to themagnetic element 670. Consequently, analogous components are labeled similarly. Themagnetic element 670′ thus includes a pinnedlayer 672′, aspacer layer 674′ that may be a barrier layer and afree layer 676′. Thefree layer 676′ is also magnetically balanced. In the embodiment shown, thefree layer 676′ has two sublattices, 675′ and 677 which are magnetically balanced in that they are in opposite directions. For example, one or more rare earth transitional metal perpendicular magnetic alloys, such as CoFeGd and/or CoFeTb may be used in thefree layer 676′. Further, the pinnedlayer 672′ is asymmetric. Thus, themagnetic element 670′ shares the benefits of themagnetic element 670. -
FIG. 12 depicts another exemplary embodiment of amagnetic element 670″. For clarity,FIG. 12 is not to scale. Themagnetic element 670″ is analogous to themagnetic elements magnetic element 670″ thus includes a pinnedlayer 672″, aspacer layer 674″ that may be a barrier layer and afree layer 676″. Themagnetic element 670″ is a dual structure. As a result, themagnetic element 670″ also includes anadditional spacer layer 678 that may be a barrier layer and a pinnedlayer 680. The pinnedlayer 680 is magnetically balanced. For example, one or more rare earth transitional metal perpendicular magnetic alloys, such as CoFeGd and/or CoFeTb may be used in the pinnedlayer 680. In the embodiment shown, the pinnedlayer 680 has two sublattices, 679 and 681 which are magnetically balanced in that they are in opposite directions. The pinnedlayer 680 is thus analogous to the pinnedlayer 672. The pinnedlayer 672″ is magnetically balanced as previously described for the pinnedlayer 672. In addition, the net magnetizations of the pinnedlayers 672″ and 680 may be in opposite directions, as depicted inFIG. 12 . Thus, in addition to the each of the pinnedlayers 672″ and 680 being magnetically balanced internally, thelayers 672″ and 680 magnetically balance each other. Themagnetic element 670″ not only shares the benefits of themagnetic element 670, but also shares the benefits of themagnetic elements 650. In particular, the poles of the pinnedlayer 672″ and 680 tend to cancel, further reducing the biasing field on thefree layer 676″. Thus, the response of thefree layer 676″ may be more symmetric. -
FIG. 13 depicts another exemplary embodiment of amagnetic element 670′″. For clarity,FIG. 13 is not to scale. Themagnetic element 670′″ is analogous to themagnetic elements magnetic element 670′″ thus includes a pinnedlayer 672′″, aspacer layer 674′″ that may be a barrier layer and afree layer 676′″, anadditional spacer layer 678′ that may be a barrier layer, and a pinnedlayer 680′. Further, thefree layer 676′″ is magnetically balanced. In the embodiment shown, thefree layer 676′″ has two sublattices, 675′″ and 677′ which are magnetically balanced in that they are in opposite directions. For example, one or more rare earth transitional metal perpendicular magnetic alloys, such as CoFeGd and/or CoFeTb may be used in thefree layer 676′″. Themagnetic element 670′″ thus shares the benefits of themagnetic elements -
FIG. 14 depicts another embodiment of amagnetic element 700 having a very high perpendicular anisotropy. For clarity,FIG. 14 is not to scale. Themagnetic element 700 may be used in a magnetic memory, such as a MRAM. Thus, themagnetic element 700 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories. Moreover, themagnetic element 700 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. Themagnetic element 700 includes a first pinnedlayer 712, aspacer layer 714 that may be abarrier layer 714, and afree layer 716 having amagnetization 717. In the embodiment shown, no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used. As described below,magnetic layers magnetic element 700 is configured such that thefree layer 716 can be written using spin transfer. In a preferred embodiment, the lateral dimensions, such as the width w, of thefree layer 716 may be small. In some embodiments, the width is less than two hundred nanometers. - The
free layer 716 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for thefree layer 716 when the perpendicular anisotropy of thefree layer 716 is greater than the out of plane demagnetization energy. In some embodiments, thefree layer 716 may be a synthetic layer. - The pinned
layer 712 is also ferromagnetic and a perpendicular pinned layer. The pinnedlayer 712 includesferromagnetic layers nonmagnetic layers magnetic layers nonmagnetic layers layer 712 may also be considered to be magnetically balanced. Theferromagnetic layers ferromagnetic layers ferromagnetic layers magnetic moments layer layer free layer 716 from the pinnedlayer 712 is at or near zero. Thus, the response of themagnetic element 700 has improved symmetry. -
FIG. 15 depicts another exemplary embodiment of amagnetic element 700′. For clarity,FIG. 15 is not to scale. Themagnetic element 700′ is analogous to themagnetic element 700. Consequently, analogous components are labeled similarly. Themagnetic element 700′ thus includes a pinnedlayer 712′, aspacer layer 714′ that may be a barrier layer and afree layer 716′. In addition, thefree layer 716′ includesmultiple layers free layer 716′ may be a synthetic structure. Although twomagnetic layers nonmagnetic layer 720 are shown, another number (even or odd) may be used. Because the pinnedlayer 712′ is balanced, themagnetic element 700′ shares the benefits of themagnetic element 700. -
FIG. 16 depicts another exemplary embodiment of amagnetic element 700″. For clarity,FIG. 16 is not to scale. Themagnetic element 700″ is analogous to themagnetic elements magnetic element 700″ thus includes a pinnedlayer 712″, aspacer layer 714″ that may be a barrier layer and afree layer 716″. In addition, themagnetic element 700″ includes anadditional spacer layer 724 that may be a barrier layer and an additional pinnedlayer 726. The additional pinnedlayer 726 includesferromagnetic layers nonmagnetic layers magnetic layers nonmagnetic layers layer 726 is analogous to the pinnedlayer 712/712′. Thus, theferromagnetic layers ferromagnetic layer magnetizations layer layers 712″ and 726 are in opposite directions. Thus, the poles of the pinnedlayer 712″ may also magnetically balance with the pole of the pinnedlayer 726. Consequently, the magnetic field in proximity to thefree layer 716″ from each of the pinnedlayers 712″ and 726 is at or near zero. Thus, the response of themagnetic element 700″ has improved symmetry. -
FIG. 17 depicts another exemplary embodiment of amagnetic element 700′″. For clarity,FIG. 17 is not to scale. Themagnetic element 700′″ is analogous to themagnetic elements magnetic element 700′″ thus includes a pinnedlayer 712′″, aspacer layer 714′″ that may be a barrier layer, afree layer 716′″, anadditional spacer layer 724′ that may be a barrier layer, and an additional pinnedlayer 726′. Thus, theferromagnetic layers 702′″, 706′″, and 710′″ are sufficiently thin that poles (not shown) within aferromagnetic layer 702′″, 706′″, and 710′″ due to themagnetizations 701′″, 705′″, and 709′″, respectively, are magnetically balanced. Similarly, theferromagnetic layers 728′, 732′, and 736′ are sufficiently thin that poles (not shown) within aferromagnetic layer 728′, 732′, and 736′ due to themagnetizations 729′, 731′, and 735′, respectively, are magnetically balanced. In addition, the poles from onelayer 712′″ may balance the poles for the other pinnedlayer 726′. Consequently, the magnetic field in proximity to thefree layer 716′″ from each of the pinnedlayers 712′″ and 726′ is at or near zero. Thus, the response of themagnetic element 700′″ has improved symmetry. Further, thefree layer 716′″ includesmagnetic layers 718′ and 722′ separated bynonmagnetic layer 720′. Thus, thefree layer 716′″ is analogous to thefree layer 716′. Consequently, themagnetic element 700′″ may share the benefits of themagnetic elements -
FIG. 18 depicts another embodiment of amagnetic element 750 having a very high perpendicular anisotropy. For clarity,FIG. 18 is not to scale. Themagnetic element 750 may be used in a magnetic memory, such as a MRAM. Thus, themagnetic element 750 may be used in a memory cell including an isolation transistor (not shown), as well as other configurations of magnetic memories. Moreover, themagnetic element 750 preferably utilizes two terminals (not shown) near the top and bottom of the magnetic element. However, nothing prevents the use of another number of terminals, for example a third terminal near the center of the magnetic element. Themagnetic element 750 includes a pinnedlayer 762, aspacer layer 764 that may be abarrier layer 764, and afree layer 766 having amagnetization 767. In the embodiment shown, no pinning layers are used. In another embodiment, however, antiferromagnetic and/or other pinning layer(s) might be used. As described below,magnetic layers magnetic element 750 is configured such that thefree layer 766 can be written using spin transfer. In a preferred embodiment, the lateral dimensions, such as the width w, of thefree layer 766 may be small. In some embodiments, the width is less than two hundred nanometers. - The
free layer 766 is ferromagnetic and is configured to have a very high perpendicular anisotropy. As used herein, a very high perpendicular anisotropy occurs for thefree layer 766 when the perpendicular anisotropy of thefree layer 766 is greater than the out of plane demagnetization energy. In some embodiments, thefree layer 766 may be a synthetic layer. - The pinned
layer 762 is also ferromagnetic and a perpendicular pinned layer. The pinnedlayer 762 includesferromagnetic layers nonmagnetic layer 758. Although twomagnetic layers nonmagnetic layer 758 are shown, another number (even or odd) may be used. The pinnedlayer 762 may also be considered to be magnetically balanced. Theferromagnetic layers ferromagnetic layers ferromagnetic layers magnetic moments layer layer free layer 766 from the pinnedlayer 762 is at or near zero. Thus, the response of themagnetic element 750 has improved symmetry. -
FIG. 19 depicts another exemplary embodiment of amagnetic element 750′. For clarity,FIG. 19 is not to scale. Themagnetic element 750′ is analogous to themagnetic element 750. Consequently, analogous components are labeled similarly. Themagnetic element 750′ thus includes a pinnedlayer 762′, aspacer layer 764′ that may be a barrier layer and afree layer 766′. In addition, thefree layer 766′ includesmultiple layers free layer 766′ may be a synthetic structure. The pinnedlayer 762′ also includes an additionalferromagnetic layer 752 andnonmagnetic layer 754. However, theferromagnetic layer 752 is also thin such that the magnetic poles within thelayer 752 are magnetically balanced. Because the pinnedlayer 762′ is still balanced, themagnetic element 750′ shares the benefits of themagnetic element 750. -
FIG. 20 depicts another exemplary embodiment of amagnetic element 750″. For clarity,FIG. 20 is not to scale. Themagnetic element 750″ is analogous to themagnetic elements magnetic element 750″ thus includes a pinnedlayer 762″, aspacer layer 764″ that may be a barrier layer and afree layer 766″. In addition, themagnetic element 750″ includes anadditional spacer layer 774 that may be a barrier layer and an additional pinnedlayer 776. In addition, the pinnedlayer 762″ includes additionalferromagnetic layer 752′ andnonmagnetic layer 754′. The additional pinnedlayer 776 includesferromagnetic layers nonmagnetic layers layer 776 is analogous to the pinnedlayer 712/712′. Thus, theferromagnetic layers ferromagnetic layer magnetizations layer layers 712″ and 726 are in opposite directions. Thus, the poles of the pinnedlayer 762″ may also magnetically balance with the pole of the pinnedlayer 776. Consequently, the magnetic field in proximity to thefree layer 766″ from each of the pinnedlayers 762″ and 776 is at or near zero. Thus, the response of themagnetic element 700″ has improved symmetry. -
FIG. 21 depicts another exemplary embodiment of amagnetic element 750′″. For clarity,FIG. 21 is not to scale. Themagnetic element 750′″ is analogous to themagnetic elements magnetic element 750′″ thus includes a pinnedlayer 762′″, aspacer layer 764′″ that may be a barrier layer, afree layer 766′″, anadditional spacer layer 774′ that may be a barrier layer, and an additional pinnedlayer 776′. Thus, theferromagnetic layers 752′″, 756′″, and 760′″ are sufficiently thin that poles (not shown) within aferromagnetic layer 752′″, 756′″, and 760′″ due to themagnetizations 751′″, 755′″, and 789′″, respectively, are magnetically balanced. Similarly, theferromagnetic layers 778′, 782′, and 786′ are sufficiently thin that poles (not shown) within aferromagnetic layer 778′, 782′, and 786′ due to themagnetizations 779′, 781′, and 785′, respectively, are magnetically balanced. In addition, the poles from onelayer 752′″ may balance the poles for the other pinnedlayer 776′. Consequently, the magnetic field in proximity to thefree layer 766″ from each of the pinnedlayers 762″ and 776′ is at or near zero. Thus, the response of themagnetic element 750′″ has improved symmetry. Further, thefree layer 766′″ includesmagnetic layers 768′ and 772′ separated bynonmagnetic layer 770′. Thus, thefree layer 766′″ is analogous to thefree layer 716′. Consequently, themagnetic element 750′″ may share the benefits of themagnetic elements - A method and system has been disclosed for providing a magnetic element that can be written using spin transfer at a lower switching current density. Although the present invention has been described in accordance with the embodiments shown, one of ordinary skill in the art will readily recognize that there could be variations to the embodiments and those variations would be within the spirit and scope of the present invention. Accordingly, many modifications may be made by one of ordinary skill in the art without departing from the spirit and scope of the appended claims.
Claims (13)
1. A magnetic element comprising:
at least one pinned layer, each of the at least one pinned layer having a total pinned layer perpendicular magnetic anisotropy energy and a total pinned layer out-of-plane demagnetization energy, the total pinned layer perpendicular anisotropy energy being greater than the total pinned layer out-of-plane demagnetization energy, the at least one pinned layer being magnetically balanced;
at least one nonmagnetic spacer layer; and
a free layer having a total free layer perpendicular magnetic anisotropy energy and a total free layer out-of-plane demagnetization energy, the total free layer perpendicular anisotropy energy being greater than the total free layer out-of-plane demagnetization energy, the at least one nonmagnetic spacer layer residing between the at least one pinned layer and the free layer;
wherein the magnetic junction is configured such that the free layer is switchable between a plurality of stable magnetic states when a write current is passed through the magnetic junction.
2. The magnetic element of claim 1 wherein the at least one pinned layer includes a first pinned layer having a first magnetization and a second pinned layer having a second magnetization antiparallel to the first magnetization, wherein the at least one spacer layer includes a first spacer layer and a second spacer layer, the first spacer layer residing between the first pinned layer and the free layer, the second spacer layer residing between the second pinned layer and the free layer,
3. The magnetic element of claim 2 wherein the first spacer layer is a first barrier layer having a first resistance area product and the second spacer layer is a second barrier layer having a second resistance area product, the first resistance area product being different from the second resistance area product.
4. The magnetic element of claim 2 wherein the first pinned layer includes a first magnetic sublattice and a second magnetic sublattice oriented antiparallel to the first magnetic sublattice.
5. The magnetic element of claim 4 wherein the second pinned layer includes a third magnetic sublattice and a fourth magnetic sublattice oriented antiparallel to the third magnetic sublattice.
6. The magnetic element of claim 4 wherein the free layer includes a third magnetic sublattice and a fourth magnetic sublattice oriented antiparallel to the third magnetic sublattice.
7. The magnetic element of claim 2 wherein the first pinned layer includes a first plurality of ferromagnetic layers interleaved with a first plurality of nonmagnetic layers, the first plurality of ferromagnetic layers being sufficiently thin that a first magnetic field at the free layer from the first plurality of ferromagnetic layers is substantially zero.
8. The magnetic element of claim 7 wherein the first plurality of ferromagnetic layers have a first plurality of magnetizations having an alternating alignment.
9. The magnetic element of claim 7 wherein the second pinned layer includes a second plurality of ferromagnetic layers interleaved with a second plurality of nonmagnetic layers, the second plurality of ferromagnetic layers being sufficiently thin that a second magnetic field at the free layer from the second plurality of ferromagnetic layers is substantially zero.
10. The magnetic element of claim 9 wherein the first plurality of ferromagnetic layers have a first plurality of magnetizations having a first alternating alignment and wherein the second plurality of ferromagnetic layers have a second plurality of magnetizations having a second alternating alignment.
11. The magnetic element of claim 1 wherein the at least one pinned layer includes a first magnetic sublattice and a second magnetic sublattice oriented antiparallel to the first magnetic sublattice.
12. The magnetic element of claim 1 wherein the at least one pinned layer includes a plurality of ferromagnetic layers interleaved with a plurality of nonmagnetic layers, the plurality of ferromagnetic layers being sufficiently thin that a magnetic field at the free layer from the plurality of ferromagnetic layers is substantially zero.
13. A magnetic element comprising:
a first pinned layer, the first pinned layer having a total first pinned layer perpendicular magnetic anisotropy energy and a total first pinned layer out-of-plane demagnetization energy, the total pinned layer perpendicular anisotropy energy being greater than the total pinned layer out-of-plane demagnetization energy;
a first barrier layer having a first resistance area product;
a free layer having a total free layer perpendicular magnetic anisotropy energy and a total free layer out-of-plane demagnetization energy, the total free layer perpendicular anisotropy energy being greater than the total free layer out-of-plane demagnetization energy, the at least one nonmagnetic spacer layer residing between the at least one pinned layer and the free layer;
a second barrier layer having a second resistance area product different from the first resistance area product;
a second pinned layer, the second pinned layer having a total second pinned layer perpendicular magnetic anisotropy energy and a total second pinned layer out-of-plane demagnetization energy, the total second pinned layer perpendicular anisotropy energy being greater than the total second pinned layer out-of-plane demagnetization energy, the first pinned layer and the second pinned layer being magnetically balanced such that a magnetic field at the free layer from the first pinned layer and the second pinned layer is substantially zero;
wherein the magnetic junction is configured such that the free layer is switchable between a plurality of stable magnetic states when a write current is passed through the magnetic junction.
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US10/789,334 US6992359B2 (en) | 2004-02-26 | 2004-02-26 | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
US11/239,969 US7531882B2 (en) | 2004-02-26 | 2005-09-30 | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
US12/133,671 US7821088B2 (en) | 2004-02-26 | 2008-06-05 | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plan equilibrium magnetization |
US12/893,924 US20110012215A1 (en) | 2004-02-26 | 2010-09-29 | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
US12/938,988 US20110140217A1 (en) | 2004-02-26 | 2010-11-03 | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
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ID=44141968
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