KR970053287A - Wafer Fixture - Google Patents
Wafer Fixture Download PDFInfo
- Publication number
- KR970053287A KR970053287A KR1019950046094A KR19950046094A KR970053287A KR 970053287 A KR970053287 A KR 970053287A KR 1019950046094 A KR1019950046094 A KR 1019950046094A KR 19950046094 A KR19950046094 A KR 19950046094A KR 970053287 A KR970053287 A KR 970053287A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- fixing
- holding device
- fixing means
- wafer holding
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
본 발명은 웨이퍼 고정장치에 관한 것으로, 식각공정중 발생하는 에지부분의 불순물 발생의 원천적 제거에 적당한 웨이퍼 고정장치를 제공하기 위한 것이다. 이를 위한 본 발명의 웨이퍼 고정장치를 정전기를 이용하여 웨이퍼를 고정시키는 제1고정 수단부, 샤도우 클램프를 이용하여 상기 웨이퍼를 고정시키는 제2고정 수단부, 플라즈마 이온의 분산을 방지하기 위한 에지링부를 포함하여 이루어짐을 특징으로 한다.The present invention relates to a wafer holding device, to provide a wafer holding device suitable for the fundamental removal of the generation of impurities in the edge portion generated during the etching process. The wafer holding device of the present invention for this purpose, the first fixing means for fixing the wafer using static electricity, the second fixing means for fixing the wafer using a shadow clamp, the edge ring for preventing the dispersion of plasma ions It is characterized by including the.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제3도는 본 발명의 웨이퍼 고정장치를 나타낸 도면3 is a view showing a wafer holding device of the present invention.
제4도는 본 발명에 따른 웨이퍼 에지부분의 확대도.4 is an enlarged view of a wafer edge portion according to the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950046094A KR0179156B1 (en) | 1995-12-01 | 1995-12-01 | Wafer fixing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950046094A KR0179156B1 (en) | 1995-12-01 | 1995-12-01 | Wafer fixing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970053287A true KR970053287A (en) | 1997-07-31 |
KR0179156B1 KR0179156B1 (en) | 1999-04-15 |
Family
ID=19437396
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950046094A KR0179156B1 (en) | 1995-12-01 | 1995-12-01 | Wafer fixing apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0179156B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20000019096A (en) * | 1998-09-08 | 2000-04-06 | 윤종용 | Wafer guard ring of semiconductor plasma equipment |
-
1995
- 1995-12-01 KR KR1019950046094A patent/KR0179156B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0179156B1 (en) | 1999-04-15 |
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Legal Events
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20091028 Year of fee payment: 12 |
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LAPS | Lapse due to unpaid annual fee |