KR100637324B1 - Glass washing apparatus - Google Patents

Abstract

An apparatus for cleaning a substrate is provided to perform a cleaning process for removing foreign substance attached to upper and lower surfaces of a substrate by vertically transferring a brush and a deionized water injecting nozzle after a substrate is vertically fixed to have a predetermined slope. A linear transfer guide is installed at both side ends of a work table. A plurality of support pins(12) for supporting a cleaned substrate to be positioned on the front surface of the work table are arranged as a lattice type so as to be transferred back and forth, separated from each other by a regular interval. The substrate can be fixed at a predetermined slope to the work table. A cleaning part cleans the upper and lower surfaces of the substrate fixed to the work table, vertically transferring along the linear transfer guide. A drying preventing DIW(deionized water) supplying part is installed in the front and rear portions of the cleaning part, capable of transferring vertically. A control apparatus(20) controls the whole system so that the substrate can be cleaned by the cleaning part and the drying preventing DIW supplying part. At least one or more DIW supplying nozzles are installed between the support pins at regular intervals.

Description

Substrate cleaning apparatus

1 is a view for explaining the configuration of the substrate cleaning apparatus according to the present invention.

2 is a rear view of FIG. 1.

3 is a front view of FIG. 1.

4 is a plan view of FIG. 1.

5 is a side view of FIG. 1.

6 is a plan view of the up-down unit applied to FIG. 1.

7 is an enlarged view for explaining an operating state of the support pin applied to FIG.

       Cotton.

*** Explanation of symbols on main parts of drawing ***

100: cleaning substrate device

10: linear movement means

12: support pin

13: cap

14: cylinder

15: working table

16: up-down unit

18: ultrapure water supply to prevent drying

20: controller

22: roll brush

24, 38: Ultrapure water supply nozzle

28: pulley

30: timing adjusting means

32: weight

34: motor

36 power transmission means

40: substrate

55: up-down unit

60: position detection sensor

70: support pin fixing part

The present invention relates to a substrate cleaning apparatus.

More specifically, after the substrate is fixed vertically to have a predetermined inclination and the brush and the ultra-pure water spray nozzle is moved up and down, the substrate cleaning apparatus to perform a cleaning process for removing foreign matter adhered to the upper and lower surfaces of the substrate It is about.

In general, in the field of electronic devices such as liquid crystal display panels used in semiconductor devices, notebook computers, and the like, a cleaning process is performed to first remove a semiconductor substrate, which is a substrate to be processed, or sticking foreign matter adhered to a surface of a glass substrate, during the manufacturing process. The process is essential.

A typical cleaning treatment apparatus for performing the cleaning treatment process is a horizontal cleaning treatment apparatus, and the horizontal cleaning treatment apparatus includes a shower nozzle and a substrate cleaning brush at upper and lower sides with respect to a substrate moved by a conveyor. The shower nozzle sprays water up and down the substrate and operates the substrate cleaning brush to remove foreign substances from the substrate.

In the horizontal cleaning treatment apparatus as described above, since a large amount of water remains on the substrate, staining due to drying of the glass surface does not occur, and it is excellent in removing fine organic foreign substances, but the size and arrangement of the cleaning equipment are excellent. The problem is that the place must be large.

In addition, there is a problem that the manufacturing cost of the conventional horizontal treatment system is expensive.

In addition, the conventional horizontal type cleaning processing apparatus has a long moving length of the substrate, since the substrate is moved directly may cause damage, such as scratches on the upper and lower surfaces of the substrate, there is a problem of high risk of breakage.

In addition, the conventional horizontal cleaning treatment apparatus has a problem that the cleaning power is weak because the cleaning brush once cleaning.

The present invention has been made to solve the problems of the prior art as described above, the object of the present invention is to fix the substrate vertically to have a predetermined inclination and then attached to the upper and lower surfaces of the substrate while moving the brush and the ultrapure water spray nozzle up and down The present invention provides a substrate cleaning apparatus capable of performing a cleaning process for removing foreign matter.

One embodiment of the present invention proposed to solve the above technical problem, in the substrate cleaning apparatus, a linear movement guide is provided at both ends, a plurality of support pins for supporting the substrate to be cleaned on the front surface A worktable which is spaced apart from each other at a predetermined interval so as to be capable of forward driving or backward driving and arranged in a lattice shape, and wherein the substrate can be fixed with a predetermined slope; A cleaning unit for cleaning the upper and lower surfaces of the substrate fixed to the work table while moving up and down along the linear movement guide; An ultrapure water supply for drying prevention provided at the front and rear ends of the cleaning unit to move upward and downward; And a controller for controlling the entire system so that the substrate can be cleaned by the cleaning unit and the ultrapure water supply unit for preventing drying.

Referring to the substrate cleaning apparatus according to the present invention configured as described above are as follows.

In the substrate cleaning apparatus 100 according to the present invention, as shown in FIGS. 1 and 2, linear movement guides 10 are provided at both ends, and the substrate cleaning apparatus 100 supports the substrate 40 to be cleaned at the front surface. A plurality of support pins 12 are arranged in a grid shape spaced apart from each other by a predetermined interval so as to enable forward driving or backward driving, the work table 15 to allow the substrate 40 is fixed with a predetermined inclination, and The cleaning unit for cleaning the upper and lower surfaces of the substrate 40 fixed to the work table 15 while moving up and down along the linear movement guide 10, and is provided to enable vertical movement before and after the cleaning unit. It is composed of a control device 20 for controlling the entire system so that the substrate can be cleaned by the drying prevention ultrapure water supply unit 18, the cleaning unit and the drying prevention ultrapure water supply unit 18.

The inclination angle of the workbench 15 is 84 degrees to 86 degrees, and when the inclination angle is 90 degrees, the substrate 40 may be separated from the workbench 15. 40) Inconvenient when transporting

The substrate cleaning apparatus 100 further includes one or at least two ultrapure water supply nozzles 11 at regular intervals between the support pins 12, thereby improving cleaning power of the substrate.

The cleaning unit includes an up-down unit 55 in which a roll brush 22 and a plurality of ultrapure water supply nozzles 24 and 38 are provided up and down about the roll brush 22, and a lower end of the work table 15. A pulley 28 fixed to and coupled to a frame to allow the up and down unit 55 to move up and down, a timing adjusting means 30 having one end coupled to the pulley 28, and the up and down unit 55; Weight 32 for minimizing the load weight of the up-down unit 55 by adjusting the tension of the connected wire, and is located in line with the pulley 28, the vertical movement from the highest point to the lowest point of the substrate 40 It is provided with a drive shaft that can be rotated in the forward or reverse direction by the drive current supplied from the outside, one end is connected to the drive shaft, the other end is connected to the pulley 28 is the motor 34 Change the direction of rotation Turn on depending on the rotation speed of the motor 34 consists of a power transmission means 36 to the pulley 28 is rotated.

The timing adjusting means 30 is made of a belt or a chain.

The roll brush 22 is provided with a separate drive motor, the roll brush 22 is in direct contact with the upper and lower surfaces of the substrate 40 is attached to the upper and lower surfaces of the substrate 40 to the rotational force and physical frictional force of the brush Remove foreign objects and residues. The roll brush 22 is manufactured in the form of a fine hair shaft, and the roll brush 22 is made in the form of Φ 0.1 mm hair of Φ 65 mm shaft made of nylon 612, and rotates at 300 RPM to clean the substrate 40.

The drying prevention ultrapure water supply unit 18 is provided with a position sensor 60, characterized in that for transmitting the position information detected by the position sensor 60 to the control device 20, the control The device 20 drives the support pin 12 backward using the position information input from the position sensor 60 to allow the cleaner to pass therethrough and, if the cleaner passes, the support. The pin 12 is controlled to be driven forward to support the substrate.

As shown in FIG. 7, the support pin 12 is fixed to a support pin fixing part 70, and a cylinder 14 driven forward or backward by a support pin driving motor (not shown). ) And a cap 13 which is provided in duplicate so that the cylinder 14 is not affected by the cleaning chemicals.

The support pin 12 is a high heat and acid resistant material that is strong in chemicals and the like at the time of cleaning and has a soft end thereof so as not to affect the substrate 40 when supporting the substrate 40.

The control device 20 is configured to move the up-down unit 55 of the cleaning unit from the upper side to the lower side to finish the cleaning process up to the lower portion of the substrate 40 while the up-down unit 55 moves from the lower side to the upper side. The roll brush 22 and the ultrapure water injection nozzles 11, 24, 38 are controlled to operate.

The lower end of the substrate cleaning apparatus 100 configured as described above is provided with a wheel as shown in Figure 3, the wheel is pushed by a slight force to the substrate cleaning device 100 to move easily to the desired place To be able.

Referring to the operation of the substrate cleaning apparatus configured as described above is as follows.

First, when the operator moves the substrate 40 to be cleaned to the work table 15, the board 40 is supported by the support pin 12 in an inclined angle and placed on the work table 15.

When the work preparation is set as described above, the operator causes the work start command to be input to the control device 20. At this time, the job start command is made by a start button or the like connected to the control device.

When the operation start command is input to the control device 20 as described above, the control device 20 causes the motor connected to the support pin 12 to be driven so that the support pin 12 can be driven forward or backward. The motor 34 is driven so that the up-down unit 55 of the government can be up-down.

The ultrapure water supply nozzles 24 and 38 and the ultrapure water supply for preventing drying 18 are driven to supply ultrapure water to upper and lower portions of the substrate 40.

When the initial setting is completed as described above, the control device 20 rotates the motor 34 so that the up-down unit 55 can be moved downward. Then, the rotational force of the motor 34 is transmitted to the pulley 28 by the power transmission means 36, and the pulley 28 drives the timing adjusting means 30 in response to the rotational force of the motor 34 to up-down the unit 55. ) Moves downward. At this time, the ultrapure water supply nozzle 24 and the ultrapure water supply nozzle 38 of the drying prevention ultrapure water supply unit 18 are driven to supply ultrapure water to the upper and lower portions of the substrate 40.

At the same time as the operation command as described above, the control device 20 grasps the current position of the up-down unit 55 moving downward in response to the position detection signal input from the position detection sensor 60, and shingles in the corresponding area. The support pin 12 is driven backward so that the up-down unit 55 is driven downward without difficulty.

After the up-down unit 55 moves the corresponding area, the control device 20 drives the support pin 12 to move forward so that the substrate 40 is supported by the support pin 12.

After the up-down unit 55 is primarily cleaned from the upper side to the lower side as described above, the controller 20 reversely rotates the motor 34 so that the up-down unit 55 moves downward. The cleaning operation as described above is repeatedly performed while moving upward.

The present invention is not limited to the above embodiments, and various modifications and changes can be made by those skilled in the art, which are included in the spirit and scope of the present invention included in the appended claims.

According to the present invention having the above-described configuration, operation, and preferred embodiments, the substrate is fixed vertically to have a predetermined inclination, and thereafter, a cleaning process for removing foreign substances adhering to the upper and lower surfaces of the substrate while the brush and the ultrapure water spray nozzle moves up and down. There is an effect to make this happen.

In addition, since the present invention has a large amount of material to be removed such as resin on the surface of the substrate, the substrate surface is fixed by moving the brush from the top to the bottom while the substrate is fixed vertically so that the residue flows down after cleaning. This has the effect that no residue remains.

In addition, the present invention has the effect of increasing the cleaning efficiency of the glass surface because the brush is cleaned again while moving from the bottom to the top.

In addition, since the present invention cleans the substrates individually, but cleans them after placing the substrates vertically, the size of the equipment and the location of the equipment may be narrow, thereby reducing the manufacturing cost and the installation cost. .

Claims (7)

In the substrate cleaning apparatus, Linear movement guides are provided at both ends, and a plurality of support pins for supporting the substrate to be cleaned on the front surface thereof are arranged in a grid shape spaced apart at regular intervals so as to enable forward driving or backward driving. A worktable having an inclination to be fixed; A cleaning unit for cleaning the upper and lower surfaces of the substrate fixed to the work table while moving up and down along the linear movement guide; An ultrapure water supply for drying prevention provided at the front and rear ends of the cleaning unit to move upward and downward; And A control device for controlling the entire system so that the substrate can be cleaned by the cleaning part and the ultrapure water supply for preventing drying; Substrate cleaning apparatus comprising a. The method of claim 1, wherein the substrate cleaning apparatus, Substrate cleaning device, characterized in that one or at least two ultrapure water supply nozzles are provided between the support pins at a predetermined interval. According to claim 1, wherein the inclination of the work table, Substrate cleaning apparatus, characterized in that 84 degrees to 86 degrees. The method of claim 1, wherein the cleaning unit, An up-down unit having a roll brush and a plurality of ultrapure water supply nozzles provided up and down around the roll brush; A pulley fixed to and coupled to a lower frame of the work table to allow the up-down unit to move up and down; Timing adjusting means having one end coupled to the pulley; A weight for adjusting the tension of the wire connected to the up-down unit to minimize the weight of the up-down unit; A motor positioned in line with the pulley and provided with a driving shaft capable of moving up and down from the highest point to the lowest point of the substrate, and rotating in a forward or reverse direction by a driving current supplied from the outside; One end is connected to the drive shaft, the other end is connected to the pulley is configured to change the rotational direction of the motor by the power transmission means for rotating the pulley in accordance with the rotational speed of the motor. According to claim 1, wherein the ultra-pure water supply for drying prevention, It is provided with a position sensor, characterized in that for transmitting the position information detected by the position sensor to the control device, The control device, By driving the support pin backward by using the position information input from the position detection sensor to allow the cleaning unit to pass, and if the cleaning unit passes through the control to drive the support pin forward to support the substrate The substrate cleaning apparatus characterized by the above-mentioned. The method of claim 1, wherein the control device, A substrate characterized in that the roll brush and the ultrapure water spray nozzle are operated while the up-down unit is moved from the upper side to the lower side to finish the cleaning process from the lower side to the lower side of the substrate. Cleaning device. The method of claim 1, wherein the support pin, Substrate cleaning device, characterized in that made of thermoplastics, high thermal conductivity and acid resistant material.

Images