JPS6061999A - Thin film shift register circuit - Google Patents

Thin film shift register circuit

Info

Publication number
JPS6061999A
JPS6061999A JP58170652A JP17065283A JPS6061999A JP S6061999 A JPS6061999 A JP S6061999A JP 58170652 A JP58170652 A JP 58170652A JP 17065283 A JP17065283 A JP 17065283A JP S6061999 A JPS6061999 A JP S6061999A
Authority
JP
Japan
Prior art keywords
thin film
shift register
malfunction
capacitor
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58170652A
Other languages
Japanese (ja)
Other versions
JPH067440B2 (en
Inventor
Kazumasa Hasegawa
和正 長谷川
Toshiyuki Misawa
利之 三澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP58170652A priority Critical patent/JPH067440B2/en
Publication of JPS6061999A publication Critical patent/JPS6061999A/en
Publication of JPH067440B2 publication Critical patent/JPH067440B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/28Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements

Landscapes

  • Shift Register Type Memory (AREA)

Abstract

PURPOSE:To avoid the malfunction of a thin film shift register and to improve the performance of said register by adding especially a malfunction preventing capacity with use of an insulated thin film such as an inter-layer insulated film, etc. of a thin film transistor as a dielectric matter. CONSTITUTION:A thin film transistor constituting a shift register contains an insulated substrate 401, a channel part 402, a gate oxide film 403, a gate electrode 404, an inter-layer insulated film 405 and a power supply line 406. A malfunction preventing capacity is provided with the electrode 404, the film 405 and the line 406. Plural units of such malfunction preventing capacities are set in parallel to each other, and only the capacity having a short circuit trouble is cut off. This improves the performance and the yield of an active matrix substrate incorporating peripheral drive circuits.

Description

【発明の詳細な説明】 本発明は薄膜シフトレジスタ回路、特に周辺駆動回路内
蔵型アクティブマトリクス基板における薄膜シフトレジ
スタ回路に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film shift register circuit, and particularly to a thin film shift register circuit in an active matrix substrate with a built-in peripheral drive circuit.

現在アクティブマトリクス基板としては、単結晶シリコ
ン基板上に設けたゲート線、データ線、該ゲート線と該
データ線の交点に設けたMOS)ツンジスタ及びMOS
)ヲンジスタによる周辺駆動回路によるもの、もしくは
、絶縁基板上に設け1− たゲート線、データ線及び該ゲート線と該データ線の交
点に設けた薄膜トランジスタによるものが、活発に製作
・試作されている。
Currently, active matrix substrates include gate lines, data lines, MOS (MOS) provided at the intersections of the gate lines and the data lines, and MOS transistors (MOS) provided on a single crystal silicon substrate.
) Those using peripheral drive circuits based on transistors, or those using gate lines and data lines provided on an insulating substrate, and thin film transistors provided at the intersections of the gate lines and the data lines, are being actively manufactured and prototyped. .

ところで、絶縁基板上に設けた薄膜トランジスタによる
アクティブマトリクス基板において、該アクティブマト
リクス基板を用いたアクティブマトリクス型液晶表示装
置の小型化、高性能化、低コスト化のため、該アクティ
ブマトリクス基板への薄膜トランジスタによる周辺駆動
回路内蔵が要求されている。
By the way, in an active matrix substrate using thin film transistors provided on an insulating substrate, in order to reduce the size, performance, and cost of an active matrix type liquid crystal display device using the active matrix substrate, it is necessary to use thin film transistors on the active matrix substrate. Built-in peripheral drive circuits are required.

従来の単結晶シリコン基板上に設けたMOS3)ヲンジ
スタによるシフトレジスタにおいては、ソースもしくは
ドレイン部と基板との接合容量が存在し、配線容量も容
易に付加されるため、特に誤動作防止用容量を設ける必
要はなかった。第1図にその例を示す。同図KThいて
、100及び101はクロック線で、互いに逆相のクロ
ック信号が印加される。102はデータ入力端子、10
3は電源線、110乃至113,120乃至123゜1
30乃至133等はMOS)ヲンジスタ、112− 4.124及び134等はMOS)ヲンジスタを用いた
MOEI容量、115,125及び135等はそれぞれ
MOI3)ヲンジスタ及びMO8容量111及び114
,121及び124,131及び134等のゲート、1
16,126,136等はシフトレジスタの出力端子で
、同図は単チャネルダイナミック型シフトレジスタの例
である。第2図は各部の電圧波形の例である。200及
び2゜1はそれぞれクロック線100及び】01に印加
するクロック信号、202はデータ入力端子102に印
加するデータ信号、203はMOS)ヲンジスタ111
及びMO8容量114のゲート115で観測される信号
波形、204はシフトレジスタ出力端子116で観測さ
れる信号波形、2o5はMOS)ヲンジスタ121及び
MO日容量124のゲート125で観測される信号波形
、206はシフトレジスタ出力端子126で観測される
信号波形、207はMOS)ヲンジスタ131及びMO
8容量134のゲート135で観測される信号波形であ
る。同図はPチャネルダイナミックシー3− フトレジスタを駆動している例である。第1図において
、MOS)ヲンジスタ110乃至】13及びMOB容量
114で、シフトレジスタ1ビツトが形成されている。
In a conventional shift register using a MOS3) register formed on a single crystal silicon substrate, there is a junction capacitance between the source or drain part and the substrate, and wiring capacitance is also easily added, so a capacitor for preventing malfunction is especially provided. There was no need. An example is shown in FIG. In KTh in the figure, 100 and 101 are clock lines to which clock signals having opposite phases are applied. 102 is a data input terminal, 10
3 is the power line, 110 to 113, 120 to 123゜1
30 to 133 etc. are MOS transistors, 112-4.124 and 134 are MOEI capacitors using MOS transistors, 115, 125 and 135 are MOI 3) transistors and MO8 capacitors 111 and 114, respectively.
, 121 and 124, 131 and 134 etc. gates, 1
16, 126, 136, etc. are output terminals of the shift register, and the figure shows an example of a single channel dynamic type shift register. FIG. 2 shows examples of voltage waveforms at various parts. 200 and 2゜1 are clock signals applied to the clock lines 100 and 01 respectively, 202 is a data signal applied to the data input terminal 102, and 203 is a MOS register 111.
and the signal waveform observed at the gate 115 of the MO8 capacitor 114, 204 is the signal waveform observed at the shift register output terminal 116, 2o5 is the signal waveform observed at the gate 125 of the MOS transistor 121 and the MO8 capacitor 124, 206 is the signal waveform observed at the shift register output terminal 126, 207 is the MOS) register 131 and MO
8 is a signal waveform observed at the gate 135 of the capacitor 134. The figure shows an example of driving a P-channel dynamic shift register. In FIG. 1, MOS registers 110 to 13 and MOB capacitor 114 form one bit of shift register.

ここで、MOEI)、ヲンジスタ111等とMO8容量
114等の共通ゲート115等に配線容量が付加されず
、131,114等のソースもしくはドレイン部と基板
との接合容量がない状況を考える。MOS)ヲンジスタ
1」1及びMOI3容量114には、ソースもしくはド
レイン部とゲート部との重なり容量が存在するが、第2
図で時刻t4における動作を考えると、クロック線10
0の電位はローからハイに立ち上が)、M08トヲンジ
スタ110は非導通となる。また、クロック線101の
電位はローとなり、115の電位は該重な力容量のため
、ローの電位まで下降する。すると、MOS)ヲンジス
タ111が導通し、出力端子116の電位が下降し、ま
たMOSトヲンジスタ120は導通しているため、MO
Bトヲンジスタ121及びMOEI容量124の共通ゲ
ート125の電位が下降する。従ってt4乃至4− 1sの期間に出力端子116の電位はローとなる。
Here, consider a situation where no wiring capacitance is added to the common gate 115, etc. of the MOEI), the transistor 111, etc., and the MO8 capacitor 114, etc., and there is no junction capacitance between the source or drain portions such as 131, 114, etc. and the substrate. In the MOS transistor 1 and the MOI3 capacitor 114, there is an overlap capacitance between the source or drain part and the gate part, but the second
Considering the operation at time t4 in the figure, the clock line 10
0 rises from low to high), and the M08 transistor 110 becomes non-conductive. Further, the potential of the clock line 101 becomes low, and the potential of the clock line 115 drops to a low potential due to the heavy force capacity. Then, since the MOS transistor 111 becomes conductive and the potential of the output terminal 116 decreases, and the MOS transistor 120 is conductive, the MOS transistor 111 becomes conductive.
The potential of the common gate 125 of the B transistor 121 and the MOEI capacitor 124 falls. Therefore, the potential of the output terminal 116 becomes low during the period from t4 to 4-1s.

そしてtb乃至t6等の期間には出力端子126と、M
O0日トランジスタ13及びMO日容量134の共通ゲ
ート135の電位が下降する。以上のようなメカニズム
で第1図シフトレジスタハ誤動作してしまうが、実際は
MO+3)ヲンジスタ及びMO!3容量の共通ゲー)1
15,125,135等と電源(電源線103に供給す
る電位の)間に配線容量が付加し、MOS)、ヲンジス
タ及びMO日容量のソースもしくはドレイン部と電源間
に接合容量が存在するため、t4乃至1sの期間等KM
O8)ヲンジスタ及びMOEI容量の共通ゲート115
等の電位降下を抑える。115等の電位降下分をVd 
、クロックの電圧振幅をV、115と111及び1】4
等との重な〕容量をC17,111及び114等のソー
スもしくはドレイン部と電源間との接合容量及び、11
5と電源間に付加される配線容量の和を08とすると、
115等の電位降下分vdはVd =Cg、 V/(C
g + CB )で表われる。
During periods from tb to t6, the output terminal 126 and M
The potential of the common gate 135 of the O0 day transistor 13 and the MO day capacitor 134 decreases. The above mechanism causes the shift register in Figure 1 to malfunction, but in reality, the MO+3 register and the MO! 3 capacity common game) 1
Wiring capacitance is added between 15, 125, 135, etc. and the power supply (of the potential supplied to the power supply line 103), and junction capacitance exists between the source or drain part of the MOS), transistor, and MO capacitance and the power supply. KM such as the period from t4 to 1s
O8) Common gate 115 for register and MOEI capacitor
etc. suppresses the potential drop. The potential drop of 115 etc. is Vd
, the voltage amplitude of the clock is V, 115 and 111 and 1]4
etc.) and the junction capacitance between the source or drain part of C17, 111, 114, etc. and the power supply, and 11
If the sum of the wiring capacitance added between 5 and the power supply is 08, then
The potential drop vd of 115 etc. is Vd = Cg, V/(C
g + CB).

よって前述の如き誤動作は起こらない。従って、5− 従来のMOS)ヲンジスタによるシフトレジスタにおい
ては、pn接合領域及び配線領域が誤動作防止用容量の
役割を果たしているため、特別に容量を設ける必要はな
かっfc、ところが、薄膜集積回路においては一般的に
、基板が絶縁されていて、P?L接合領域による容量が
なく、配線領域に容量が付加されない。
Therefore, the above-mentioned malfunction does not occur. Therefore, in a shift register using a conventional MOS register, there is no need to provide a special capacitor, since the pn junction region and wiring region play the role of a capacitor for preventing malfunctions.However, in a thin film integrated circuit, Generally, the board is insulated and P? There is no capacitance due to the L junction region, and no capacitance is added to the wiring region.

本発明の目的は、薄膜シフトレジスタ回路に容量を設け
、該容量によル、薄膜シフトレジスタの誤動作を防止し
、高性能化を図り、該高性能薄膜シフトレジスタ回路を
、従来の薄膜トヲンジスメによるアクティブマトリクス
基板へ内蔵することにある。
An object of the present invention is to provide a thin film shift register circuit with a capacitor, use the capacitor to prevent malfunction of the thin film shift register, and improve the performance of the thin film shift register circuit. It is built into an active matrix substrate.

本発明の要旨は、眉間絶縁膜等の絶縁薄膜を誘電体とし
て用い、誤動作防止用容量を特別に設けた点にある。
The gist of the present invention is that an insulating thin film such as an insulating film between the eyebrows is used as a dielectric, and a capacitor for preventing malfunction is specially provided.

以下、実施例に基づいて本発明の詳細な説明する。Hereinafter, the present invention will be described in detail based on Examples.

第3図及び第4図は本発明の実施例である。第3図にお
いて、300及び301はクロック線で、6− 互いに逆相のクロック信号が印加される。302はデー
タ入力端子、303は電源線、31o乃至313.32
0乃至323,330乃至333等は薄膜トランジスタ
、314,324及び334等は薄膜トランジスタを用
いたMOE+容量、315.325,335等は薄膜ト
ランジスタ及びMO8容量311及び334等の共通ゲ
ート、316.326及び336等はシフトレジスタの
出力端子、317,327及び337等は絶縁薄膜を利
用して設けた誤動作防止用容量、318,328及び3
38等は電源線303に供給される電位の電源であり、
薄膜トランジスタ310乃至313、MO8容量314
.及び誤動作防止用容量317とで、シフトレジスタ1
ビツトが形成されている。第3図シフトレジスタの動作
例は第1図のものと同じく、第2図の通pである。
3 and 4 are examples of the present invention. In FIG. 3, reference numerals 300 and 301 are clock lines to which clock signals having opposite phases are applied. 302 is a data input terminal, 303 is a power line, 31o to 313.32
0 to 323, 330 to 333 etc. are thin film transistors, 314, 324 and 334 etc. are MOE+ capacitors using thin film transistors, 315.325, 335 etc. are common gates of thin film transistors and MO8 capacitors 311 and 334 etc., 316.326 and 336 etc. is the output terminal of the shift register, 317, 327, 337, etc. are capacitors for preventing malfunction provided using insulating thin films, 318, 328, 3
38 etc. is a power source with a potential supplied to the power line 303;
Thin film transistors 310 to 313, MO8 capacitor 314
.. and the malfunction prevention capacitor 317, the shift register 1
A bit is formed. The operation example of the shift register in FIG. 3 is the same as that in FIG. 1, and is as shown in FIG.

第4図は本発明の構造の一例であり、薄膜トランジスタ
311等多チャネル部を、チャネル幅方向に切断した時
の断簡図である。401は絶縁基板、402はチャネル
幅方向に切断された薄膜ト7− ヲンジスタのチャネル部、403はゲート酸化膜、40
4はゲート電極、405は層間絶縁膜、406は電源線
である。ゲート電極4042層間絶縁膜405.電源線
406とにより、誤動作防止用容量が形成されている。
FIG. 4 is an example of the structure of the present invention, and is a simplified diagram when a multi-channel portion such as a thin film transistor 311 is cut in the channel width direction. 401 is an insulating substrate; 402 is a thin film transistor cut in the channel width direction; 403 is a gate oxide film;
4 is a gate electrode, 405 is an interlayer insulating film, and 406 is a power supply line. Gate electrode 4042 interlayer insulating film 405. A malfunction prevention capacitor is formed by the power supply line 406.

第5図は本発明のもう一つの実施例である。第3図と同
一の記号は第3図と同一のものを表わす。
FIG. 5 shows another embodiment of the invention. The same symbols as in FIG. 3 represent the same things as in FIG.

510.512,520,522,530,532等は
絶縁薄膜を利用して設けた誤動作防止用容量、511.
513,521,523,531 。
510. 512, 520, 522, 530, 532, etc. are capacitors for preventing malfunction provided using insulating thin films; 511.
513,521,523,531.

533等は電源線303に供給される電位の電源である
。第5図において、薄膜トランジスタ310乃至313
.MO8容量314.誤動作防止用容1510及び51
2とで、シフトレジスタ1ビツトが形成されている。薄
膜シフトレジスタ回路において、欠陥が最も生じやすい
のが誤動作防止用容量部で、これはゴミ等により絶縁薄
膜部で上下短絡が起こるためである。そこで該唄動作防
止用容量を並列に複数個設け、短絡が起こった容量のみ
切や離せるようにすればよく、歩留りも向上8− する。そのため第5図では誤動作防止用容量を1ビツト
中に2個並列に設けて−る。第5図シフトレジスタの動
作例も同様に第2図の通りである。
533 and the like are potential power sources supplied to the power line 303. In FIG. 5, thin film transistors 310 to 313
.. MO8 capacity 314. Malfunction prevention containers 1510 and 51
2 forms a 1-bit shift register. In thin-film shift register circuits, defects are most likely to occur in the malfunction prevention capacitor section, because short circuits occur in the insulating thin film section due to dust or the like. Therefore, it is sufficient to provide a plurality of capacitors for preventing singing operation in parallel so that only the capacitor in which a short circuit occurs can be disconnected or separated, and the yield can also be improved. Therefore, in FIG. 5, two malfunction prevention capacitors are provided in parallel in one bit. The operation example of the shift register shown in FIG. 5 is also as shown in FIG. 2.

以上述べた如く、本発明を用りることによ)、誤動作の
ない、高性能の薄膜シフトレジスタが実現され、高性能
かつ高歩留りの周辺駆動回路内蔵型アクティブマトリク
ス基板が実現される。
As described above, by using the present invention, a high-performance thin film shift register without malfunction can be realized, and a high-performance, high-yield active matrix substrate with a built-in peripheral drive circuit can be realized.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、単結晶シリコン基板上に設けたMOSトヲン
ジスタによる、従来のシフトレジスタ回路の例を説明す
るための図。 第2図は、第1図シフトレジスタ各部の印加波形を示し
た図。 第3図及び第4図は本発明の詳細な説明するための図。 第5図は本発明のもう一つの実施例を説明する出願人 
株式会社諏訪精工舎 代理人 弁理士最 上 務 9−
FIG. 1 is a diagram for explaining an example of a conventional shift register circuit using a MOS transistor provided on a single crystal silicon substrate. FIG. 2 is a diagram showing applied waveforms to each part of the shift register in FIG. 1. FIG. 3 and FIG. 4 are diagrams for explaining the present invention in detail. FIG. 5 shows the applicant illustrating another embodiment of the present invention.
Suwa Seikosha Co., Ltd. Agent Patent Attorney Tsutomu Mogami 9-

Claims (1)

【特許請求の範囲】[Claims] 絶縁基板上もしくは絶縁薄膜上に設けた薄膜トランジス
タにより成る薄膜シフトレジスタ回路において、層間絶
縁膜等の絶縁薄膜を利用し、誤動作防止用容量を設けた
ことを特徴とする薄膜シフトレジスタ回路。
A thin film shift register circuit comprising thin film transistors provided on an insulating substrate or an insulating thin film, characterized in that the thin film shift register circuit uses an insulating thin film such as an interlayer insulating film and is provided with a capacitor for preventing malfunction.
JP58170652A 1983-09-16 1983-09-16 Thin film shift register circuit Expired - Lifetime JPH067440B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58170652A JPH067440B2 (en) 1983-09-16 1983-09-16 Thin film shift register circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58170652A JPH067440B2 (en) 1983-09-16 1983-09-16 Thin film shift register circuit

Publications (2)

Publication Number Publication Date
JPS6061999A true JPS6061999A (en) 1985-04-09
JPH067440B2 JPH067440B2 (en) 1994-01-26

Family

ID=15908846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58170652A Expired - Lifetime JPH067440B2 (en) 1983-09-16 1983-09-16 Thin film shift register circuit

Country Status (1)

Country Link
JP (1) JPH067440B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012022316A (en) * 2001-05-29 2012-02-02 Semiconductor Energy Lab Co Ltd Gate driver
JP2020197668A (en) * 2019-06-05 2020-12-10 セイコーエプソン株式会社 Electro-optical device and electronic apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2010215821B2 (en) 2009-02-20 2015-09-10 Covidien Lp Methods and devices for venous occlusion for the treatment of venous insufficiency

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012022316A (en) * 2001-05-29 2012-02-02 Semiconductor Energy Lab Co Ltd Gate driver
US9024930B2 (en) 2001-05-29 2015-05-05 Semiconductor Energy Laboratory Co., Ltd. Pulse output circuit, shift register, and display device
US9590632B2 (en) 2001-05-29 2017-03-07 Semiconductor Energy Laboratory Co., Ltd. Pulse output circuit, shift register, and display device
US10304399B2 (en) 2001-05-29 2019-05-28 Semiconductor Energy Laboratory Co., Ltd. Pulse output circuit, shift register, and display device
JP2020197668A (en) * 2019-06-05 2020-12-10 セイコーエプソン株式会社 Electro-optical device and electronic apparatus
US11398509B2 (en) 2019-06-05 2022-07-26 Seiko Epson Corporation Electro-optical device and electronic apparatus

Also Published As

Publication number Publication date
JPH067440B2 (en) 1994-01-26

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