JPH06258662A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JPH06258662A
JPH06258662A JP4145893A JP4145893A JPH06258662A JP H06258662 A JPH06258662 A JP H06258662A JP 4145893 A JP4145893 A JP 4145893A JP 4145893 A JP4145893 A JP 4145893A JP H06258662 A JPH06258662 A JP H06258662A
Authority
JP
Japan
Prior art keywords
liquid crystal
insulating film
interlayer insulating
driver circuit
element substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4145893A
Other languages
Japanese (ja)
Other versions
JP3413230B2 (en
Inventor
Hideyuki Akanuma
英幸 赤沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP04145893A priority Critical patent/JP3413230B2/en
Publication of JPH06258662A publication Critical patent/JPH06258662A/en
Application granted granted Critical
Publication of JP3413230B2 publication Critical patent/JP3413230B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To increase an opening rate and to flatten element substrates so as to obtain high-quality display free from disturbance in a liquid crystal by separating signal lines and pixel electrodes with an interlayer insulating film. CONSTITUTION:A pixel driving transistor(TR) 301 and a driver circuit 303 are formed on the element substrate 301. A first wiring layer 304 including scanning lines, the pixel driving TR 302 and a gate electrode of the driver circuit 303, the first interlayer insulating film 305 and a second wiring layer 306 including the signal lines are formed at this time. The second interlayer insulating film 307 and a pixel electrode 308 are then formed and are connected to the pixel driving TR 302 through a contact hole opened in the second interlayer insulating film 307. Further, an oriented film 309 is formed. A transparent resin thin film having a high heat resistance is usable in addition to a polyimide thin film for the second interlayer insulating film 307. The signal lines and the pixel electrodes are separated by the interlayer insulating film 307, according to this constitution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は2枚の基板間に封入され
た液晶を用いて表示を行う、ドライバー回路一体形成の
アクティブマトリクス型液晶表示装置の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure of an active matrix type liquid crystal display device integrally formed with a driver circuit for displaying by using liquid crystal sealed between two substrates.

【0002】[0002]

【従来の技術】従来のドライバー回路内蔵アクティブマ
トリクス型液晶表示装置(以下、単に液晶表示装置とす
る)の一例を図1を用いて説明する。図1(a)は従来
の液晶表示装置の概略の外観図であり、図1(b)は図
1(a)のA−Aにおける縦断面図、図1(c)は図1
(a)のB−B縦断面図である。素子基板101上には
表示領域102、走査線及び信号線のドライバー回路1
03及び104、外部接続端子105が形成され、対向
基板106がシール107で素子基板101に接合さ
れ、素子基板101と対向基板106の間に液晶108
が封入されている。対向基板106上には共通電極10
9が設けられ、この共通電極109は素子基板101上
のコモン端子110に導通剤111で接続されている。
また、対向基板106上には遮光層112が設けられて
いる。素子基板101の表示領域102には、画素駆動
トランジスタ113が設けられ、画素電極114が画素
駆動トランジスタ113に接続されている。画素駆動ト
ランジスタ113及びドライバー回路103(104)
のゲート電極と走査線を含む第1の配線層115は層間
絶縁膜116で第2の配線層117と隔てられ、必要な
箇所で第2の配線層117と接続されている。第2の配
線層117は表示領域の信号線を含み、画素電極114
と同層に設けられている。第2の配線層117の上層は
液晶保護絶縁膜118で第2の配線層117の信号が液
晶に直接漏れるのを防ぐために設けられる。液晶保護絶
縁膜118は画素電極114上は通常取り除いておく。
素子基板101上と対向基板106上には更に配向膜1
19がある。
2. Description of the Related Art An example of a conventional active matrix type liquid crystal display device with a built-in driver circuit (hereinafter, simply referred to as a liquid crystal display device) will be described with reference to FIG. 1A is a schematic external view of a conventional liquid crystal display device, FIG. 1B is a vertical sectional view taken along the line AA of FIG. 1A, and FIG.
It is a BB vertical cross-sectional view of (a). The driver circuit 1 for the display region 102, the scanning lines and the signal lines is provided on the element substrate 101.
03 and 104, the external connection terminal 105 is formed, the counter substrate 106 is bonded to the element substrate 101 by the seal 107, and the liquid crystal 108 is provided between the element substrate 101 and the counter substrate 106.
Is enclosed. The common electrode 10 is provided on the counter substrate 106.
9 is provided, and the common electrode 109 is connected to the common terminal 110 on the element substrate 101 by the conducting agent 111.
Further, a light shielding layer 112 is provided on the counter substrate 106. A pixel drive transistor 113 is provided in the display region 102 of the element substrate 101, and a pixel electrode 114 is connected to the pixel drive transistor 113. Pixel driving transistor 113 and driver circuit 103 (104)
The first wiring layer 115 including the gate electrode and the scanning line is separated from the second wiring layer 117 by the interlayer insulating film 116, and is connected to the second wiring layer 117 at a necessary position. The second wiring layer 117 includes a signal line in the display area, and includes the pixel electrode 114.
It is provided in the same layer as. An upper layer of the second wiring layer 117 is a liquid crystal protective insulating film 118, which is provided to prevent signals of the second wiring layer 117 from directly leaking to the liquid crystal. The liquid crystal protective insulating film 118 is usually removed on the pixel electrode 114.
An alignment film 1 is further formed on the element substrate 101 and the counter substrate 106.
There is 19.

【0003】図1の液晶表示装置では画素電極114と
信号線(第2の配線層117)が同層にあり、短絡を避
けるため有る程度の間隔を確保する必要があり、その間
隔の部分は表示に寄与しない。これは液晶表示装置の高
開口率化や高精細化の妨げとなる。この問題を解決する
ため、信号線上に更に層間絶縁膜を設け、この上層に画
素電極を設ける事で画素電極と信号線の短絡を避けつつ
画素電極と信号線の距離を小さくする、あるいは信号線
と画素電極を重ねるといった方法がとられる場合があ
る。上記の信号線上の層間絶縁膜はSiO2あるいはポ
リイミド等の有機薄膜が用いられる。信号線上の層間絶
縁膜は、その形成方法の簡便さ、誘電率の小ささ(信号
線と画素電極の結合容量を小さくするため)、ストレス
が小さい事による厚膜化の容易さ(誘電率と同じ理由に
よる)、さらには膜表面の平坦性をSiO2よりも良く
しやすいので表示品質が良い等の観点からポリイミドを
用いるのが有利である。
In the liquid crystal display device shown in FIG. 1, the pixel electrode 114 and the signal line (second wiring layer 117) are in the same layer, and it is necessary to secure a certain distance to avoid a short circuit. Does not contribute to the display. This hinders the high aperture ratio and high definition of the liquid crystal display device. In order to solve this problem, an interlayer insulating film is further provided on the signal line, and a pixel electrode is provided on the upper layer to reduce the distance between the pixel electrode and the signal line while avoiding a short circuit between the pixel electrode and the signal line, or In some cases, a method of overlapping the pixel electrodes may be adopted. As the interlayer insulating film on the signal line, an organic thin film such as SiO2 or polyimide is used. The interlayer insulating film on the signal line is easy to form, has a small dielectric constant (to reduce the coupling capacitance between the signal line and the pixel electrode), and is easy to be thick due to the small stress (dielectric constant and For the same reason), and further, since the flatness of the film surface is easily made better than that of SiO2, it is advantageous to use polyimide from the viewpoint of good display quality.

【0004】[0004]

【発明が解決しようとする課題】図1に示した従来の液
晶表示装置では、ドライバー回路がシールよりも外側に
あるため装置自体が大きくなってしまい、また、取扱い
中にドライバー回路を傷つけ易く故障を招き易いという
問題があった。また、ドライバー回路がシールよりも外
側にあるため、シールを横切る配線(信号線と走査線)
が多く、特に、開口率を大きくするために信号線上に層
間絶縁膜(以後第1の配線層と第2の配線層の間の層間
絶縁膜を第1の層間絶縁膜、第2の配線層(信号線)上
の層間絶縁を第2の層間絶縁膜とする)を設け、画素電
極と信号線の絶縁を行う場合、第2の層間絶縁膜がポリ
イミドであると、ドライバー回路からの配線とポリイミ
ドの界面を通じて水分が液晶中に浸入し、表示を劣化さ
せるという問題があった。
In the conventional liquid crystal display device shown in FIG. 1, since the driver circuit is located outside the seal, the size of the device itself becomes large, and the driver circuit is easily damaged during handling. There was a problem that it was easy to invite. Also, because the driver circuit is outside the seal, the wiring that crosses the seal (signal line and scan line)
In particular, in order to increase the aperture ratio, an interlayer insulating film (hereinafter, an interlayer insulating film between the first wiring layer and the second wiring layer is referred to as the first interlayer insulating film and the second wiring layer) on the signal line. When the interlayer insulation on the (signal line) is used as the second interlayer insulation film) to insulate the pixel electrode and the signal line, if the second interlayer insulation film is polyimide, the wiring from the driver circuit and There is a problem that water penetrates into the liquid crystal through the interface of the polyimide and deteriorates the display.

【0005】[0005]

【課題を解決するための手段】本発明の液晶表示装置
は、素子基板上に形成されたドライバー回路、素子駆動
薄膜トランジスタ、信号線及び走査線を有機膜で覆い、
前記有機膜上に画素電極を設ける事で信号線と画素電極
を絶縁し、かつドライバー回路を、素子基板と対向基板
を接合するシールの直下に配置した事を特徴とする。
A liquid crystal display device of the present invention covers a driver circuit, an element driving thin film transistor, a signal line and a scanning line formed on an element substrate with an organic film,
The pixel electrode is provided on the organic film to insulate the signal line from the pixel electrode, and the driver circuit is arranged immediately below a seal for joining the element substrate and the counter substrate.

【0006】[0006]

【実施例】以下に、本発明のドライバー回路内蔵アクテ
ィブマトリクス型液晶表示装置とその製造工程について
実施例に基づき詳しく説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The active matrix type liquid crystal display device with a built-in driver circuit of the present invention and the manufacturing process thereof will be described in detail below with reference to embodiments.

【0007】図2に本実施例の液晶表示装置の構造を示
す。図2(a)は本実施例の液晶表示装置の外観図であ
り、図2(b)、図2(c)はそれぞれ図1(a)のA
−A、B−Bにおける縦断面図である。透明な素子基板
201上には表示領域202ドライバー回路203、外
部接続端子204、コモン端子205およびこれらを接
続する配線等が形成されており、シール206によって
素子基板201と対向基板207が接合され、両基板間
に液晶が封入されている。この時、ドライバー回路20
3とシール206とが重なる配置とする。表示領域20
2には画素駆動トランジスタ208、画素電極209、
走査線と画素駆動トランジスタ208及びドライバー回
路203のゲート電極を含む第1の配線層211、信号
線を含む第2の配線層212が形成され、第1の配線層
211と第2の配線層212は第1の層間絶縁膜213
で、また、第2の配線層212と画素電極210は第2
の層間絶縁膜214で絶縁されている。素子基板201
上には、さらに液晶を配向するための配向膜215が形
成されている。コモン端子205と対向基板207上の
共通電極216は導通剤217で電気的に接続され共通
電極216の電位が制御される。対向基板207上には
共通電極216の他に配向膜215と必要に応じて遮光
膜218及びカラーフィルターが予め形成されている。
(本実施例ではカラーフィルターは省略してある。)対
向基板207上の共通電極216のシール206と重な
る部分は、製造工程上は取り除かずにおくのがよいが、
取り除くことで素子基板201上のドライバー回路20
3と共通電極216がシール206中のゴミ等により短
絡することを防げるため、取り除いても良い。
FIG. 2 shows the structure of the liquid crystal display device of this embodiment. FIG. 2A is an external view of the liquid crystal display device of this embodiment, and FIGS. 2B and 2C are A of FIG. 1A.
It is a longitudinal cross-sectional view in -A, BB. A display area 202 driver circuit 203, an external connection terminal 204, a common terminal 205, and wirings connecting these are formed on the transparent element substrate 201, and the element substrate 201 and the counter substrate 207 are joined by a seal 206, Liquid crystal is enclosed between both substrates. At this time, the driver circuit 20
3 and the seal 206 overlap each other. Display area 20
2 includes a pixel driving transistor 208, a pixel electrode 209,
A first wiring layer 211 including a scan line, a pixel driving transistor 208, and a gate electrode of the driver circuit 203, and a second wiring layer 212 including a signal line are formed, and the first wiring layer 211 and the second wiring layer 212 are formed. Is the first interlayer insulating film 213
In addition, the second wiring layer 212 and the pixel electrode 210 are
Are insulated by the interlayer insulating film 214. Element substrate 201
An alignment film 215 for further aligning the liquid crystal is formed on the top. The common terminal 205 and the common electrode 216 on the counter substrate 207 are electrically connected by the conducting agent 217, and the potential of the common electrode 216 is controlled. In addition to the common electrode 216, an alignment film 215, a light-shielding film 218 and a color filter are formed in advance on the counter substrate 207, if necessary.
(In this embodiment, the color filter is omitted.) The portion of the common electrode 216 on the counter substrate 207 which overlaps with the seal 206 is preferably not removed in the manufacturing process.
By removing the driver circuit 20 on the element substrate 201
3 and the common electrode 216 may be removed in order to prevent short circuit due to dust or the like in the seal 206.

【0008】次に、本実施例の液晶表示装置の製造工程
を図3を用いて説明する。図3は本実施例の液晶表示装
置の構造を説明した図2(b)に相当する部分の縦断面
で製造工程を説明する図である。
Next, the manufacturing process of the liquid crystal display device of this embodiment will be described with reference to FIG. FIG. 3 is a diagram illustrating a manufacturing process with a vertical cross section of a portion corresponding to FIG. 2B for explaining the structure of the liquid crystal display device of the present embodiment.

【0009】まず、素子基板301上に画素駆動トラン
ジスタ302、ドライバー回路303を形成する。走査
線及び画素駆動トランジスタ302とドライバー回路3
03のゲート電極を含む第1の配線層304、第1の層
間絶縁膜305、信号線を含む第2の配線層306をこ
の時形成する(図3(a))。本実施例では画素トラン
ジスタ302とドライバー回路303は多結晶シリコン
薄膜トランジスタで構成される。第1の配線層304に
は多結晶シリコンを用いるが、金属シリサイドあるいは
金属を用いても良く、第1の層間絶縁膜305はシリコ
ン酸化膜(SiO2)かシリコン窒化膜(Si34)、
あるいはそれらの多層膜である。第2の配線層306に
は通常アルミニウム(Al)合金(銅とシリコンを含
む)を用いる。
First, the pixel driving transistor 302 and the driver circuit 303 are formed on the element substrate 301. Scanning line / pixel driving transistor 302 and driver circuit 3
A first wiring layer 304 including a gate electrode of No. 03, a first interlayer insulating film 305, and a second wiring layer 306 including a signal line are formed at this time (FIG. 3A). In this embodiment, the pixel transistor 302 and the driver circuit 303 are composed of polycrystalline silicon thin film transistors. Polycrystalline silicon is used for the first wiring layer 304, but metal silicide or metal may be used, and the first interlayer insulating film 305 is a silicon oxide film (SiO 2 ) or a silicon nitride film (Si 3 N 4 ). ,
Alternatively, it is a multilayer film of them. An aluminum (Al) alloy (including copper and silicon) is usually used for the second wiring layer 306.

【0010】次に、素子基板301上に第2の層間絶縁
膜307を形成し、その上に画素電極308を形成し、
画素駆動トランジスタ302に第2の層間絶縁膜307
に開けたコンタクト孔を通じて接続する。さらに配向膜
309を形成する(図3(b))。第2の層間絶縁膜3
07はここではポリイミド薄膜であるが、他の樹脂薄膜
でも比較的耐熱性が高く、透明であれば用いる事が出来
る。画素電極308は酸化インジウムスズ(ITO)で
ある。また配向膜309もポリイミド薄膜であり、形成
は印刷技術(フレキソ印刷等)を用いて行い、液晶を配
向するために必要な部分にのみ形成する。配向膜309
の形成はスピンコート法で行うこともある。画素電極3
08の形成時にITOのエッチングを王水系のエッチン
グ剤(少なくとも硝酸と塩酸を含む水溶液)で行う場
合、第2の配線層306(Al合金)はITOのエッチ
ング剤に触れると腐食するので、第2の配線層306上
には少なくとも第2の層間絶縁膜307かITO(画素
電極308)があるようにしておく。ITO(即ち画素
電極308)を例えば水素やメタンを含むプラズマ中で
エッチング成形する場合には第2の配線層306は露出
していてもかまわない。本実施例ではITO(画素電極
308)のエッチングは王水系のエッチング剤で行い、
第2の配線層306を露出させる必要のある部分、即ち
外部接続端子(図2(a)の204)はその上の第2の
層間絶縁膜307を後の工程であらためて除去する。外
部接続端子を露出するためには、画素電極の形成後、フ
ォトリソグラフ技術で第2の層間絶縁膜307を取り除
く方法と、素子基板301と対向基板311を接合した
後、酸素プラズマ等を用いて対向基板311よりも外側
の第2の層間絶縁膜を除去する方法がある。
Next, a second interlayer insulating film 307 is formed on the element substrate 301, and a pixel electrode 308 is formed thereon,
A second interlayer insulating film 307 is formed on the pixel driving transistor 302.
Connect through the contact hole opened in the. Further, an alignment film 309 is formed (FIG. 3B). Second interlayer insulating film 3
Although 07 is a polyimide thin film here, other resin thin films can be used as long as they have relatively high heat resistance and are transparent. The pixel electrode 308 is indium tin oxide (ITO). The alignment film 309 is also a polyimide thin film, and is formed using a printing technique (flexographic printing or the like), and is formed only in a portion necessary for aligning the liquid crystal. Alignment film 309
May be formed by spin coating. Pixel electrode 3
If ITO is etched with an aqua regia etchant (aqueous solution containing at least nitric acid and hydrochloric acid) when forming 08, the second wiring layer 306 (Al alloy) corrodes when it comes into contact with the ITO etchant. At least the second interlayer insulating film 307 or ITO (pixel electrode 308) is provided on the wiring layer 306. When the ITO (that is, the pixel electrode 308) is formed by etching in plasma containing hydrogen or methane, for example, the second wiring layer 306 may be exposed. In this embodiment, the ITO (pixel electrode 308) is etched with an aqua regia-based etching agent,
The portion where the second wiring layer 306 needs to be exposed, that is, the external connection terminal (204 in FIG. 2A), has the second interlayer insulating film 307 thereon removed again in a later step. In order to expose the external connection terminal, a method of removing the second interlayer insulating film 307 by a photolithographic technique after forming the pixel electrode and a method of joining the element substrate 301 and the counter substrate 311 and then using oxygen plasma or the like are used. There is a method of removing the second interlayer insulating film outside the counter substrate 311.

【0011】配向膜309を形成した素子基板301は
シール310で対向基板311と接合し、液晶312を
封入する。シール310はドライバー回路303上に重
なるように形成する。さらに酸素プラズマ313で第2
の配線層306上の第2の層間絶縁膜307を取り除く
ことで外部接続端子を露出し(図3(c))、外部回路
と接続して液晶表示装置を完成する。シール310の下
の第2の層間絶縁膜307は取り除かずに残すことで、
シールに含まれることのあるギャップ材からドライバー
回路を保護することが出来る。
The element substrate 301 on which the alignment film 309 is formed is bonded to the counter substrate 311 with a seal 310, and the liquid crystal 312 is sealed. The seal 310 is formed so as to overlap with the driver circuit 303. Second with oxygen plasma 313
By removing the second interlayer insulating film 307 on the wiring layer 306, the external connection terminals are exposed (FIG. 3C) and connected to an external circuit to complete the liquid crystal display device. By leaving the second interlayer insulating film 307 under the seal 310 without removing it,
The driver circuit can be protected from the gap material that may be included in the seal.

【0012】[0012]

【発明の効果】本発明の液晶表示装置では、信号線と画
素電極がポリイミドを層間絶縁膜として別層に形成され
ることで開口率が大きいうえに、素子基板表面が平坦な
ため液晶の配向の乱れが無く高品質な表示が得られる。
さらに素子基板上のドライバー回路がシールの下にある
ためドライバー回路から画素領域に延びる延べ数百本に
及ぶ信号線や走査線がシールを横切ることがなく、シー
ルを横切る配線を外部接続端子からドライバー回路につ
ながる電源線、クロック線、ビデオ信号線など高々数十
本と従来比べ格段に少なくできるので、シールを横切る
配線とポリイミドの界面から浸入する水分を格段に少な
くでき、信頼性が高い。また、ドライバー回路がシール
の下にあるのでドライバー回路がシールの外にある場合
に比べて装置を小型にできる効果もある。
In the liquid crystal display device of the present invention, since the signal line and the pixel electrode are formed in different layers using polyimide as an interlayer insulating film, the aperture ratio is large and the surface of the element substrate is flat, so that the liquid crystal is aligned. High-quality display can be obtained without disturbance.
Furthermore, since the driver circuit on the element substrate is under the seal, hundreds of signal lines and scanning lines extending from the driver circuit to the pixel area do not cross the seal, and wiring that crosses the seal is connected from the external connection terminal to the driver circuit. Power supply lines, clock lines, video signal lines, etc. connected to the can be significantly reduced compared to the conventional one, so that water entering from the interface between the wiring crossing the seal and the polyimide can be significantly reduced, and the reliability is high. Further, since the driver circuit is below the seal, there is an effect that the device can be made smaller than when the driver circuit is outside the seal.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来のドライバー回路内蔵のアクティブマトリ
クス型液晶表示装置の構造図。
FIG. 1 is a structural diagram of a conventional active matrix type liquid crystal display device with a built-in driver circuit.

【図2】本発明のドライバー回路内蔵のアクティブマト
リクス型液晶表示装置の構造図。
FIG. 2 is a structural diagram of an active matrix type liquid crystal display device incorporating a driver circuit of the present invention.

【図3】本発明のドライバー回路内蔵のアクティブマト
リクス型液晶表示装置の製造方法を説明する工程図。
FIG. 3 is a process diagram illustrating a method for manufacturing an active matrix type liquid crystal display device having a driver circuit according to the present invention.

【符号の説明】[Explanation of symbols]

101、201、301 …素子基板 102、202 …表示領域 103、104、203、303…ドライバー回路 105、204 …外部接続端子 106、207、311 …対向基板 107、206、310 …シール 108、209、312 …液晶 109、218 …共通電極 110、205 …コモン端子 111、217 …導通剤 112、216 …遮光層 113、207、302 …画素駆動トランジス
タ 114、210、308 …画素電極 115、211、304 …第1の配線層 116 …層間絶縁膜 117、212、306 …第2の配線層 118 …液晶保護絶縁膜 119、215、309 …配向膜 213、305 …第1の層間絶縁膜 214、307 …第2の層間絶縁膜 313 …酸素プラズマ
101, 201, 301 ... Element substrate 102, 202 ... Display area 103, 104, 203, 303 ... Driver circuit 105, 204 ... External connection terminal 106, 207, 311 ... Opposing substrate 107, 206, 310 ... Seal 108, 209, 312 ... Liquid crystal 109, 218 ... Common electrode 110, 205 ... Common terminal 111, 217 ... Conducting agent 112, 216 ... Shading layer 113, 207, 302 ... Pixel driving transistor 114, 210, 308 ... Pixel electrode 115, 211, 304 ... First wiring layer 116 ... Interlayer insulating film 117, 212, 306 ... Second wiring layer 118 ... Liquid crystal protective insulating film 119, 215, 309 ... Alignment film 213, 305 ... First interlayer insulating film 214, 307 ... Second interlayer insulating film 313 ... Oxygen plasma

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】マトリクス状に配置された画素電極、前記
画素電極のそれぞれに接続された画素駆動薄膜トランジ
スタ、前記画素駆動薄膜トランジスタに接続された一組
の信号配線と一組の走査配線、さらに前記信号配線及び
走査配線をそれぞれ駆動するドライバー回路を有する素
子基板と、共通電極を有し前記素子基板に対向する対向
基板と、前記素子基板と前記対向基板の間に封止した液
晶からなるアクティブマトリクス型液晶表示装置におい
て、前記素子基板上の画素駆動用薄膜トランジスタ、前
記信号配線、前記走査配線上及び前記ドライバー回路上
に有機膜が有り、前記有機膜上に前記画素電極が有り、
かつ前記素子基板上の前記ドライバー回路が前記素子基
板と前記対向基板を接合すると同時に液晶を封止するシ
ール部の下にあることを特徴とする液晶表示装置。
1. A pixel electrode arranged in a matrix, a pixel driving thin film transistor connected to each of the pixel electrodes, a set of signal wirings connected to the pixel driving thin film transistor and a set of scanning wirings, and the signal. An active matrix type including an element substrate having a driver circuit for driving the wiring and the scanning wiring, an opposing substrate having a common electrode facing the element substrate, and a liquid crystal sealed between the element substrate and the opposing substrate. In the liquid crystal display device, there is an organic film on the pixel driving thin film transistor on the element substrate, the signal line, the scanning line and the driver circuit, and the pixel electrode on the organic film,
The liquid crystal display device is characterized in that the driver circuit on the element substrate is under a seal portion for joining the element substrate and the counter substrate and at the same time sealing liquid crystal.
JP04145893A 1993-03-02 1993-03-02 Liquid crystal display Expired - Lifetime JP3413230B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04145893A JP3413230B2 (en) 1993-03-02 1993-03-02 Liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04145893A JP3413230B2 (en) 1993-03-02 1993-03-02 Liquid crystal display

Publications (2)

Publication Number Publication Date
JPH06258662A true JPH06258662A (en) 1994-09-16
JP3413230B2 JP3413230B2 (en) 2003-06-03

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3413230B2 (en)

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