JP2000267132A - Electrode substrate and liquid crystal display device, and manufacture of electrode substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an electrode substrate and a liquid crystal display device having high reliability and manufacture thereof. SOLUTION: A pixel electrode 151 is brought in contact with a source electrode 131 of FT 121 via contact hole 501 of a color filter CF and a contact hole 502 of a transparent insulating film 171, to be electrically connected. Gentler tapered angles can be formed for those of both contact holes without precise control of them, by forming at least a part of the contact hole 502 of the transparent insulating film 171 inside of the contact hole 501 of the color filter CF, and it is possible to prevent discontinuance between an electrode member of a pixel area and an electrode member filled in the contact hole.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode substrate, a liquid crystal display device, and a method for manufacturing an electrode substrate, and more particularly to electrically connecting a pixel electrode and a switching element via an insulating film such as a color filter. Related to the structure.

[0002]

2. Description of the Related Art In recent years, lightweight, small, and high-definition liquid crystal display devices have been developed in the field of information equipment such as computers and video equipment such as televisions.

At present, active matrix type liquid crystal display devices for color display are mainly constituted by sandwiching a liquid crystal composition between an array substrate and a counter substrate. The array substrate is a thin film transistor using amorphous silicon or polysilicon as a semiconductor layer, that is, a TFT.
And a pixel electrode connected to the TFT and provided corresponding to the pixel region, a scanning line, and a signal line. The counter substrate has a color filter that is provided corresponding to the pixel region and is colored in three primary colors of red, green, blue, or cyan, magenta, and yellow, and a counter electrode.

[0004] A spacer is arranged between the array substrate and the opposing substrate to keep the distance constant. These substrates are bonded together with a seal material printed around the substrate except for a liquid crystal injection port for injecting a liquid crystal composition.

As described above, in the conventional liquid crystal display device, the color filter is provided on the opposing substrate. However, when two substrates are bonded, high bonding accuracy is required.
Further, problems such as a decrease in manufacturing yield and a decrease in the aperture ratio of the pixel region due to the deterioration of the bonding accuracy occur.

In order to improve these problems, a method of providing a color filter on an array substrate has recently been proposed. That is, the color filter is disposed between the TFT formed on the array substrate and the pixel electrode via the transparent insulating film.

[0007]

However, the method of providing a color filter on an array substrate has the following problems.

That is, in order to contact and electrically connect the TFT and the pixel electrode, it is necessary to form a contact hole in an insulating film such as a color filter and a transparent insulating film interposed therebetween. This contact hole is formed in a tapered shape such that the hole diameter becomes smaller as it goes downward. If the taper angle of the contact hole is not controlled with sufficient precision at this time, the electrode member in the pixel region may be disconnected from the electrode member filled in the contact hole when forming the pixel electrode.

When such a disconnection occurs, the pixel electrode cannot be brought into contact with the TFT, and a bright spot defect in which the pixel area becomes a bright spot occurs.

Further, in order to accurately control the taper angle of the contact hole, it is necessary to change not only the process of forming the insulating film but also the material of the insulating film such as a color filter.

Further, depending on the material of the color filter, the color filter contains a large amount of impurities that cause display burn-in or display unevenness. Therefore, when the color filter is exposed from the insulating film and directly contacts the pixel electrode, the contact area is large. Needs to be kept to a minimum.

As described above, in the method in which the color filters are provided on the array substrate, the reliability of the liquid crystal display device may be impaired unless the taper angle of the contact hole is accurately controlled.

SUMMARY OF THE INVENTION The present invention has been made in consideration of the above-described problems, and has as its object to provide a highly reliable electrode substrate, a liquid crystal display device, and a method of manufacturing an electrode substrate.

[0014]

According to a first aspect of the present invention, there is provided an electrode substrate comprising: an electrode; and a switching element for selectively supplying a signal voltage to the electrode. An electrode substrate provided with at least two contact holes interposed between the switching element and the electrode and having a contact hole for electrically connecting the electrode to the switching element.
A first contact hole formed in the upper insulating film, at least a part of which is formed inside a second contact hole formed in the lower insulating film. It is characterized by.

According to a second aspect of the present invention, there is provided a liquid crystal display device, comprising: scanning lines arranged in a row direction on one main surface; signal lines arranged in a column direction perpendicular to these scanning lines; A switching element disposed at an intersection with a line, a first substrate having a pixel electrode electrically connected to the switching element, a second substrate having a counter electrode disposed on one main surface, A liquid crystal display device comprising a liquid crystal composition sandwiched between the first substrate and the second substrate, wherein the first substrate is interposed between the switching element and the pixel electrode. An insulating film laminated in at least two layers having a contact hole for electrically connecting a pixel electrode to the switching element, wherein a first contact hole formed in the upper first insulating film has at least Parts is characterized in that it is formed inside the second contact hole formed in the second insulating film of the lower layer.

According to a fifth aspect of the present invention, there is provided a liquid crystal display, comprising: scanning lines arranged in a row direction on one main surface; signal lines arranged in a column direction so as to be orthogonal to these scanning lines; A first electrode that is disposed at the intersection of the scanning line and the signal line and that is electrically connected to the signal line, and a second electrode that is electrically connected to the pixel electrode. A switching element, a color filter layer disposed on at least the second electrode of the pixel region and the switching element, and a transparent insulation disposed on the color filter layer and on which the pixel electrode is disposed. A liquid crystal comprising: a first substrate having a film; a second substrate having a counter electrode disposed on one main surface; and a liquid crystal composition sandwiched between the first substrate and the second substrate. Display device smell The transparent insulating film has a first contact hole for electrically connecting the pixel electrode to the second electrode, and the color filter layer electrically connects the pixel electrode to the second electrode. A second contact hole for contacting the pixel electrode, wherein at least a part of the pixel electrode contacts the second electrode while contacting the side surface of the first contact hole without contacting the side surface of the second contact hole. It is characterized by doing.

According to a sixth aspect of the present invention, there is provided a method of manufacturing an electrode substrate.
Scan lines arranged in a row direction on one main surface, signal lines arranged in a column direction so as to be orthogonal to these scan lines, pixel electrodes arranged in a matrix pixel area, the scan lines and the signal lines, And a switching element having a first electrode electrically connected to the signal line and a second electrode electrically connected to the pixel electrode, at least one of the pixel region and the switching element. A method for manufacturing an electrode substrate, comprising: a color filter layer disposed on a second electrode; and a transparent insulating film disposed on the color filter layer and on which the pixel electrode is disposed. A color filter layer is formed on at least the second electrode of the switching element, and a contact hole penetrating to the second electrode is formed on the color filter layer. A transparent insulating film is formed on the color filter layer, and a contact hole penetrating to the second electrode is formed in the transparent insulating film at least partially inside the contact hole formed in the color filter layer. On the transparent insulating film, at least a portion of which is in contact with the side surface of the contact hole formed in the color filter without contacting the side surface of the contact hole formed in the transparent insulating film. A pixel electrode is formed so as to contact two electrodes.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of an electrode substrate, a liquid crystal display device and a method of manufacturing an electrode substrate according to the present invention will be described with reference to the drawings.

FIG. 1 is a perspective view schematically showing an example of a liquid crystal display panel applied to the liquid crystal display device of the present invention.

A liquid crystal display device according to an embodiment of the present invention is a reflection type liquid crystal display device of an active matrix type, and includes a liquid crystal display panel 10 as shown in FIG.

As shown in FIG. 1, the liquid crystal display panel 10 has an array substrate 100 as a first substrate, an opposing substrate 200 as a second substrate disposed opposite to the array substrate 100, and an opposing substrate. A liquid crystal composition disposed between the substrate and the substrate. In such a liquid crystal display panel 10, a display area 1 for displaying an image is provided.
Numeral 02 is formed in a region surrounded by a seal material 106 for bonding the array substrate 100 and the counter substrate 200, and a peripheral area 104 having various wiring patterns drawn from the display area 102 is located outside the seal material 106. Area.

The display area 102 of the array substrate 100 is
As shown in FIGS. 2 and 4, mxn pixel electrodes 151 are arranged in a matrix on a transparent insulating substrate, for example, a glass substrate having a thickness of 0.7 mm.
Scanning corresponding to m scanning lines 111 formed along one row direction, n signal lines 103 formed along the column direction of these pixel electrodes 151, and mxn pixel electrodes 151 There are m × n thin film transistors or TFTs 121 arranged as nonlinear switching elements near the intersection of the line 111 and the signal line 103.

The scanning lines 111 are formed of a low-resistance material such as aluminum or a molybdenum-tungsten alloy. The signal line 103 is formed of a low-resistance material such as aluminum,
1 are provided via an insulating film 113 formed of a multilayer film of silicon oxide and silicon nitride formed on the semiconductor device 1.

The pixel electrode 151 is made of indium-tin-tin.
It is formed of a transparent conductive member such as oxide, ie, ITO.

The TFT 121 has a portion protruding from the scanning line 111 as a gate electrode 112, and has a gate insulating film 113 laminated thereon. This gate insulating film 11
3, an amorphous silicon film, ie, a-Si:
A semiconductor film 115 formed of an H film is stacked. On this semiconductor film 115, a channel protective film 117 made of silicon nitride is laminated.

The semiconductor film 115 is electrically connected to the pixel electrode 151 via the low-resistance semiconductor film 119 formed of an n + type a-Si: H film and the source electrode 131. Further, the semiconductor film 115 is formed of the low-resistance semiconductor film 11.
9, and the drain electrode 13 extended from the signal line 103
2 and is electrically connected to the signal line 103 via the signal line 2. T
Channel protection film 117 of FT121, source electrode 13
1 and the drain electrode 132 are covered with a protective film 171 made of a transparent insulating film such as a transparent photosensitive resin.

The array substrate 100 includes a color filter CF colored in three primary colors for each pixel region. That is, the color filter CF is located below the pixel electrode 151 of the array substrate 100 and has a red pixel (R).
Area, a green pixel (G) area, and a blue pixel (B) area. The color filter CF is formed of, for example, a resin in which pigments of each color component are dispersed.

The color filter CF is formed on the gate insulating film 113 and at least the source electrode 1 of the TFT 121.
It is provided on a part of 31. The color filter CF is covered with a protective film 171 made of a transparent insulating film that covers the TFT 121.

The pixel electrode 15 provided on the protective film 171
Reference numeral 1 denotes a source electrode 131 of the TFT 121 via a contact hole 501 formed in the color filter CF and a contact hole 502 formed in the protective film 171.
And are electrically connected.

The surface of the pixel electrode 151 is
Are covered with an alignment film 141 for aligning the liquid crystal composition 300 interposed between the liquid crystal composition 300 and the liquid crystal composition 300.

In the liquid crystal display panel 10, as shown in FIG. 1, although not shown in detail, the signal lines are arranged around the periphery of the array substrate 100 in order to reduce the outer dimensions of the liquid crystal display device, particularly the frame size. The X-TABs 401-1, 401-4, which are drawn out only to the first side 100 </ b> X side of the area 104 </ b> X and include a signal line driving circuit for supplying video data to the signal lines on the first side 100 </ b> X side,
01-2, 401-3, and 401-4.

The scanning lines are also drawn out only to the second side 100Y of the peripheral area 104X of the array substrate, which is orthogonal to the first side 100X, and supply the scanning pulses to the scanning lines at the second side 100Y. Y-TAB 411-1 and Y-TAB 411-1,
11-2.

The display area 10 of the array substrate 100
2 and non-pixel portions in the peripheral area 104 (X, Y),
That is, as shown in FIG. 2, a gap having a predetermined width is formed between the array substrate 100 and the counter substrate 200 on the wiring patterns such as the signal lines 103 and the scanning lines 111, the TFT 121, the pixel electrode 151, the peripheral frame portion, and the like. A spacer 400 to be formed is arranged.

Thus, the gap between the array substrate 100 and the counter substrate 200 is set to about 5 μm.

As shown in FIG. 4, the display area 102 of the counter substrate 200 has a transparent insulating substrate, for example, having a thickness of 0.1 mm.
Counter electrode 20 disposed on 7 mm glass substrate 201
4 is provided.

The opposing electrode 204 is formed of a transparent conductive member that forms a potential difference with the pixel electrode 151, for example, indium-tin-oxide, that is, ITO. The surface of the counter electrode 204 is covered with an alignment film 205 for aligning the liquid crystal composition 300 interposed between the counter electrode 204 and the array substrate 100.

On the front and back surfaces of the liquid crystal display panel 10, that is, on the outer surface of the glass substrate 201, polarizing plates 191 and 206 whose deflection surfaces are selected according to the display mode of the liquid crystal display device and the twist angle of the liquid crystal composition. Are arranged.

Next, a method for contacting the pixel electrode with the TFT will be described more specifically.

That is, the pixel electrode 151 is
3 is disposed in a pixel region on a color filter CF formed on the color filter 3 and on a transparent insulating film 171 formed on the color filter CF. A color filter CF and a transparent insulating film 171 are provided on at least a part of the source electrode 131 of the TFT 121.

The color filter CF includes a source electrode 131.
Has a contact hole 501 formed immediately above. Further, the transparent insulating film 171 has a contact hole 502 formed right above the source electrode 131.
These contact holes 501 and 502 are formed in a tapered shape such that the hole diameter becomes smaller as going downward. The hole diameter of the contact hole 501 is, for example, 20 μm × 20 μm, and the hole diameter of the contact hole 502 is, for example, 25 μm × 25 μm.

These contact holes 501 and 50
2, when viewed in a plan view, as shown in FIG. 3, at least a part of one contact hole is formed inside the other contact hole. In the embodiment shown in FIG. 3, at least a part of the contact hole 502 formed in the upper transparent insulating film 171 is formed inside the lower color filter CF.

FIGS. 4 and 5 show cross sections of the pixel electrode 151 because at least a part of the contact hole 502 is disposed inside the contact hole 501.
The contact hole 502 of the transparent insulating film 171 does not contact at least a part of the color filter CF.
The source electrode 131 of the TFT 121 while contacting the side of the
Contact

As shown in FIGS. 6A and 6B, the diameter of the contact hole 501 of the color filter CF is sufficiently larger than the diameter of the contact hole 502 of the transparent insulating film 171. 502
May be formed inside the contact hole 501.
The hole diameter of the contact hole 501 is, for example, 20 μm × 20 μm, as in the above-described embodiment, and the hole diameter of the contact hole 502 is, for example, 16 μm × 16 μm. As shown in FIG. 6B, the contact hole 502 has a contact hole 501 when viewed in plan.
Is formed about 2 μm inside.

Even in the case of such a configuration, the pixel electrode 151 contacts the source electrode 131 of the TFT 121 while contacting the side surface of the contact hole 502 of the transparent insulating film 171 without contacting the color filter CF.

Therefore, it is not necessary to precisely control both the taper angles of the contact holes of the transparent insulating film 171 and the color filters CF. In this case, the taper angle of the contact hole 502 of the transparent insulating film 171 is sufficiently gentle. Therefore, when the pixel electrode 151 is formed, disconnection between the electrode member in the pixel region and the electrode member filled in the contact hole can be prevented.

As a result, it is possible to reliably electrically connect the pixel electrode and the TFT, and it is possible to prevent the occurrence of a defective bright spot.

Further, in order to control the taper angle of the contact hole, there is no need to change the process of forming the insulating film or change the material.

Furthermore, even when a color filter containing a large amount of impurities that induce display burn-in or display unevenness is used, it is possible to minimize the contact area of the color filter that directly contacts the pixel electrode. Become.

Next, a method of manufacturing the liquid crystal display device shown in FIG. 3 will be described.

That is, a glass substrate 1 having a thickness of 0.7 mm
A molybdenum-tungsten alloy for forming the scanning lines 111 and the gate electrodes 112 of the TFTs 121 is formed to a thickness of about 0.3 μm on the substrate 01 and is patterned by photolithography. Subsequently, a multilayer film of a silicon oxide film and a silicon nitride film for forming the gate insulating film 113 is formed.

Then, on this gate insulating film 113, T
An amorphous silicon film as the semiconductor layer 115 of the FT 121, a silicon nitride film for forming the channel protective film 117, and an n + type a-Si for forming the low-resistance semiconductor film 119:
An H film, an aluminum film having a thickness of about 0.3 μm for forming the signal line 103, the source electrode 131, and the drain electrode 132 are formed and patterned.

Subsequently, a photosensitive resist in which a red pigment is dispersed is applied to the entire surface with a thickness of 2.0 μm using a spinner, and dried at 90 ° C. for 10 minutes. Thereafter, the photosensitive resin is transmitted through a portion where a red coloring layer is formed, and a spacer area (7 μm × 15 μm) and an outer peripheral portion (width 1) are formed.
0 μm) and the contact hole (20 μm × 20 μm)
m) using a photomask that shields light at 365 nm
At a wavelength of 200 mJ / cm ² and developed for 20 seconds with a 1 wt% aqueous potassium hydroxide solution. Then, baking is performed at 200 ° C. for 60 minutes to form a red color filter having a contact hole 501 as a red color layer.

Similarly, by repeatedly forming green and blue color layers, a color filter CF having a thickness of 1.5 μm is formed in each color pixel region. here,
As the green coloring material, for example, a photosensitive resist in which a green pigment is dispersed is used, and as the blue coloring material, a photosensitive resist in which a blue pigment is dispersed is used.

Subsequently, a photosensitive black resin is applied using a spinner and dried at 90 ° C. for 10 minutes, and thereafter, the spacer area (7 μm × 15 μm) and the outer peripheral portion (3 μm width) of the display area are shielded from light. After exposing with a light exposure of 300 mJ / cm ² through such a photomask, pH
Develop with an alkaline aqueous solution of = 11.5. Then, baking is performed at 200 ° C. for 60 minutes to simultaneously form the spacer and the light-shielding region on the outer peripheral portion of the display area.

Subsequently, a photosensitive transparent resin for forming a transparent insulating film as the protective film 171 is removed by a spinner to a thickness of 0.1 mm.
It is applied in a thickness of 1 to 0.3 μm and dried at 90 ° C. for 10 minutes. Then, a contact hole (25 μm × 2
5 μm) through a photomask that blocks light.
After exposure at an exposure of 0 mJ / cm ² , pH = 11.0.
5. Develop with an alkaline aqueous solution. And 20
By firing at 0 ° C. for 60 minutes, a transparent insulating film 171 having a contact hole 502 is formed. The two sides of the contact hole 502 formed at this time are patterned so as to be formed about 3 μm inside the contact hole 501 of the color filter CF.

Subsequently, an ITO film having a thickness of about 0.1 μm is formed by sputtering. At this time, the contact holes 501 and 502 are also filled with ITO,
One source electrode 131 is electrically connected. Thereafter, the ITO thin film is patterned into a predetermined pixel electrode shape by photolithography, thereby forming a pixel electrode 1.
51 are formed.

Subsequently, polyimide is coated on the entire surface as a material for the alignment film, and a rubbing process is performed to obtain the alignment film 1.
41 is formed.

On the other hand, a glass substrate 201 having a thickness of 0.7 mm
A counter electrode 204 and an alignment film 205 are formed thereon, and a counter substrate 200 is formed.

Subsequently, along the periphery of the alignment film 205 of the opposing substrate 200, except for the liquid crystal injection port, a sealing material made of an epoxy-based thermosetting resin is used.
Print.

Subsequently, the glass substrates 101 and 201 are arranged so that the alignment films 141 and 205 face each other.
Heat is applied to cure the sealing material 106, and the two substrates are bonded to each other.

Subsequently, the liquid crystal composition 30
A liquid crystal panel 10 is manufactured by injecting a mixture obtained by adding 0.1 wt% of chiral agent S811 to ZLI-4792 (manufactured by E. Merck) as 0, and sealing the liquid crystal injection port with an ultraviolet curable resin.

Subsequently, LLC2-9218S (manufactured by Sanritz Co., Ltd.) is pasted as polarizing plates 191 and 206 on both sides of the liquid crystal panel 10 to make a module, and an active matrix type liquid crystal display device is manufactured.

In the liquid crystal display device manufactured as described above, a high-quality display image free of a bright spot defect due to a contact defect was obtained.

As described above, according to the electrode substrate, the liquid crystal display device, and the method of manufacturing the electrode substrate of the present invention, at least a part of the contact hole of the transparent insulating film is formed inside the contact hole of the color filter. Even if the contact hole angle of both contact holes is not controlled with high precision, a gentler taper angle can be formed, preventing disconnection between the electrode member in the pixel region and the electrode member filled in the contact hole. can do.

Further, it is not necessary to change the material of the transparent insulating film or the color filter only for controlling the taper angle.

Thus, it is possible to prevent the occurrence of a bright spot defect caused by a contact defect.

Further, according to the present invention, the contact hole of the transparent insulating film is formed smaller than the contact hole of the color filter and inside the contact hole of the color filter, so that the material of the color filter is not exposed. The contact between the electrode and the color filter can be prevented. Accordingly, diffusion of impurities from the color filter material to the pixel electrode can be prevented, and not only a contact failure but also a decrease in reliability of the liquid crystal display device due to impurity diffusion can be suppressed.

[0068]

As described above, according to the present invention, it is possible to provide a highly reliable electrode substrate, a liquid crystal display device, and a method of manufacturing an electrode substrate.

[Brief description of the drawings]

FIG. 1 is a perspective view schematically showing an example of a liquid crystal display panel applied to a liquid crystal display device of the present invention.

FIG. 2 is a plan view showing one pixel region on the array substrate side of the liquid crystal panel shown in FIG. 1;

FIG. 3 is an enlarged plan view in which a contact region between a pixel electrode and a source electrode of a thin film transistor in the plan view shown in FIG. 2 is enlarged;

FIG. 4 is a sectional view schematically showing a structure of the liquid crystal display device when cut along a line AB shown in FIG. 3;

FIG. 5 is a sectional view schematically showing a structure of the liquid crystal display device when cut along a line CD shown in FIG. 3;

FIG. 6 is a view showing another embodiment of the present invention. FIG. 6 (a) is a sectional view of a contact region between a pixel electrode and a source electrode of a thin film transistor. (B) is an enlarged plan view in which the contact region shown in (a) is enlarged.

[Explanation of symbols]

 Reference Signs List 10 liquid crystal display panel 100 array substrate 103 signal line 111 scanning line 121 thin film transistor 131 source electrode 132 drain electrode 151 pixel electrode 171 protective film 200 counter substrate 204 counter electrode 300 liquid crystal composition 501 ... contact hole 502 ... contact hole CF ... color filter

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H091 FA02Y FB04 FC10 FC26 FC29 FD04 FD14 FD24 GA13 HA07 LA12 LA15 2H092 JA26 JA29 JA36 JA38 JA42 JA44 JA46 JB13 JB23 JB32 JB33 JB38 JB57 JB63 JB69 KA05 KA07 KA05 KB MA17 MA35 MA37 NA15 NA19 NA25 NA27 NA29 PA08 QA07

Claims (6)

[Claims] 1. An electrode substrate comprising: an electrode; and a switching element for selectively supplying a signal voltage to the electrode, wherein the electrode substrate is interposed between the switching element and the electrode, and The semiconductor device further includes at least two stacked insulating films each having a contact hole for electrically connecting an electrode to the switching element. At least a part of the first contact hole formed in the upper insulating film is the first contact hole. An electrode substrate formed inside a second contact hole formed in a lower insulating film. 2. A scanning line arranged in a row direction on one main surface, a signal line arranged in a column direction orthogonal to these scanning lines, and arranged at an intersection of the scanning line and the signal line. A first substrate having a switching element and a pixel electrode electrically connected to the switching element; a second substrate having a counter electrode disposed on one principal surface; and the first substrate and the second substrate. And a liquid crystal composition sandwiched between the first substrate and the first substrate, wherein the first substrate is interposed between the switching element and the pixel electrode and electrically connects the pixel electrode to the switching element. An insulating film laminated in at least two layers having a contact hole for connecting to the first insulating film, wherein at least a part of the first contact hole formed in the upper first insulating film is the lower second insulating film Into shape A liquid crystal display device formed inside a second contact hole to be formed. 3. The liquid crystal display device according to claim 2, wherein said first insulating film is a transparent insulating film, and said second insulating film is a color filter. 4. The liquid crystal display device according to claim 2, wherein said first contact hole is smaller than said second contact hole and formed inside said second contact hole. 5. Scan lines arranged in a row direction on one main surface, signal lines arranged in a column direction orthogonal to these scan lines, pixel electrodes arranged in a pixel area in a matrix, A switching element disposed at an intersection of a line and a signal line and having a first electrode electrically connected to the signal line and a second electrode electrically connected to the pixel electrode; A color filter disposed on at least the second electrode of a switching element, and
A first substrate having a transparent insulating film disposed on the color filter and having the pixel electrode disposed thereon; a second substrate having a counter electrode disposed on one principal surface; A liquid crystal display device comprising: a liquid crystal composition sandwiched between a substrate and a second substrate; wherein the transparent insulating film includes a first contact for electrically connecting the pixel electrode to the second electrode. The color filter layer has a second contact hole for electrically connecting the pixel electrode to the second electrode, and at least a part of the pixel electrode has the second contact hole. A liquid crystal display device contacting the second electrode while contacting the side surface of the first contact hole without contacting the side surface of the liquid crystal display. 6. A scanning line arranged in a row direction on one main surface, a signal line arranged in a column direction orthogonal to these scanning lines, a pixel electrode arranged in a matrix pixel area, A switching element disposed at an intersection of a line and a signal line and having a first electrode electrically connected to the signal line and a second electrode electrically connected to the pixel electrode; A color filter disposed on at least the second electrode of a switching element, and
A method for manufacturing an electrode substrate, comprising: a transparent insulating film disposed on the color filter and the pixel electrode disposed thereon; wherein a switching element is formed, and a color filter is formed on at least a second electrode of the switching element. Forming a contact hole penetrating to the second electrode in the color filter; forming a transparent insulating film on the color filter; forming a contact hole penetrating to the second electrode in the transparent insulating film; At least a portion thereof is formed so as to be disposed inside a contact hole formed in the color filter; and on the transparent insulating film, at least a portion thereof does not contact the side surface of the contact hole formed in the transparent insulating film. Contacting the second electrode while contacting the side surface of the contact hole formed in the color filter Forming a pixel electrode so that the electrode substrate manufacturing method, characterized in that.