CN104422971A - Preparation method of antireflection film - Google Patents
Preparation method of antireflection film Download PDFInfo
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- CN104422971A CN104422971A CN201310411812.0A CN201310411812A CN104422971A CN 104422971 A CN104422971 A CN 104422971A CN 201310411812 A CN201310411812 A CN 201310411812A CN 104422971 A CN104422971 A CN 104422971A
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- Prior art keywords
- index layer
- reflection film
- manufacture method
- low
- high refractive
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
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- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a preparation method of an antireflection film. The preparation method comprises the step of carrying out evaporation alternatively on a plurality of high-refractive-index layers and a plurality of low-refractive-index layers sequentially on a substrate by utilizing a vacuum coating method. The high-refractive-index layers are magnesium fluoride, and the low-refractive-index layers are the mixture of titanium dioxide and praseodymium oxide. The antireflection film prepared by the method is high in transmissivity and abrasion resistance.
Description
Technical field
The present invention relates to anti-reflection film, particularly a kind of manufacture method of wear-resisting anti-reflection film.
Background technology
The abrasion resistant effect of existing anti-reflection film (antireflecting film) is bad.
Summary of the invention
In view of this, the manufacture method that a kind of wear-resisting anti-reflection film is provided is necessary.
A manufacture method for anti-reflection film, it utilizes vacuum coating method to rotate successively in a substrate and plates multiple high refractive index layer and multiple low-index layer.This high refractive index layer is magnesium fluoride, and this low-index layer is the potpourri of titania and praseodymium oxide.
The transmissivity of anti-reflection film in visible light wave range (400-650nm) of manufacture like this is greater than 99.5%.In addition, the same pencil by 6H hardness paddling 5 times back and forth under 500 gram force effects, the scuffing degree of anti-reflection film of the present invention is much smaller than existing anti-reflection film.
Accompanying drawing explanation
Fig. 1 is the device schematic diagram of the manufacture method of the anti-reflection film of better embodiment of the present invention.
Fig. 2 is the diagrammatic cross-section of the anti-reflection film of better embodiment of the present invention.
Fig. 3 is the wavelength-reflectivity Characteristics curve map of the anti-reflection film of Fig. 2.
Main element symbol description
Following embodiment will further illustrate the present invention in conjunction with above-mentioned accompanying drawing.
Embodiment
The manufacture method of the anti-reflection film of better embodiment of the present invention utilizes vacuum coating method to rotate successively in a substrate the multiple high refractive index layer of evaporation and multiple low-index layer.This high refractive index layer is magnesium fluoride, and this low-index layer is the potpourri of titania and praseodymium oxide.
Please refer to the drawing 1, as an example, the substrate 10 of present embodiment is glass mirror, and its refractive index is about 1.62.
For improving the adhesion of this substrate 10, before plated film, this substrate 10 should be cleaned with method for suppersonic cleaning.
Before plated film, a vacuum coater 20 need be provided, and this vacuum coater 20 is vacuumized and heats.As an example, in present embodiment, this vacuum coater 20 is evacuated to 2.0 × 10
-3about handkerchief, and be heated to 300 degrees centigrade.
Before plated film, this substrate 10 is toasted under the vacuum high-temperature environment of this vacuum coater 20.As an example, in present embodiment, the baking time of this substrate 10 is about 60 minutes.
This vacuum coater 20 comprises crucible 21, electron gun 22 and a film thickness monitoring quartz plate 23.This crucible 21 is for accommodating the raw material of this high refractive index layer and this low-index layer.This electron gun 22 carries out evaporation for divergent bundle with bombardment, evaporation raw material.This film thickness monitoring quartz plate 23 thickens speed, thickness for what monitor this high refractive index layer and this low-index layer.As an example, in present embodiment, when this high refractive index layer of evaporation and this low-index layer, the working current of this electron gun 22 is about 25mA and 330mA (operating voltage is 220V) respectively.So, can record the speed that thickens of this high refractive index layer and this low-index layer is about 4 dusts/second and 4.1 dusts/second respectively by this film thickness monitoring quartz plate 23.
This vacuum coater 20 also comprises a gas access 24, for importing oxygen when this low-index layer of evaporation.As an example, in present embodiment, when this low-index layer of evaporation, the oxygen pressure in this vacuum coater 20 is about 1.0 × 10
-2handkerchief.
Refer to Fig. 2, after plated film, the anti-reflection film 30 of present embodiment can be obtained in this substrate 10.This anti-reflection film 30 comprises one first stacking high refractive index layer 31, first low-index layer 32,1 second high refractive index layer 33,1 second low-index layer 34, third high index layer 35, the 3rd low-index layer 36 and one the 4th high refractive index layer 37 of rotating successively.In other words, this anti-reflection film 30 has seven layers.As an example, the physical thickness of each rete is provided below:
Referring to Fig. 3, is the wavelength-reflectivity Characteristics curve map of this anti-reflection film 30 measured.Visible, the reflectivity of this anti-reflection film 30 in visible light wave range (400-650nm) is lower than 0.5% (namely transmissivity is greater than 99.5%).
In addition, the same pencil by 6H hardness paddling 5 times back and forth under 500 gram force effects, the scuffing degree of this anti-reflection film 30 is much smaller than existing anti-reflection film.
In a word; those skilled in the art will be appreciated that; above embodiment is only used to the present invention is described; and be not used as limitation of the invention; as long as within spirit of the present invention, the suitable change do above embodiment and change all drop within the scope of protection of present invention.
Claims (10)
1. a manufacture method for anti-reflection film, it utilizes vacuum coating method to rotate successively in a substrate and plates multiple high refractive index layer and multiple low-index layer; This high refractive index layer is magnesium fluoride, and this low-index layer is the potpourri of titania and praseodymium oxide.
2. the manufacture method of anti-reflection film as claimed in claim 1, is characterized in that, before plated film, utilize method for suppersonic cleaning to clean this substrate.
3. the manufacture method of anti-reflection film as claimed in claim 1, is characterized in that, in plated film prerequisite for a vacuum coater, and is vacuumized by this vacuum coater and heats.
4. the manufacture method of anti-reflection film as claimed in claim 3, it is characterized in that, this vacuum coater is evacuated to 2.0 × 10
-3about handkerchief, and be heated to 300 degrees centigrade.
5. the manufacture method of anti-reflection film as claimed in claim 3, it is characterized in that, before plated film, this substrate is toasted under the vacuum high-temperature environment of this vacuum coater.
6. the manufacture method of anti-reflection film as claimed in claim 5, it is characterized in that, the baking time of this substrate is about 60 minutes.
7. the manufacture method of anti-reflection film as claimed in claim 3, it is characterized in that, this vacuum coater comprises a crucible, an electron gun and a film thickness monitoring quartz plate, this crucible is for accommodating the raw material of this high refractive index layer and this low-index layer, this used in electron gun carries out evaporation in divergent bundle with bombardment, evaporation raw material, and this film thickness monitoring quartz plate thickens speed, thickness for what monitor this high refractive index layer and this low-index layer.
8. the manufacture method of anti-reflection film as claimed in claim 7, it is characterized in that, when this high refractive index layer of evaporation and this low-index layer, the working current of this electron gun is about 25mA and 330mA respectively, and the speed that thickens of this high refractive index layer and this low-index layer is about 4 dusts/second and 4.1 dusts/second respectively.
9. the manufacture method of anti-reflection film as claimed in claim 3, it is characterized in that, this vacuum coater also comprises a gas access, for importing oxygen when this low-index layer of evaporation.
10. the manufacture method of anti-reflection film as claimed in claim 9, it is characterized in that, when this low-index layer of evaporation, the oxygen pressure in this vacuum coater is about 1.0 × 10
-2handkerchief.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310411812.0A CN104422971A (en) | 2013-09-11 | 2013-09-11 | Preparation method of antireflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310411812.0A CN104422971A (en) | 2013-09-11 | 2013-09-11 | Preparation method of antireflection film |
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| Publication Number | Publication Date |
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| CN104422971A true CN104422971A (en) | 2015-03-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310411812.0A Pending CN104422971A (en) | 2013-09-11 | 2013-09-11 | Preparation method of antireflection film |
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| CN (1) | CN104422971A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107735697A (en) * | 2015-09-14 | 2018-02-23 | 康宁股份有限公司 | High printing opacity and mar-proof antireflective product |
| CN108490511A (en) * | 2017-12-21 | 2018-09-04 | 山东非金属材料研究所 | Anti-reflection composite film |
| CN109884737A (en) * | 2018-12-29 | 2019-06-14 | 瑞声科技(新加坡)有限公司 | A kind of eyeglass and preparation method thereof and camera lens |
| US10436945B2 (en) | 2014-05-12 | 2019-10-08 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
| US10444408B2 (en) | 2013-05-07 | 2019-10-15 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US10837103B2 (en) | 2014-08-01 | 2020-11-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| US10948629B2 (en) | 2018-08-17 | 2021-03-16 | Corning Incorporated | Inorganic oxide articles with thin, durable anti-reflective structures |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| US11667565B2 (en) | 2013-05-07 | 2023-06-06 | Corning Incorporated | Scratch-resistant laminates with retained optical properties |
-
2013
- 2013-09-11 CN CN201310411812.0A patent/CN104422971A/en active Pending
Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10444408B2 (en) | 2013-05-07 | 2019-10-15 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US11714213B2 (en) | 2013-05-07 | 2023-08-01 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US11667565B2 (en) | 2013-05-07 | 2023-06-06 | Corning Incorporated | Scratch-resistant laminates with retained optical properties |
| US11231526B2 (en) | 2013-05-07 | 2022-01-25 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| US10436945B2 (en) | 2014-05-12 | 2019-10-08 | Corning Incorporated | Durable and scratch-resistant anti-reflective articles |
| US10837103B2 (en) | 2014-08-01 | 2020-11-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| US10995404B2 (en) | 2014-08-01 | 2021-05-04 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| US11698475B2 (en) | 2015-09-14 | 2023-07-11 | Corning Incorporated | Scratch-resistant anti-reflective articles |
| US10451773B2 (en) | 2015-09-14 | 2019-10-22 | Corning Incorporated | High light transmission and scratch-resistant anti-reflective articles |
| US11002885B2 (en) | 2015-09-14 | 2021-05-11 | Corning Incorporated | Scratch-resistant anti-reflective articles |
| US10416352B2 (en) | 2015-09-14 | 2019-09-17 | Corning Incorporated | High light transmission and scratch-resistant anti-reflective articles |
| CN107735697A (en) * | 2015-09-14 | 2018-02-23 | 康宁股份有限公司 | High printing opacity and mar-proof antireflective product |
| CN108490511A (en) * | 2017-12-21 | 2018-09-04 | 山东非金属材料研究所 | Anti-reflection composite film |
| US10948629B2 (en) | 2018-08-17 | 2021-03-16 | Corning Incorporated | Inorganic oxide articles with thin, durable anti-reflective structures |
| US11567237B2 (en) | 2018-08-17 | 2023-01-31 | Corning Incorporated | Inorganic oxide articles with thin, durable anti-reflective structures |
| US11906699B2 (en) | 2018-08-17 | 2024-02-20 | Corning Incorporated | Inorganic oxide articles with thin, durable anti reflective structures |
| CN109884737A (en) * | 2018-12-29 | 2019-06-14 | 瑞声科技(新加坡)有限公司 | A kind of eyeglass and preparation method thereof and camera lens |
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Application publication date: 20150318 |
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| WD01 | Invention patent application deemed withdrawn after publication |