BR112015002627A2 - nano-machined materials utilizing femtosecond pulse laser technologies to increase surface areas and heat dissipation - Google Patents

nano-machined materials utilizing femtosecond pulse laser technologies to increase surface areas and heat dissipation

Info

Publication number
BR112015002627A2
BR112015002627A2 BR112015002627A BR112015002627A BR112015002627A2 BR 112015002627 A2 BR112015002627 A2 BR 112015002627A2 BR 112015002627 A BR112015002627 A BR 112015002627A BR 112015002627 A BR112015002627 A BR 112015002627A BR 112015002627 A2 BR112015002627 A2 BR 112015002627A2
Authority
BR
Brazil
Prior art keywords
nano
heat dissipation
pulse laser
surface areas
increase surface
Prior art date
Application number
BR112015002627A
Other languages
Portuguese (pt)
Inventor
A Rivas Victor
Original Assignee
A Rivas Victor
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by A Rivas Victor filed Critical A Rivas Victor
Publication of BR112015002627A2 publication Critical patent/BR112015002627A2/en

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16Constructional details or arrangements
    • G06F1/20Cooling means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4871Bases, plates or heatsinks
    • H01L21/4878Mechanical treatment, e.g. deforming
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2255/00Heat exchanger elements made of materials having special features or resulting from particular manufacturing processes
    • F28F2255/20Heat exchanger elements made of materials having special features or resulting from particular manufacturing processes with nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Theoretical Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Human Computer Interaction (AREA)
  • General Engineering & Computer Science (AREA)
  • Laser Beam Processing (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
BR112015002627A 2012-08-06 2012-08-06 nano-machined materials utilizing femtosecond pulse laser technologies to increase surface areas and heat dissipation BR112015002627A2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2012/049694 WO2014025332A1 (en) 2012-08-06 2012-08-06 Nano-machined materials using femtosecond pulse-laser technologies for increased surface area and heat-power dissipation

Publications (1)

Publication Number Publication Date
BR112015002627A2 true BR112015002627A2 (en) 2017-07-04

Family

ID=50068435

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015002627A BR112015002627A2 (en) 2012-08-06 2012-08-06 nano-machined materials utilizing femtosecond pulse laser technologies to increase surface areas and heat dissipation

Country Status (8)

Country Link
JP (1) JP2015530925A (en)
KR (1) KR20150046015A (en)
CN (1) CN104603714A (en)
BR (1) BR112015002627A2 (en)
CA (1) CA2880490A1 (en)
DE (1) DE112012006782T5 (en)
GB (1) GB2519253A (en)
WO (1) WO2014025332A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10106880B2 (en) 2013-12-31 2018-10-23 The United States Of America, As Represented By The Secretary Of The Navy Modifying the surface chemistry of a material
US10189117B2 (en) 2013-12-31 2019-01-29 The United States Of America, As Represented By The Secretary Of The Navy Adhesion improvement via material nanostructuring or texturizing
KR102194694B1 (en) * 2019-12-31 2020-12-24 한국과학기술원 Integrated inspection system using thermography and laser ultrasonic in 3D printing process and 3D printing system having the same
WO2023129629A1 (en) 2021-12-29 2023-07-06 PlasmaTex, LLC Pulsed laser processing of medical devices

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4263865B2 (en) * 2002-01-22 2009-05-13 独立行政法人科学技術振興機構 Fine processing method using ultra-short pulse laser and processed product
CH705707B1 (en) * 2004-06-08 2013-05-15 Lvmh Swiss Mft Sa A method of manufacturing components of synchronous and asynchronous transmission and components of synchronous and asynchronous transmission obtained according to this method.
CN2713533Y (en) * 2004-06-11 2005-07-27 庆扬资讯股份有限公司 Radiating device for micro-computer
US20060157234A1 (en) * 2005-01-14 2006-07-20 Honeywell International Inc. Microchannel heat exchanger fabricated by wire electro-discharge machining
US7642205B2 (en) * 2005-04-08 2010-01-05 Mattson Technology, Inc. Rapid thermal processing using energy transfer layers
US20080299408A1 (en) * 2006-09-29 2008-12-04 University Of Rochester Femtosecond Laser Pulse Surface Structuring Methods and Materials Resulting Therefrom
JP2009255141A (en) * 2008-04-18 2009-11-05 Osaka Univ High-efficiency hydrogen-storing metallic material and method for manufacturing the same
CN101380693A (en) * 2008-10-14 2009-03-11 南开大学 Micro-nano structure preparation method on metallic material surface using femtosecond laser
CN101531335A (en) * 2009-04-08 2009-09-16 西安交通大学 Method for preparing metal surface superhydrophobic microstructure by femto-second laser
JP5385054B2 (en) * 2009-08-26 2014-01-08 スタンレー電気株式会社 Heat dissipation material and manufacturing method thereof
CN102036534A (en) * 2009-09-30 2011-04-27 吴献桐 Device with heat dissipation element and manufacturing method thereof
TWM395570U (en) * 2010-08-19 2011-01-01 guo-ren Zheng Woodworking planer structure

Also Published As

Publication number Publication date
CN104603714A (en) 2015-05-06
CA2880490A1 (en) 2014-02-13
KR20150046015A (en) 2015-04-29
WO2014025332A1 (en) 2014-02-13
JP2015530925A (en) 2015-10-29
DE112012006782T5 (en) 2015-09-10
GB2519253A (en) 2015-04-15
GB201500847D0 (en) 2015-03-04

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Legal Events

Date Code Title Description
B08F Application fees: dismissal - article 86 of industrial property law

Free format text: REFERENTE A 6A ANUIDADE.

B08K Lapse as no evidence of payment of the annual fee has been furnished to inpi (acc. art. 87)

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2473 DE 29-05-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.