Dr. Anatoly Y. Burov Profile

Dr. Anatoly Y. Burov

Research Scientist

Publications (52)

Proceedings Article | 10 April 2024 Poster + Paper

Poster + Paper

Hotspot discovery and variability analysis for advanced EUV processes

Kaushik Sah, Zhijin Chen, Yao Zhang, Liming Zhang, Cao Zhang, Craig Higgins, Anatoly Burov, Guy Parsey, Pradeep Vukkadala, Roel Gronheid, Arpit Jain, Ramakanth Ramini, Ankur Agrawal, Garima Sharma, Andrew Cross, Syamashree Roy, Victor Blanco

Proceedings Volume 12955, 129553H (2024) https://doi.org/10.1117/12.3011178

KEYWORDS: Stochastic processes, Scanning electron microscopy, Design, Semiconducting wafers, Inspection, Metrology, Extreme ultraviolet lithography, Defect inspection

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Systematic and stochastic placement error divergence between low and high-NA EUV lithography

Anatoly Burov, Roel Gronheid, Alessandro Vaglio Pret

Proceedings Volume 12750, 1275007 (2023) https://doi.org/10.1117/12.2687702

KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Photomasks, Printing, Lithography, Source mask optimization, Simulations, Photons, Deep ultraviolet, Critical dimension metrology

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Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son

Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373

KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

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Proceedings Article | 28 April 2023 Presentation + Paper

Presentation + Paper

Depth of focus in high-NA EUV lithography: the role of assist features and their variability budget

Roel Gronheid, Alex Vaglio Pret, Anatoly Burov

Proceedings Volume 12494, 124940O (2023) https://doi.org/10.1117/12.2658394

KEYWORDS: SRAF, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Stochastic processes, Manufacturing, Simulations

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Proceedings Article | 1 December 2022 Paper

Paper

Depth of focus in high-NA EUV lithography: a simulation study

Anatoly Burov, Alessandro Vaglio Pret, Roel Gronheid

Proceedings Volume 12293, 122930V (2022) https://doi.org/10.1117/12.2642695

KEYWORDS: Photomasks, SRAF, Source mask optimization, Stochastic processes, Extreme ultraviolet lithography, Extreme ultraviolet, Nanolithography

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SPIE Journal Paper | 6 July 2021

Stochastic side-lobe printing in EUV lithography: a simulation study

Anatoly Burov, Alessandro Vaglio Pret, Stewart Robertson, Patrick Lee

JM3, Vol. 20, Issue 03, 031009, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031009

KEYWORDS: Photomasks, Stochastic processes, Binary data, Extreme ultraviolet lithography, Printing, SRAF, Photons, Metrology, Cadmium, Computer simulations

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Proceedings Article | 16 October 2020 Presentation + Paper

Presentation + Paper

Stochastic side-lobe printing in EUV lithography: a simulation study

Anatoly Burov, Alessandro Vaglio Pret, Stewart Robertson, Patrick Lee

Proceedings Volume 11518, 115180Y (2020) https://doi.org/10.1117/12.2573261

KEYWORDS: Extreme ultraviolet lithography, Stochastic processes, Photomasks, Printing, Binary data, Phase shifts, Optical lithography, Semiconducting wafers, Critical dimension metrology, Image quality

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SPIE Journal Paper | 11 June 2013

In situ aberration measurement technique based on an aerial image with an optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 06, 063602, (June 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.6.063602

KEYWORDS: In situ metrology, Image processing, Principal component analysis, Process modeling, Lithography, Matrices, Optical engineering, Image retrieval, Lithographic illumination, Zernike polynomials

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SPIE Journal Paper | 7 May 2013

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

OE, Vol. 52, Issue 05, 053603, (May 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.5.053603

KEYWORDS: Photomasks, Lithography, Artificial intelligence, Principal component analysis, Optical engineering, Process modeling, Wavefront aberrations, Monochromatic aberrations, Instrument modeling, Mechanics

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Proceedings Article | 18 April 2013 Paper

Paper

A novel focus monitoring technique using Iso-Dense overlay mark

S.X. Li, J.R. Cheng, A. Bourov, G. Sun

Proceedings Volume 8681, 86811H (2013) https://doi.org/10.1117/12.2011422

KEYWORDS: Semiconducting wafers, Binary data, Photomasks, Scanners, Overlay metrology, Lithography, Phase shifts, Reticles, Critical dimension metrology, Process control

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Proceedings Article | 18 December 2012 Paper

Paper

In situ aberration measurement technique based on aerial image with optimized source

Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503N (2012) https://doi.org/10.1117/12.981334

KEYWORDS: Matrices, Lithographic illumination, Lithography, Image processing, Principal component analysis, Process modeling, Statistical analysis, Error analysis, Artificial intelligence, Imaging systems

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Proceedings Article | 18 December 2012 Paper

Paper

In situ aberration measurement technique based on quadratic Zernike model

Jishuo Yang, Xiangzhao Wang, Sikun Li, Lifeng Duan, Guanyong Yan, Dongbo Xu, Anatoly Bourov, Andreas Erdmann

Proceedings Volume 8550, 85503O (2012) https://doi.org/10.1117/12.981328

KEYWORDS: Lithography, Principal component analysis, Wavefront aberrations, In situ metrology, Semiconducting wafers, Image processing, Photomasks, Computer simulations, Metrology, Artificial intelligence

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SPIE Journal Paper | 7 June 2012

Practical application of aerial image by principal component analysis to measure wavefront aberration of lithographic lens

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

JM3, Vol. 11, Issue 02, 023009, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.023009

KEYWORDS: Lithography, Principal component analysis, Sensors, Monochromatic aberrations, Wavefront aberrations, Image sensors, Semiconducting wafers, Image processing, Photomasks, Process modeling

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Proceedings Article | 13 March 2012 Paper

Paper

Lithographic tool dynamic coordinate calibration for CDU improvement

Zhiyong Yang, Fanglin Mao, Anatoly Bourov, Jianrui Cheng, Le He

Proceedings Volume 8326, 83262G (2012) https://doi.org/10.1117/12.915975

KEYWORDS: Semiconducting wafers, Image processing, Lithography, Calibration, Reticles, Optical alignment, Scanners, Image quality, Image sensors, Error analysis

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Proceedings Article | 13 March 2012 Paper

Paper

CDU prediction based on in-situ image measurements

A. Bourov, J. R. Cheng, L. Duan, J. Yang, J. Min

Proceedings Volume 8326, 83261T (2012) https://doi.org/10.1117/12.916629

KEYWORDS: Image sensors, Sensors, Semiconducting wafers, Image processing, Data modeling, Scanners, Deconvolution, Critical dimension metrology, Image acquisition, Photomasks

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Proceedings Article | 30 September 2011 Paper

Paper

Experimental determination of aberration in lithographic lens by aerial image

Lifeng Duan, Xiangzhao Wang, Guanyong Yan, Anatoly Bourov

Proceedings Volume 8169, 816909 (2011) https://doi.org/10.1117/12.896319

KEYWORDS: Lithography, Monochromatic aberrations, Sensors, Image sensors, Semiconducting wafers, Wavefront aberrations, Photomasks, Process modeling, Statistical analysis, Error analysis

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Proceedings Article | 20 April 2011 Paper

Paper

Multifeature focus exposure matrix for tool diagnosis

Zhiyong Yang, Anatoly Burov, Lifeng Duan, Fan Wang

Proceedings Volume 7971, 79712N (2011) https://doi.org/10.1117/12.879350

KEYWORDS: Semiconducting wafers, Error analysis, Lithography, Critical dimension metrology, Photomasks, Scanners, Diagnostics, Statistical analysis, Data processing, Finite element methods

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Proceedings Article | 5 April 2011 Paper

Paper

Performance of a bilinear photoresist model

Anatoly Burov, Min Shi, Jiang Yan, Wenfeng Sun

Proceedings Volume 7973, 79732V (2011) https://doi.org/10.1117/12.879369

KEYWORDS: Photoresist materials, Performance modeling, Process modeling, Calibration, Data modeling, Bidirectional reflectance transmission function, Mathematical modeling, Image processing, Signal processing, Image analysis

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Proceedings Article | 11 March 2010 Paper

Paper

Aerial image model and application to aberration measurement

Anatoly Bourov, Liang Li, Zhiyong Yang, Fan Wang, Lifeng Duan

Proceedings Volume 7640, 764032 (2010) https://doi.org/10.1117/12.848421

KEYWORDS: Sensors, Wavefronts, Image sensors, Image processing, Process modeling, Photomasks, Lithography, Semiconducting wafers, Image acquisition, Fiber optic illuminators

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Proceedings Article | 10 March 2010 Paper

Paper

CDU linear model based on aerial image principal components

Zhiyong Yang, Anatoly Burov, Liang Li, Fan Wang, Zhaoxiang Chu

Proceedings Volume 7640, 764035 (2010) https://doi.org/10.1117/12.848429

KEYWORDS: Process modeling, Wavefronts, Image quality, Lithography, Image processing, Critical dimension metrology, Mirrors, Performance modeling, Inspection, Mathematical modeling

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Proceedings Article | 10 March 2010 Paper

Paper

Quadratic blur kernels for latent image formation modeling

Anatoly Burov

Proceedings Volume 7640, 76400P (2010) https://doi.org/10.1117/12.848295

KEYWORDS: Photoresist materials, Spatial frequencies, Image acquisition, Signal processing, Calibration, Polymers, Fourier transforms, Image processing, Image quality, Systems modeling

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Proceedings Article | 26 March 2007 Paper

Paper

On the quality of measured optical aberration coefficients using phase wheel monitor

Lena Zavyalova, Aaron Robinson, Anatoly Bourov, Neal Lafferty, Bruce Smith

Proceedings Volume 6520, 65203T (2007) https://doi.org/10.1117/12.721311

KEYWORDS: Wavefronts, Data modeling, Scanning electron microscopy, Monochromatic aberrations, Calibration, Image processing, Point spread functions, Photoresist materials, Semiconducting wafers, Visualization

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Proceedings Article | 29 March 2006 Paper

Paper

Resist process window characterization for the 45-nm node using an interferometric immersion microstepper

Anatoly Bourov, Stewart Robertson, Bruce Smith, Michael Slocum, Emil Piscani

Proceedings Volume 6153, 61530R (2006) https://doi.org/10.1117/12.657578

KEYWORDS: Modulation, Interferometry, Data modeling, Photoresist materials, Error analysis, Imaging systems, Semiconducting wafers, Image acquisition, Critical dimension metrology, Data conversion

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Proceedings Article | 21 March 2006 Paper

Paper

Comparison of immersion lithography from projection and interferometric exposure tools

Stewart Robertson, Joanne Leonard, Bruce Smith, Anatoly Bourov

Proceedings Volume 6154, 61544N (2006) https://doi.org/10.1117/12.658036

KEYWORDS: Scanners, Modulation, Line edge roughness, Interferometers, Interferometry, Photomasks, Immersion lithography, Prisms, Projection systems, Semiconducting wafers

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Proceedings Article | 20 March 2006 Paper

Paper

Experimental measurement of photoresist modulation curves

Anatoly Bourov, Stewart Robertson, Bruce Smith, Michael Slocum, Emil Piscani

Proceedings Volume 6154, 61542Z (2006) https://doi.org/10.1117/12.657608

KEYWORDS: Modulation, Photoresist materials, Data modeling, Interferometry, Error analysis, Semiconducting wafers, Calibration, Critical dimension metrology, Nonlinear optics, Image resolution

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Proceedings Article | 15 March 2006 Paper

Paper

Effects of beam pointing instability on two-beam interferometric lithography

Yongfa Fan, Anatoly Bourov, Michael Slocum, Bruce Smith

Proceedings Volume 6154, 61542L (2006) https://doi.org/10.1117/12.656698

KEYWORDS: Commercial off the shelf technology, Interferometry, Phase shifts, Lithography, Semiconducting wafers, Diffraction, Diffraction gratings, Imaging systems, Photomasks, Statistical analysis

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Proceedings Article | 15 March 2006 Paper

Paper

Practical approach to full-field wavefront aberration measurement using phase wheel targets

Lena Zavyalova, Bruce Smith, Anatoly Bourov, Gary Zhang, Venugopal Vellanki, Patrick Reynolds, Donis Flagello

Proceedings Volume 6154, 61540Y (2006) https://doi.org/10.1117/12.657928

KEYWORDS: Data modeling, Scanning electron microscopy, Phase measurement, Calibration, Lithography, Semiconducting wafers, Photoresist materials, Photomasks, Optimization (mathematics), Error analysis

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SPIE Journal Paper | 1 July 2005

Mask-induced polarization effects at high numerical aperture

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Bruce Smith

JM3, Vol. 4, Issue 03, 031107, (July 2005) https://doi.org/10.1117/12.10.1117/1.2037507

KEYWORDS: Polarization, Polarizers, Refractive index, Binary data, Photomasks, Metals, Chromium, Dielectric polarization, Silicon, Sodium

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Proceedings Article | 12 May 2005 Paper

Paper

Immersion lithography fluids for high NA 193 nm lithography

Jianming Zhou, Yongfa Fan, Anatoly Bourov, Neal Lafferty, Frank Cropanese, Lena Zavyalova, Andrew Estroff, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602533

KEYWORDS: Refractive index, Absorbance, Microfluidics, Immersion lithography, Absorption, Water, Quartz, Prisms, Sodium, 193nm lithography

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Proceedings Article | 12 May 2005 Paper

Paper

Amphibian XIS: an immersion lithography microstepper platform

Bruce Smith, Anatoly Bourov, Yongfa Fan, Frank Cropanese, Peter Hammond

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606467

KEYWORDS: Interferometry, Prisms, Semiconducting wafers, Lithography, Silica, Immersion lithography, Microfluidics, Water, Excimer lasers, Microfluidic imaging

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Proceedings Article | 12 May 2005 Paper

Paper

Synthetic defocus in interferometric lithography

Frank Cropanese, Anatoly Bourov, Yongfa Fan, Jianming Zhou, Lena Zavyalova, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602948

KEYWORDS: Modulation, Interferometry, Lithography, Polarization, Projection systems, Interferometers, Demodulation, Critical dimension metrology, Polarizers, Mirrors

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Proceedings Article | 12 May 2005 Paper

Paper

Automated aberration extraction using phase wheel targets

Lena Zavyalova, Anatoly Bourov, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.606460

KEYWORDS: Wavefronts, Monochromatic aberrations, Zernike polynomials, Spherical lenses, Wavefront aberrations, Optical lithography, Optimization (mathematics), Lithography, Numerical analysis, Image analysis

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Proceedings Article | 12 May 2005 Paper

Paper

Mask induced polarization effects at high NA

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Bruce Smith, Philippe Foubert, L. Leunissen, Vicky Philipsen, Yuri Aksenov

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602422

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Refractive index, Spectroscopy, Silicon, Diffraction, Phase shifting, Refraction

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Proceedings Article | 12 May 2005 Paper

Paper

Photoresist modulation curves

Anatoly Bourov, Yongfa Fan, Frank Cropanese, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.602805

KEYWORDS: Modulation, Photoresist materials, Image processing, Image resolution, Image quality, Performance modeling, Photoresist developing, Electroluminescence, Imaging systems, Prisms

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Proceedings Article | 12 May 2005 Paper

Paper

ILSim: a compact simulation tool for interferometric lithography

Yongfa Fan, Anatoly Bourov, Lena Zavyalova, Jianming Zhou, Andrew Estroff, Neal Lafferty, Bruce Smith

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.621286

KEYWORDS: Polarization, Thin films, Interferometry, Reflection, Interfaces, Lithography, Imaging systems, Thin film coatings, Immersion lithography, Nanolithography

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Proceedings Article | 28 May 2004 Paper

Paper

Synthesis of projection lithography for low k1 via interferometry

Frank Cropanese, Anatoly Bourov, Yongfa Fan, Andrew Estroff, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.547727

KEYWORDS: Lithography, Interferometry, Projection systems, Signal attenuation, Diffraction, Projection lithography, Demodulation, Interferometers, Optical lithography, Line edge roughness

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Proceedings Article | 28 May 2004 Paper

Paper

Approaching the numerical aperture of water immersion lithography at 193-nm

Bruce Smith, Anatoly Bourov, Yongfa Fan, Lena Zavyalova, Neal Lafferty, Frank Cropanese

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537262

KEYWORDS: Water, Refractive index, Immersion lithography, Scattering, Prisms, Light scattering, Mie scattering, Interferometry, Absorption, Optical spheres

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Proceedings Article | 28 May 2004 Paper

Paper

Mask induced polarization

Andrew Estroff, Yongfa Fan, Anatoly Bourov, Frank Cropanese, Neal Lafferty, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.546423

KEYWORDS: Polarization, Photomasks, Binary data, Polarizers, Chromium, Dielectric polarization, Silica, Silicon, Phase shifts, Objectives

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Proceedings Article | 28 May 2004 Paper

Paper

Immersion microlithography at 193 nm with a Talbot prism interferometer

Anatoly Bourov, Yongfa Fan, Frank Cropanese, Neal Lafferty, Lena Zavyalova, Hoyoung Kang, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537350

KEYWORDS: Prisms, Interferometers, Photoresist materials, Excimer lasers, Spatial coherence, Imaging systems, Optical lithography, Interferometry, Temporal coherence, Microfluidic imaging

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Proceedings Article | 28 May 2004 Paper

Paper

Study of air-bubble-induced light scattering effect on image quality in 193-nm immersion lithography

Yongfa Fan, Neal Lafferty, Anatoly Bourov, Lena Zavyalova, Bruce Smith

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537255

KEYWORDS: Scattering, Mie scattering, Optical spheres, Light scattering, Water, Semiconducting wafers, Lithography, Laser scattering, Immersion lithography, Refractive index

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As an emerging technique, immersion lithography offers the capability of reducing critical dimensions by increasing numerical aperture (NA) due to the higher refractive indices of immersion liquids than that of air. Among the candidates for immersion liquids, water appears to be an excellent choice due to its high transparency at a wavelength of 193 nm, as well as its immediate availability and low processing cost. However, in the process of forming a water fluid layer between the resist and lens surfaces, air bubbles are often created due to the high surface tension of water. The presence of air bubbles in the immersion layer will degrade the image quality because of the inhomogeneity induced light scattering in the optical path. Therefore, it is essential to understand the air bubble induced light scattering effect on image quality. Analysis by geometrical optics indicates that the total reflection of light causes the enhancement of scattering in the region where the scattering angle is less than the critical scattering angle, which is 92 degrees at 193 nm. Based on Mie theory, numerical evaluation of scattering due to air bubbles, polystyrene spheres and PMMA spheres was conducted for TE, TM or unpolarized incident light. Comparison of the scattering patterns shows that the polystyrene spheres and air bubbles resemble each other with respect to scattering properties. Hence polystyrene spheres are used to mimic air bubbles in studies of lithographic imaging of “bubbles” in immersion water. In direct interference lithography, it is found that polystyrene spheres (2 μm in diameter) 0.3 mm away from the resist surface would not image, while for interferometric lithography at 0.5NA, this distance is estimated to be 1.3 mm. Surprisingly, polystyrene spheres in diameter of 0.5 μm (which is 5 times larger than the interferometric line-width) will not image. It is proposed that “bubbles” are repelled from contact with the resist film by surface tension. The scatter of exposure light can be characterized as “flare”. This work shows that microbubbles are not a technical barrier to immersion lithography.

SPIE Journal Paper | 1 January 2004

Water immersion optical lithography at 193 nm

Bruce Smith, Anatoly Bourov, Hoyoung Kang, Frank Cropanese, Yongfa Fan, Neal Lafferty, Lena Zavyalova

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637594

KEYWORDS: Water, Polarization, Optical lithography, Refractive index, Interferometry, Immersion lithography, Lithography, Photoresist materials, Microfluidics, Absorption

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Proceedings Article | 26 June 2003 Paper

Paper

Water immersion optical lithography for the 45-nm node

Bruce Smith, Hoyoung Kang, Anatoly Bourov, Frank Cropanese, Yongfa Fan

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485489

KEYWORDS: Water, Polarization, Optical lithography, Lithography, Refractive index, Interferometry, Immersion lithography, Absorption, Photoresist materials, 193nm lithography

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Proceedings Article | 30 July 2002 Paper

Paper

Evaluation and characterization of flare in ArF lithography

Lloyd Litt, Anatoly Bourov, Bruno La Fontaine, Eric Apelgren

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474528

KEYWORDS: Modulation transfer functions, Lithography, Semiconducting wafers, Photomasks, Contamination, Stray light, Imaging systems, 193nm lithography, Image processing, Critical dimension metrology

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Proceedings Article | 30 July 2002 Paper

Paper

Flare and its impact on low-k1 KrF and ArF lithography

Bruno La Fontaine, Mircea Dusa, Alden Acheta, Cinti Chen, Anatoly Bourov, Harry Levinson, Lloyd Litt, Melchior Mulder, Rolf Seltman, Judith van Praagh

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474598

KEYWORDS: Modulation transfer functions, Point spread functions, Spatial frequencies, Photomasks, Scanners, Modulation, Lithography, Light scattering, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 16 July 2002 Paper

Paper

Lithographic process window analysis by statistical means

Anatoly Bourov, Sergei Postnikov, Kevin Lucas

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473487

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Lithography, Statistical analysis, Photomasks, Error analysis, Control systems, Data modeling, Software development, Monte Carlo methods

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Proceedings Article | 14 September 2001 Paper

Paper

Impact of flare on CD variation for 248-nm and 193-nm lithography systems

Anatoly Bourov, Lloyd Litt, Lena Zavyalova

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435677

KEYWORDS: Photomasks, Critical dimension metrology, Scanners, Semiconducting wafers, Lithography, Reticles, Phase shifts, Imaging systems, Stray light, Silicon

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Proceedings Article | 20 August 2001 Paper

Paper

Optical lithography at a 126-nm wavelength

Hoyoung Kang, Anatoly Bourov, Bruce Smith

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436707

KEYWORDS: Lithography, Imaging systems, Optical lithography, Argon, Lamps, Silver, Monochromatic aberrations, Photomasks, Excimers, Reflectivity

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Proceedings Article | 22 January 2001 Paper

Paper

Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing

Michael Hibbs, Masao Ushida, Katherina Babich, Hideaki Mitsui, Anatoly Bourov

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410721

KEYWORDS: Photomasks, Phase shifts, Inspection, Lithography, Etching, Reflectivity, Attenuators, Molybdenum, Manufacturing, Excimer lasers

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Proceedings Article | 5 July 2000 Paper

Paper

Properties and potential of VUV lithographic thin film materials

Michael Cangemi, Matthew Lassiter, Anatoly Bourov, Bruce Smith

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388995

KEYWORDS: Vacuum ultraviolet, Thin films, Optical coatings, Chromium, Lithography, Metals, Binary data, Absorption, Autoregressive models, Refraction

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Proceedings Article | 30 December 1999 Paper

Paper

Masking materials for 157-nm lithography

Bruce Smith, Anatoly Bourov, Matthew Lassiter, Michael Cangemi

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373337

KEYWORDS: Chromium, Thin films, Reflection, Photomasks, Vacuum ultraviolet, Binary data, Phase shifts, Silicon films, Refractive index, Lithography

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Proceedings Article | 25 June 1999 Paper

Paper

Design and development of thin film materials for 157-nm and VUV wavelengths: APSM, binary masking, and optical coatings applications

Bruce Smith, Anatoly Bourov, Lena Zavyalova, Michael Cangemi

Proceedings Volume 3676, (1999) https://doi.org/10.1117/12.351108

KEYWORDS: Thin films, Chromium, Dielectrics, Optical coatings, Vacuum ultraviolet, Reflectivity, Optical properties, Silicon, Silica, Refractive index

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Proceedings Article | 7 July 1997 Paper

Paper

Effects of excimer laser radiation on attenuated phase-shift masking materials

Bruce Smith, Lena Zavyalova, Shahid Butt, Anatoly Bourov, Nathan Bergman, Carlos Fonseca, Zulfiquar Alam

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276051

KEYWORDS: Excimer lasers, Plasma etching, Etching, Plasma, Photomasks, Silicon, Resolution enhancement technologies, Lithography, Deep ultraviolet, Phase shifts

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