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Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Two-Photon Neural Lithography Simulator

Published: 11 December 2023 Publication History

Abstract

We introduce neural lithography to address the ‘design-to-manufacturing’ gap in computational optics. Computational optics with large design degrees of freedom enable advanced functionalities and performance beyond traditional optics. However, the existing design approaches often overlook the numerical modeling of the manufacturing process, which can result in significant performance deviation between the design and the fabricated optics. To bridge this gap, we, for the first time, propose a fully differentiable design framework that integrates a pre-trained photolithography simulator into the model-based optical design loop. Leveraging a blend of physics-informed modeling and data-driven training using experimentally collected datasets, our photolithography simulator serves as a regularizer on fabrication feasibility during design, compensating for structure discrepancies introduced in the lithography process. We demonstrate the effectiveness of our approach through two typical tasks in computational optics, where we design and fabricate a holographic optical element (HOE) and a multi-level diffractive lens (MDL) using a two-photon lithography system, showcasing improved optical performance on the task-specific metrics. The source code for this work is available on the project page: https://neural-litho.github.io.

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  1. Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Two-Photon Neural Lithography Simulator

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          cover image ACM Conferences
          SA '23: SIGGRAPH Asia 2023 Conference Papers
          December 2023
          1113 pages
          ISBN:9798400703157
          DOI:10.1145/3610548
          This work is licensed under a Creative Commons Attribution-NonCommercial International 4.0 License.

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          Published: 11 December 2023

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          1. 3D printing
          2. computational imaging
          3. computational lithography
          4. computational optics
          5. end-to-end optimization

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          December 12 - 15, 2023
          NSW, Sydney, Australia

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