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Non-Uniform Temperature Distribution in Interconnects and Its Impact on Electromigration

Published: 13 May 2019 Publication History

Abstract

We investigate the effect of electrically induced thermal load on interconnect reliability and aging. We propose new models for uniform and non-uniform temperature evolution and its steady state distribution in interconnects considering Joule heating and heat convection. The models are verified by comparing the results against those of finite element experiments. We apply our models to study material migration induced aging and failures. We discuss how different non-uniform temperature profiles affect interconnect lifetime. We propose new formulas for accurate temperature aware assessment of the mortality of interconnects. We demonstrate that neglecting thermal effects in modern technologies may lead to incorrect conclusions about interconnect mortality. We also provide a method for modeling the true mean time to failure based on underlying physics.

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cover image ACM Conferences
GLSVLSI '19: Proceedings of the 2019 Great Lakes Symposium on VLSI
May 2019
562 pages
ISBN:9781450362528
DOI:10.1145/3299874
Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. Copyrights for components of this work owned by others than ACM must be honored. Abstracting with credit is permitted. To copy otherwise, or republish, to post on servers or to redistribute to lists, requires prior specific permission and/or a fee. Request permissions from [email protected]

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Published: 13 May 2019

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Author Tags

  1. aging
  2. electromigration
  3. interconnect
  4. interconnects
  5. lifetime
  6. reliability
  7. stress migration
  8. thermomigration

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GLSVLSI '19
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GLSVLSI '19: Great Lakes Symposium on VLSI 2019
May 9 - 11, 2019
VA, Tysons Corner, USA

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