Configurable hot spot fixing system

Masanari Kajiwara; Sachiko Kobayashi; Hiromitsu Mashita; Ryota Aburada; Nozomu Furuta; Toshiya Kotani

doi:10.1117/12.2046272

28 March 2014 Configurable hot spot fixing system

Masanari Kajiwara, Sachiko Kobayashi, Hiromitsu Mashita, Ryota Aburada, Nozomu Furuta, Toshiya Kotani

Proceedings Volume 9053, Design-Process-Technology Co-optimization for Manufacturability VIII; 90530G (2014) https://doi.org/10.1117/12.2046272
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

Hot spot fixing (HSF) method has been used to fix many hot spots automatically. However, conventional HSF based on a biasing based modification is difficult to fix many hot spots under a low-k1 lithography condition. In this paper we proposed a new HSF, called configurable hotspot fixing system. The HSF has two major concepts. One is a new function to utilize vacant space around a hot spot by adding new patterns or extending line end edges around the hot spot. The other is to evaluate many candidates at a time generated by the new functions. We confirmed the proposed HSF improves 73% on the number of fixing hot spots and reduces total fixing time by 50% on a device layout equivalent to 28nm-node. The result shows the proposed HSF is effective for layouts under the low-k1 lithography condition.

Citation Download Citation

Masanari Kajiwara, Sachiko Kobayashi, Hiromitsu Mashita, Ryota Aburada, Nozomu Furuta, and Toshiya Kotani "Configurable hot spot fixing system", Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530G (28 March 2014); https://doi.org/10.1117/12.2046272

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