Diffraction analysis of digital micromirror device in maskless photolithography system

Zheng Xiong; Hua Liu; Xiangquan Tan; Zhenwu Lu; Cuixia Li; Liwei Song; Zhi Wang

doi:10.1117/1.JMM.13.4.043016

16 December 2014 Diffraction analysis of digital micromirror device in maskless photolithography system

Zheng Xiong, Hua Liu, Xiangquan Tan, Zhenwu Lu, Cuixia Li, Liwei Song, Zhi Wang

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 4, 043016 (December 2014). https://doi.org/10.1117/1.JMM.13.4.043016

Abstract

A digital micromirror device (DMD) acts as a spatial light modulator in a maskless photolithography system. Illuminated by coherent light, DMD performs as a two-dimensional diffraction grating because of its periodical internal structure. Diffraction efficiency is an important factor for evaluating the exposure doses. A diffraction model of DMD based on Fourier analysis demonstrates that errors of the DMD’s manufacture and the precision of the machining of the optical mechanical structure affect the diffraction efficiency. Additionally, analysis of exposure results by the diffraction model of DMD in Tracepro explains the degradation of the exposure quality and is helpful for calibrating the direction of optical focusing.

Citation Download Citation

Zheng Xiong, Hua Liu, Xiangquan Tan, Zhenwu Lu, Cuixia Li, Liwei Song, and Zhi Wang "Diffraction analysis of digital micromirror device in maskless photolithography system," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(4), 043016 (16 December 2014). https://doi.org/10.1117/1.JMM.13.4.043016

Published: 16 December 2014

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