"Solving 28 nm I/O circuit reliability issue due to IC design weakness."

Yi Chao Low et al. (2018)

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DOI: 10.1016/J.MICROREL.2018.06.082

access: closed

type: Journal Article

metadata version: 2020-02-22

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Yi Chao Low, Pik Kee Tan, Soon Leng Tan, Yuzhe Zhao, Jeffrey Lam:
Solving 28 nm I/O circuit reliability issue due to IC design weakness. Microelectron. Reliab. 88-90: 246-249 (2018)

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