"Protective nanometer films for reliable Cu-Cu connections."

Tobias Berthold et al. (2017)

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DOI: 10.1016/J.MICROREL.2017.07.001

access: closed

type: Journal Article

metadata version: 2020-02-22

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Tobias Berthold, Guenther Benstetter, Werner Frammelsberger, Manuel Bogner, Rosana Rodríguez, Montserrat Nafría:
Protective nanometer films for reliable Cu-Cu connections. Microelectron. Reliab. 76-77: 383-389 (2017)

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