The goals of this study were to improve our understanding of the types of per- and polyfluoroalkyl substances (PFASs) that occur in wastewater from electronics fabrication facilities (fabs) and to assess the relative concentrations of PFAS species. We collected wastewater samples from three fabs in the United States, analyzed the samples by means of high-resolution mass spectrometry, and implemented complementary target and nontarget analyses. Twelve of 25 target PFASs were quantified in at least one sample, and five perfluorocarboxylates and perfluorobutane sulfonate (PFBS) were quantified in all samples. PFBS was quantified at the highest concentration among the samples (8040 ng L-1) and we expect that its presence is related to the use of photoacid generators during photolithography. The sum concentrations of the target PFASs in the diluted discharge samples from each fab were 623, 394, and 376 ng L-1. Nontarget analysis revealed the presence of 41 homologous series of PFASs comprising 133 homologues. We proposed structures for 15 homologous series of nontarget PFASs, six of which are reported here for the first time. Using an approach for semiquantification of nontarget PFASs, we estimated that the sum concentrations of target and nontarget PFASs in the diluted discharge samples from each fab were 1490, 78 700, and 2170 ng L-1. Our findings are essential for developing alternative photolithography chemicals or informing the implementation of advanced wastewater treatment technologies at fabs.